Solid PCD with transition layers to accelerate full leaching of catalyst

US11014157B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11014157-B2
Application numberUS-201515536875-A
CountryUS
Kind codeB2
Filing dateNov 19, 2015
Priority dateDec 17, 2014
Publication dateMay 25, 2021
Grant dateMay 25, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of making a polycrystalline diamond compact includes forming a first layer of polycrystalline diamond precursor materials comprising diamond particles and a first concentration of catalyst, forming a second layer of polycrystalline diamond precursor materials comprising diamond particles and a second concentration of catalyst, and placing a layer of an infiltrant material in the proximity of the first or the second layer of polycrystalline diamond precursor materials. The second concentration of catalyst is greater than the first concentration of catalyst. The infiltrant material is a catalyst. The first layer and the second layer are sintered under high-pressure high-temperature conditions in the presence of the infiltrant material to form the polycrystalline diamond compact. At least a portion of the catalyst is leached from the polycrystalline diamond compact.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of making a polycrystalline diamond compact, comprising: forming a first layer of polycrystalline diamond precursor materials comprising diamond particles and a first concentration of a first catalyst; forming a second layer of polycrystalline diamond precursor materials comprising diamond particles and a second concentration of the first catalyst, wherein the second concentration of the first catalyst is greater than the first concentration of the first catalyst; placing a layer of a catalytic infiltrant material in the proximity of at least one of the first layer of polycrystalline diamond precursor materials or the second layer of polycrystalline diamond precursor materials; sintering the first layer and the second layer under high-pressure high-temperature conditions in the presence of the catalytic infiltrant material to form the polycrystalline diamond compact, thereby transforming the first layer into a close-packed polycrystalline diamond working layer and the second layer into a loose-packed polycrystalline diamond non-working layer, wherein both the close-packed polycrystalline diamond working layer and the loose-packed polycrystalline diamond non-working layer form an outer surface of the polycrystalline diamond compact; and leaching at least a portion of the first catalyst from the polycrystalline diamond compact. 2. The method of claim 1 , wherein the catalyst is one or more selected from metals from Group VIII of the Periodic Table. 3. The method of claim 1 , comprising leaching the polycrystalline diamond compact until it contains less than 5 wt % of catalyst. 4. The method of claim 1 , comprising forming channels throughout the working layer and non-working layer of the polycrystalline diamond compact, wherein the channels formed in the loose-packed polycrystalline diamond non-working layer have a larger pore size than the channels in the working layer. 5. The method of claim 1 , wherein the first layer and the second layer comprise diamond particles of different average sizes. 6. The method of claim 5 , wherein the average size of the diamond particles in the first layer is within the range of 5-30 microns and the average size of the diamond particles in the second layer is within the range of 10-50 microns. 7. The method of claim 1 , wherein prior to sintering and leaching the first layer comprises less than 5 wt % of catalyst and the second layer comprises more than 5 wt % of catalyst. 8. The method of claim 1 , wherein the total amount of catalyst is greater than 4 wt % of the total amount of diamond particles prior to sintering. 9. The method of claim 1 , wherein the first layer forms a circumferential cutting edge of the polycrystalline diamond compact and the second layer extends axially away from the first layer, radially away from the first layer, or both axially and radially away from the first layer. 10. The method of claim 1 , wherein a thickness of the first layer ranges from at least 1 mm up to 1 mm less than the total thickness of the polycrystalline diamond compact. 11. The method of claim 1 , wherein the leaching also leaches at least a portion of the catalytic infiltrant material from the polycrystalline diamond compact.

Assignees

Inventors

Classifications

  • starting from a melt · CPC title

  • Micron size particles, i.e. above 1 micrometer up to 500 micrometer · CPC title

  • Cutting tools, earth boring or grinding tool other than table ware · CPC title

  • with acids or salt solutions except ammonium salts solutions · CPC title

  • C23F1/02Primary

    Local etching · CPC title

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What does patent US11014157B2 cover?
A method of making a polycrystalline diamond compact includes forming a first layer of polycrystalline diamond precursor materials comprising diamond particles and a first concentration of catalyst, forming a second layer of polycrystalline diamond precursor materials comprising diamond particles and a second concentration of catalyst, and placing a layer of an infiltrant material in the proxim…
Who is the assignee on this patent?
Smith International, Schlumberger Technology Corp
What technology area does this patent fall under?
Primary CPC classification C23F1/02. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 25 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).