Lithography apparatus comprising a plurality of individually controllable write heads

Patent metadata

Field	Value
Publication number	US-11003090-B2
Application number	US-202016778359-A
Country	US
Kind code	B2
Filing date	Jan 31, 2020
Priority date	Nov 27, 2014
Publication date	May 11, 2021
Grant date	May 11, 2021

Abstract

The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.

First claim

What is claimed is:

1. An apparatus, comprising:
a light generating device comprising at least one light source configured to generate light;
a writing device comprising a plurality of individually controllable write heads configured to project the light from the at least one light source onto different regions of a substrate wafer;
a light transferring device comprising a plurality of optical waveguides configured to transfer the light from the light generating device to the writing device;
a transport device configured to provide relative movement between the writing device and the substrate wafer in a transport direction; and
a control device configured to control writing on the substrate wafer,
wherein:
each write head comprises:
a light input coupling device configured to couple the light from the plurality of optical waveguides into the write head;
an optical device configured to generate a light spot comprised of the beams from the individual optical waveguides on the substrate wafer; and
a scanning device configured to move the light spot in a scanning manner on the substrate wafer in a scanning direction which is transverse to the transport direction,

each light input coupling device comprises a plurality of microlenses and a telescope optical unit optically downstream of the microlenses;
each microlens is configured to produce a magnified image of an output of an optical waveguide assigned to the microlens; and
each telescope optical unit is configured to reduce a size of the magnified image so that the light spot comprised of the light beams of the individual optical waveguides arises on the substrate wafer;
for each write head, the scanning device is downstream of the telescope optical unit; and
the apparatus is a lithography apparatus.

2. The apparatus of claim 1 , wherein:
for at least one of the write heads, the scanning device comprises an oscillating scanning mirror configured to generate a sinusoidal movement trajectory of the light spot on the substrate wafer moving in the transport direction; and
the control device is configured to vary a light intensity of at least one of the light beams forming the light spot on the substrate wafer depending on a current speed of the light spot on the substrate wafer during a scanning period.

3. The apparatus of claim 1 , wherein:
each write head is configured to expose a strip-shaped region of the substrate wafer; and
the strip-shaped regions exposed by different write heads are offset relative to each other in the transport direction so that the strip-shaped regions form a continuous area.

4. The apparatus of claim 3 , further comprising a detection device comprising a plurality of measuring devices, wherein each measuring device:
is individually assigned to the individual write heads to monitor a width and/or an orientation of the strip-shaped regions; and
comprises at least two photodiodes arranged one behind the other in a scanning direction of the light beam in a scanning region of the respective write head, the scanning direction being transverse to the transport direction.

5. The apparatus of claim 4 , wherein each measuring device is configured to individually detect each light beam of the light spot comprised of the light beams from the individual optical waveguides.

6. The apparatus of claim 1 , further comprising:
a detection device comprising a plurality of measuring devices; and
a light detector,
wherein:
each measuring device is assigned to the individual write heads to monitor a width and an orientation of strip-shaped regions;
each measuring device comprises two reflective structures on the substrate wafer along a scanning direction which is transverse to the transport direction;
each reflective structure is configured to enable capture by the light spot of the respective write head; and
the light detector is in the respective write head and configured to detect light reflected back from the reflective structures.

7. The apparatus of claim 6 , wherein the measuring device is configured to individually detect each light beam of the light spot comprised of the light beams from the individual optical waveguides.

8. The apparatus of claim 1 , wherein an individual light source is assigned to a single write head, and each light source is individually drivable.

9. The apparatus of claim 1 , wherein:
a light source is assigned to a plurality of the write heads; and
each write head is assigned an individual electro-optical modulator configured to modulate a light intensity of the light provided by the light source assigned to the write head.

10. The apparatus of claim 1 , wherein each optical waveguide assigned to a write head is respectively assigned a separately drivable electro-optical modulator.

11. The apparatus of claim 1 , wherein for each microlens:
there is only one optical waveguide assigned to the microlens; and
the microlens is configured to image, in a magnified fashion, only the output of the one optical waveguide assigned to the microlens.

12. A method, comprising:
providing the apparatus of claim 1 ;
moving the substrate wafer in the transport direction;
projecting a plurality of light beams onto the substrate wafer to generate on the substrate wafer a light spot formed from a plurality of individual light spots;
oscillating the light spot transverse to the transport direction to generate a sinusoidal movement trajectory of the light spot on the substrate wafer; and
varying a light intensity of at least one of the light beams during a scanning period depending on a current speed of the light spot on the substrate wafer.

13. A write head, comprising:
a light input coupling device;
an optical device; and
a scanning device,
wherein:
the write head is configured to be used with an apparatus, comprising:
a light generating device comprising at least one light source configured to generate light;
a writing device comprising a plurality of individually controllable write heads configured to project the light from the at least one light source onto different regions of a substrate wafer;
a light transferring device comprising a plurality of optical waveguides configured to transfer the light from the light generating device to the writing device;
a transport device configured to provide relative movement between the writing device and the substrate wafer in a transport direction; and
a control device configured to control writing on the substrate wafer;

the light input coupling device comprises a plurality of microlenses and a telescope optical unit optically downstream of the microlenses;
each microlens is configured to produce a magnified image of an output of an optical waveguide assigned to the microlens;
the telescope optical unit is configured to reduce the size of the image so that the light spot comprised of the light beams of the individual optical waveguides arises on the substrate wafer;
the scanning device is downstream of the telescope optical unit; and
the write head is configured to be used with the apparatus such that
each light input coupling device couples the light from a plurality of optical waveguides; and
each optical device generates a light spot comprised of the light beams from the individual optical waveguides on the substrate wafer;
the scanning device moves the light spot in a scanning manner on the substrate wafer in a scanning direction which is transverse to the transport direction.

14. The write head of claim 13 , wherein:
the scanning device comprises a scanning mirror that is movable about a scanning axis and that is configured to guide th

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Richter Stefan
• Geissler Enrico
• Doering Dirk
• Kumar Lakshmanan Senthil
• Rudolph Guenter
• Voelcker Martin
• Deguenther Markus

Classifications

• G03F7/7085

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

• G03F7/70383 Primary

  Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams (maskless lithography using a programmable mask G03F7/70291) · CPC title