Sintered body and electrostatic chuck

Patent metadata

Field	Value
Publication number	US-10998216-B2
Application number	US-201715616857-A
Country	US
Kind code	B2
Filing date	Jun 7, 2017
Priority date	Jun 9, 2016
Publication date	May 4, 2021
Grant date	May 4, 2021

Abstract

A sintered body includes a ceramic substrate including sintered oxide particles, a through-hole formed in the ceramic substrate such that the side surfaces of the oxide particles exposed from an inner wall of the through-hole form a flat surface, and a porous body disposed in the through-hole, the porous body including spherical oxide ceramic particles and a mixed oxide configured to bind the spherical oxide ceramic particles.

First claim

What is claimed is:

1. A sintered body comprising: a ceramic substrate including sintered oxide particles; a through-hole formed in the ceramic substrate such that side surfaces of the sintered oxide particles exposed from an inner wall of the through-hole form a flat surface; and a porous body disposed in the through-hole, the porous body including spherical oxide ceramic particles and a mixed oxide configured to bind the spherical oxide ceramic particles; wherein a diameter of the spherical oxide ceramic particles is in a range between 100 μm and 300 μm.

2. The sintered body according to claim 1 , wherein:
a weight ratio of the spherical oxide ceramic particles in the porous bodies is 80% or more by weight.

3. The sintered body according to claim 1 , wherein:
the mixed oxide of the porous body is formed of crystalline particulate materials and amorphous materials.

4. The sintered body according to claim 3 , wherein:
the crystalline particulate materials include at least one of a corundum phase, a spinel phase, and a garnet phase.

5. The sintered body according to claim 1 , wherein:
the mixed oxide of the porous body is formed of oxides of two or more selected from silicon, magnesium, calcium, aluminum, and yttrium.

6. The sintered body according to claim 5 , wherein:
the ceramic substrate is an aluminum oxide substrate including silicon, magnesium, calcium, and yttrium, and
the composition ratio of silicon, magnesium, calcium, and yttrium in the mixed oxide of the porous body is the same as the composition ratio of silicon, magnesium, calcium, and yttrium in the ceramic substrate.

7. The sintered body according to claim 1 , wherein:
the spherical oxide ceramic particles of the porous body include a corundum phase.

8. The sintered body according to claim 1 , wherein:
a porosity of the porous body is between 20% and 50%.

9. An electrostatic chuck comprising: a ceramic substrate including sintered oxide particles; a through-hole formed in the ceramic substrate such that side surfaces of the sintered oxide particles exposed from an inner wall of the through-hole form a flat surface; a gas conduit part including a porous body disposed in the through-hole, the porous body including spherical oxide ceramic particles and a mixed oxide configured to bind the spherical oxide ceramic particles; and an electrostatic electrode disposed in the ceramic substrate; wherein a diameter of the spherical oxide ceramic particles is in a range between 100 μm and 300 μm.

10. A sintered body comprising: a ceramic substrate including sintered oxide particles, the ceramic substrate being formed by sintering a ceramic composition body; a through-hole formed in the ceramic substrate by boring the ceramic substrate after sintering of the ceramic composition body, the through-hole being formed such that side surfaces of the sintered oxide particles exposed from an inner wall of the through-hole form a flat surface; and a porous body disposed in the through-hole, the porous body including spherical oxide ceramic particles and a mixed oxide configured to bind the spherical oxide ceramic particles; wherein a diameter of the spherical oxide ceramic particles is in a range between 100 μm and 300 μm.

11. The sintered body according to claim 1 , wherein:
the side surfaces of the sintered oxide particles exposed from the inner wall of the through-hole form the flat surface without micro irregularities caused by spherical surfaces of the sintered oxide particles being exposed from the inner wall of the through-hole.

12. The electrostatic chuck according to claim 9 , wherein:
the side surfaces of the sintered oxide particles exposed from the inner wall of the through-hole form the flat surface without micro irregularities caused by spherical surfaces of the sintered oxide particles being exposed from the inner wall of the through-hole.

13. The sintered body according to claim 10 , wherein:
the side surfaces of the sintered oxide particles exposed from the inner wall of the through-hole form the flat surface without micro irregularities caused by spherical surfaces of the sintered oxide particles being exposed from the inner wall of the through-hole.

14. The electrostatic chuck according to claim 9 , wherein:
the mixed oxide of the porous body is formed of crystalline particulate materials and amorphous materials.

Assignees

• Shinko Electric Ind Co

Inventors

• Horiuchi Michio
• Miyazawa Masakuni

Classifications

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/722 Primary

  Details of electrostatic chucks · CPC title

• C04B2235/76

  Crystal structural characteristics, e.g. symmetry · CPC title

• C04B2235/528

  Spheres · CPC title

• C04B38/06

  by burning-out added substances {by burning natural expanding materials or by sublimating or melting out added substances} · CPC title