Feedback control of dimensions in nanopore and nanofluidic devices

US11015258B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11015258-B2
Application numberUS-201916442885-A
CountryUS
Kind codeB2
Filing dateJun 17, 2019
Priority dateNov 2, 2010
Publication dateMay 25, 2021
Grant dateMay 25, 2021

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Abstract

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Nanofluidic passages such as nanochannels and nanopores are closed or opened in a controlled manner through the use of a feedback system. An oxide layer is grown or removed within a passage in the presence of an electrolyte until the passage reaches selected dimensions or is closed. The change in dimensions of the nanofluidic passage is measured during fabrication. The ionic current level through the passage can be used to determine passage dimensions. Fluid flow through an array of fluidic elements can be controlled by selective oxidation of fluidic passages between elements.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of fabricating a nanofluidic device, comprising: forming a nanofluidic passage having larger than targeted dimensions in a substrate, wherein the nanofluidic passage is a channel formed with an opening in a surface of the substrate; forming a conductive layer on the substrate, thereby reducing the dimensions of the nanofluidic passage and closing the opening; filling the nanofluidic passage with an electrolyte; electrochemically oxidizing the conductive layer; monitoring the size of the nanofluidic passage by measuring ionic current through the nanofluidic channel; and discontinuing electrochemically oxidizing the conductive layer when the ionic current reaches a level corresponding to the targeted dimensions. 2. A method of fabricating a nanofluidic device, comprising: obtaining a structure including a base and a non-metallic layer on the base; forming a nanochannel within the non-metallic layer of the structure; forming an electrically conductive layer within the nanochannel, the electrically conductive layer forming a surface of the nanochannel having a bottom portion extending over the base and sidewall portions adjoining the non-metallic layer; electrochemically oxidizing the electrically conductive layer to reduce the dimensions of the nanochannel by: filling the nanochannel with an electrolyte; and applying a voltage to the electrically conductive layer, thereby forming an oxide layer on the electrically conductive layer, the oxide layer adjoining the bottom portion and the sidewall portions of the electrically conductive layer; creating an ionic current through the nanochannel; measuring the ionic current; monitoring the size of the nanofluidic passage by measuring ionic current through the nanochannel; and discontinuing electrochemically oxidizing the electrically conductive layer when the ionic current reaches a level corresponding to targeted dimensions of the nanochannel. 3. The method of claim 2 , wherein the structure further includes a top layer on the non-metallic layer, further including: forming a channel opening within the top layer of the structure; and closing the channel opening while forming the electrically conductive layer. 4. The method of claim 2 , further including reversing the voltage applied to the electrically conductive layer, thereby enlarging the dimensions of the nanochannel. 5. The method of claim 2 , wherein the nanochannel extends down to the base, the bottom portion of the electrically conductive layer being formed within the nanochannel and on the base.

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What does patent US11015258B2 cover?
Nanofluidic passages such as nanochannels and nanopores are closed or opened in a controlled manner through the use of a feedback system. An oxide layer is grown or removed within a passage in the presence of an electrolyte until the passage reaches selected dimensions or is closed. The change in dimensions of the nanofluidic passage is measured during fabrication. The ionic current level throu…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification B81C1/00071. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue May 25 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).