Ultralow expansion titania-silica glass

Patent metadata

Field	Value
Publication number	US-11028006-B2
Application number	US-201916390139-A
Country	US
Kind code	B2
Filing date	Apr 22, 2019
Priority date	Feb 13, 2015
Publication date	Jun 8, 2021
Grant date	Jun 8, 2021

Abstract

Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.

First claim

What is claimed is:

1. A method of annealing glass comprising:
heating a modified titania-silica glass to a first temperature, said modified titania-silica glass including a non-uniform concentration of a modifier, said first temperature exceeding 850° C.;
cooling said modified titania-silica glass at a first cooling rate from said first temperature to a second temperature, said second temperature being in the range from 650° C. to 800° C.;
cooling said modified titania-silica glass at a second cooling rate from said second temperature to a third temperature, said third temperature being no more than 10° C. less than said second temperature, said second cooling rate being less than 1° C./hr, said cooling at said second cooling rate occurring for at least 10 hours; and
heating said modified titania-silica glass from said third temperature to a fourth temperature, said fourth temperature being in the range from 5° C. to 25° C. greater than said third temperature.

2. The method of claim 1 , wherein said non-uniform concentration of said modifier comprises an average modifier concentration of at least 0.1 wt % and a peak-to-valley variation in modifier concentration of at least 0.01 wt %.

3. The method of claim 1 , wherein said non-uniform concentration of said modifier comprises an average modifier concentration of at least 0.1 wt % and a peak-to-valley variation in modifier concentration of at least 0.05 wt %.

4. The method of claim 1 , wherein said non-uniform concentration of said modifier comprises an average modifier concentration of at least 0.5 wt % and a peak-to-valley variation in modifier concentration of at least 0.02 wt %.

Assignees

• Corning Inc

Inventors

• Annamalai Sezhian
• Duran Carlos Alberto
• Hrdina Kenneth Edward
• Rosch William Rogers

Classifications

• C03C3/112

  containing fluorine · CPC title

• C03C3/076 Primary

  with 40% to 90% silica, by weight {(C03C3/045 takes precedence)} · CPC title

• C03B2201/12

  doped with fluorine (C03B2201/14 takes precedence) · CPC title

• C03C2201/12

  containing fluorine (C03C2201/14 takes precedence) · CPC title

• C03C3/06

  with more than 90% silica by weight, e.g. quartz {(C03C3/045 takes precedence)} · CPC title