Method of electroplating copper into a via on a substrate from an acid copper electroplating bath

Patent metadata

Field	Value
Publication number	US-10988852-B2
Application number	US-201514923763-A
Country	US
Kind code	B2
Filing date	Oct 27, 2015
Priority date	Oct 27, 2015
Publication date	Apr 27, 2021
Grant date	Apr 27, 2021

Abstract

Copper electroplating baths containing primary alcohol alkoxylate block copolymers and ethylene oxide/propylene oxide random copolymers having specific HLB ranges are suitable for filling vias with copper, where such copper deposits are substantially void-free and substantially free of surface defects.

First claim

What is claimed is:

1. A method of filling a through-silicon via in an electronic device with copper comprising:
a) providing an acid copper electroplating bath comprising a source of copper ions, an acid electrolyte, a source of halide ions, an accelerator, a leveler, a primary alcohol alkoxylate block copolymer having a formula:

wherein R is a linear or branched (C 1 -C 15 ) alkyl moiety or a linear or branched (C 2 -C 15 ) alkenyl moiety and m and n can be the same or different and are moles of each moiety wherein the primary alcohol alkoxylate has a weight average molecular weight of 500 g/mole to 20,000 g/mole and a random or block alkoxylate copolymer comprising ethylene oxide and propylene oxide moieties wherein the random or block alkoxylate copolymer has an HLB of 16 to 35 and the copper electroplating bath has a surface tension ≤40 mN/m;
b) providing as a cathode an electronic device substrate having one or more through-silicon vias to be filled with copper and having a conductive surface, wherein the through-silicon via have depths of 5 to 600 μm and diameters of 1 to 200 μm;
c) contacting the electronic device substrate with the copper electroplating bath; and
d) applying a potential for a period of time sufficient to fill the through-silicon vias with a copper deposit; wherein the copper deposit in the through-silicon vias is substantially void-free and substantially free of surface defects.

2. The method of claim 1 , wherein the alkoxylate copolymer is a triblock copolymer having formula:

wherein R 1 and R 2 are the same or different and are chosen from hydrogen and linear or branched (Ci-Ci 5 )alkyl and a and b can be the same or different and are moles of each moiety and the HLB of the triblock copolymer is from 16 to 35.

3. The method of claim 2 , wherein the triblock copolymer has a formula:

wherein a and b can be the same or different and are moles of each moiety and the HLB of the triblock copolymer is from 16 to 35.

4. The method of claim 1 , wherein the HLB of the random or block alkoxylate copolymer is 17 to 25.

5. The method of claim 4 , wherein the HLB of the random or block alkoxylate copolymer is 18 to 25.

6. The method of claim 1 , wherein the conductive surface is a seed layer.

7. The method of claim 6 , wherein the seed layer is a copper seed layer.

8. The method of claim 1 , wherein the electronic device is a wafer or a die.

9. An acid copper electroplating bath composition comprising: a source of copper ions; an acid electrolyte; a source of halide ions; an accelerator; a leveler; a primary alcohol alkoxylate block copolymer having a formula:

wherein R is a linear or branched (C 1 -C 15 ) alkyl moiety or a linear or branched (C 2 -C 15 ) alkenyl moiety and m and n may be the same or different and are moles or each moiety, wherein the primary alcohol alkoxylate has a weight average molecular weight of 500 g/mole to 20,000 g/mole and a random or block alkoxylate copolymer comprising ethylene oxide and propylene oxide moieties wherein the random or block alkoxylate copolymer has an HLB of 16 to 35 and the copper electroplating bath has a surface tension ≤40 mN/m.

10. The acid copper electroplating bath composition of claim 9 , wherein the alkoxylate copolymer is a triblock copolymer having formula:

wherein R 1 and R 2 are the same or different and are chosen from hydrogen and linear or branched (C 1 -C 15 )alkyl and a and b can be the same or different and are moles of each moiety and the HLB of the triblock copolymer is from 16 to 35.

11. The acid copper electroplating bath composition of claim 10 , wherein the triblock copolymer has a formula:

wherein a and b can be the same or different and are moles of each moiety and the HLB of the triblock copolymer is from 16 to 35.

12. The acid copper electroplating bath composition of claim 9 , wherein the HLB of the random or block alkoxylate copolymer is 17 to 25.

Assignees

• Rohm & Haas Elect Mat

Inventors

• Thorseth Matthew
• Scalisi Mark
• Ciullo Corey

Classifications

• H10P14/47

  Electrolytic deposition, i.e. electroplating; Electroless plating · CPC title

• H10W20/057

  by selectively depositing, e.g. by using selective CVD or plating · CPC title

• H10W20/023

  the interconnections being through-semiconductor vias · CPC title

• H10W20/0245

  comprising use of blind vias during the manufacture · CPC title

• H10W20/0261

  characterised by the filling method or the material of the conductive fill · CPC title