Decomposition of silicon-containing precursors on porous scaffold materials
US-2020020935-A1 · Jan 16, 2020 · US
US11028242B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11028242-B2 |
| Application number | US-201916430290-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 3, 2019 |
| Priority date | Jun 3, 2019 |
| Publication date | Jun 8, 2021 |
| Grant date | Jun 8, 2021 |
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Methods of forming a composite material film can include providing a mixture comprising a precursor and silane-treated silicon particles. The methods can also include pyrolysing the mixture to convert the precursor into one or more carbon phases to form the composite material film with the silicon particles distributed throughout the composite material film.
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What is claimed is: 1. A method of forming a composite material film, the method comprising: providing a mixture comprising a precursor and silane-treated silicon particles; and pyrolysing the mixture to convert the precursor into one or more carbon phases to form the composite material film with the silicon particles distributed throughout the composite material film, wherein: silane-treated silicon particles comprise silicon particles treated with one or more organosilanes; the one or more organosilanes comprise one or more silanols, silyl ethers, silyl chlorides, dialkylaminosilanes, silyl hydrides, or cyclic azasilanes; and the one or more organosilanes comprise dodecylsilane. 2. The method of claim 1 , wherein the silane-treated silicon particles comprise silicon oxide surfaces reacted with the one or more organosilanes. 3. The method of claim 1 , wherein the one or more organosilanes comprise one or more aminoalkyl functional groups. 4. The method of claim 3 , wherein the one or more organosilanes comprise 3-aminopropyltriethoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, or 2,2-dimethoxy-1,6-diaza-2-silacyclooctane. 5. The method of claim 3 , wherein the precursor comprises polyimide. 6. The method of claim 1 , wherein the one or more organosilanes comprise an epoxide linker. 7. The method of claim 6 , wherein the epoxide linker comprises 5,6-epoxyhexyltriethoxysilane. 8. The method of claim 6 , wherein the precursor comprises a phenolic resin. 9. The method of claim 1 , wherein the one or more organosilanes comprise an aromatic functional group. 10. The method of claim 9 , wherein the one or more organosilanes comprise benzyltriethoxysilane. 11. The method of claim 9 , wherein the precursor comprises polycyclic aromatic hydrocarbon. 12. The method of claim 1 , wherein the one or more organosilanes comprise (N,N-dimethylamino)trimethylsilane. 13. The method of claim 1 , wherein the silicon particles are suspended in liquid comprising the one or more organosilanes. 14. The method of claim 1 , wherein the silicon particles are exposed to one or more organosilane vapors. 15. The method of claim 1 , wherein the mixture comprises the one or more organosilanes. 16. The method of claim 1 , wherein the composite material film comprises the silicon particles at about 50% to about 99% by weight. 17. The method of claim 1 , wherein the composite material film is electrochemically active. 18. The method of claim 1 , wherein at least one of the one or more types of carbon phases is a continuous phase that holds the composite material film. 19. A method of forming a battery electrode, wherein the electrode comprises the composite material film of claim 1 . 20. The method of claim 19 , wherein the electrode is an anode. 21. A method of forming a composite material film, the method comprising: providing a mixture comprising a precursor and silane-treated silicon particles; and pyrolysing the mixture to convert the precursor into one or more carbon phases to form the composite material film with the silicon particles distributed throughout the composite material film, wherein: silane-treated silicon particles comprise silicon particles treated with one or more organosilanes; the one or more organosilanes comprise one or more silanols, silyl ethers, silyl chlorides, dialkylaminosilanes, silyl hydrides, or cyclic azasilanes; and the one or more organosilanes comprise (N,N-dimethylamino)trimethylsilane. 22. The method of claim 21 , wherein the silane-treated silicon particles comprise silicon oxide surfaces reacted with the one or more organosilanes. 23. The method of claim 21 , wherein the one or more organosilanes comprise one or more aminoalkyl functional groups. 24. The method of claim 23 , wherein the one or more organosilanes comprise 3-aminopropyltriethoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, or 2,2-dimethoxy-1,6-diaza-2-silacyclooctane. 25. The method of claim 23 , wherein the precursor comprises polyimide. 26. The method of claim 21 , wherein the one or more organosilanes comprise an epoxide linker. 27. The method of claim 26 , wherein the epoxide linker comprises 5,6-epoxyhexyltriethoxysilane. 28. The method of claim 21 , wherein the precursor comprises a phenolic resin. 29. The method of claim 21 , wherein the one or more organosilanes comprise an aromatic functional group. 30. The method of claim 29 , wherein the one or more organosilanes comprise benzyltriethoxysilane. 31. The method of claim 21 , wherein the precursor comprises polycyclic aromatic hydrocarbon. 32. The method of claim 21 , wherein the silicon particles are suspended in liquid comprising the one or more organosilanes. 33. The method of claim 21 , wherein the silicon particles are exposed to one or more organosilane vapors. 34. The method of claim 21 , wherein the mixture comprises the one or more organosilanes. 35. The method of claim 21 , wherein the composite material film comprises the silicon particles at about 50% to about 99% by weight. 36. The method of claim 21 , wherein the composite material film is electrochemically active. 37. The method of claim 21 , wherein at least one of the one or more types of carbon phases is a continuous phase that holds the composite material film. 38. A method of forming a battery electrode, wherein the electrode comprises the composite material film of claim 21 . 39. The method of claim 38 , wherein the electrode is an anode. 40. A method of forming a composite material film, the method comprising: providing a mixture comprising a precursor and silane-treated silicon particles; and pyrolysing the mixture to convert the precursor into one or more carbon phases to form the composite material film with the silicon particles distributed throughout the composite material film, wherein: silane-treated silicon particles comprise silicon particles treated with one or more organosilanes; and the silicon particles are exposed to one or more organosilane vapors. 41. The method of claim 40 , wherein the silane-treated silicon particles comprise silicon oxide surfaces reacted with the one or more organosilanes. 42. The method of claim 40 , wherein the one or more organosilanes comprise one or more silanols, silyl ethers, silyl chlorides, dialkylaminosilanes, silyl hydrides, or cyclic azasilanes. 43. The method of claim 42 , wherein the one or more organosilanes comprise one or more aminoalkyl functional groups. 44. The method of claim 43 , wherein the one or more organosilanes comprise 3-aminopropyltriethoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, or 2,2-dimethoxy-1,6-diaza-2-silacyclooctane. 45. The method of claim 43 , wherein the precursor comprises polyimide. 46. The method of claim 42 , wherein the one or more organosilanes comprise an epoxide linker. 47. The method of claim 46 , wherein the epoxide linker comprises 5,6-epoxyhexyltriethoxysilane. 48. The method of claim 46 , wherein the precurso
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