Transferring method, manufacturing method, device and electronic apparatus of micro-led
US-2017263593-A1 · Sep 14, 2017 · US
US10978327B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10978327-B2 |
| Application number | US-201616332147-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 10, 2016 |
| Priority date | Oct 10, 2016 |
| Publication date | Apr 13, 2021 |
| Grant date | Apr 13, 2021 |
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A micro-structure transfer system may include a printhead and a pressure control device to control a pressure of fluid coupled with the printhead. The pressure control device forms a meniscus of fluid at a number of nozzles defined within the printhead to pick up a number of micro-structures. A printhead for transferring micro-structures includes a number of fluid chambers, a number of nozzles defined in an orifice plate through which fluid may exit the chambers, and a pressure control device to control a pressure of fluid within each of the chambers. The pressure control device forms a meniscus of the fluid at a number of nozzles defined within the printhead to pick up a number of micro-structures.
Opening claim text (preview).
What is claimed is: 1. A micro-structure transfer system comprising: a testing device to test micro-structures on a wafer to produce wafer map information defining operability of each of the micro-structures; a printhead; and a pressure control device to control a pressure of fluid coupled with the printhead; wherein the pressure control device is to form a meniscus of fluid at a number of nozzles defined within the printhead to pick up a number of micro-structures; and wherein the pressure control device is to handle the number of micro-structures based on the wafer map information. 2. The micro-structure transfer system of claim 1 , wherein the printhead further comprises a number of fluid ejection elements to selectively deposit at least some of the micro-structures on a target substrate by ejecting the fluid through the nozzles. 3. The micro-structure transfer system of claim 2 , wherein the micro-structure transfer system deposits the micro-structures on the target substrate based on a pixel pitch defining a position of the micro-structures on the target substrate. 4. The micro-structure transfer system of claim 2 , wherein the fluid election elements are selectively actuated, with the pressure control device, to form the meniscus at the number of nozzles. 5. The micro-structure transfer system of claim 1 , wherein the pressure control device comprises a number of pumps, a number of resistive elements, or combinations thereof to form the meniscus. 6. The micro-structure transfer system of claim 1 , wherein the micro-structure transfer system, based on the wafer map information, actuates a number of actuators of the printhead to deposit functioning micro-structures on a target substrate; and actuates the actuators to deposit inoperable micro-structures in a disposal area. 7. The micro-structure transfer system of claim 6 , wherein each of the actuators of the printhead are individually addressable to activate individual resistive elements based on the wafer map information. 8. The micro-structure transfer system of claim 1 , further comprising a carriage to move the printhead in at least two coordinate directions. 9. The micro-structure transfer system of claim 1 , wherein: the printhead comprises a number of fluid chambers; the number of nozzles are defined in an orifice plate of the printhead through which fluid may exit the chambers; and the pressure control device is to control a pressure of fluid within each of the chambers; and the pressure control device is operable to form a convex meniscus of fluid protruding from and exterior to a number of nozzles defined within the printhead to pick up the number of micro-structures. 10. The micro-structure transfer system of claim 9 , further comprising a number of actuators in each of the chambers to: assist the pressure control device to form the meniscus; and create pressure within the chambers to eject fluid from the chambers through the nozzles. 11. The micro-structure transfer system of claim 10 , wherein the actuators are individually selectively controlled to selectively place the micro-structures along a length of a target substrate. 12. The micro-structure transfer system of claim 1 , wherein the pressure control device, based on the wafer map information, is operable to not form a meniscus at a nozzle that corresponds to an inoperable micro-structure on the wafer such that the inoperable micro-structure is left on the wafer when other, operable micro-structures are picked from the wafer by other nozzles having a meniscus. 13. The micro-structure transfer system of claim 1 , wherein the pressure control device is operable to form a convex meniscus of fluid protruding from and exterior to each of the number of nozzles defined within the printhead to pick up the number of micro-structures. 14. A method of transferring micro-structures comprising: with a pressure control device of a printhead, controlling a pressure of fluid within a number of fluid channels defined in the printhead to form a meniscus of the fluid protruding from a number of nozzles defined in the printhead; and picking a number of micro-structures from a wafer via the meniscus using adhesive forces between the fluid and the micro-structure. 15. The method of claim 14 , further comprising actuating a number of actuators of the printhead to deposit the micro-structures on a target substrate. 16. The method of claim 14 , further comprising, with the printhead, disposing of deficient micro-structures. 17. The method of claim 14 , wherein the pressure control device utilizes a number of pumps, the actuators, or combinations thereof to form the meniscus. 18. The method of claim 14 , further comprising: testing the micro-structures at the wafer to produce wafer map information defining operability of each of the micro-structures; and based on wafer map information, actuating a number of actuators of the printhead to deposit the micro-structures in a disposal area. 19. The method of claim 14 , further comprising picking a first number of the micro-structures from the wafer based on a pattern of the micro-structures to be formed on a target substrate and then picking a second number of the micro-structures from the wafer based on the pattern. 20. The method of claim 14 , wherein the micro-structures are Light Emitting Diodes.
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Monitoring of warpages, curvatures, damages, defects or the like · CPC title
the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips or lead frames · CPC title
using a previously coated surface, e.g. by stamping or by transfer lamination · CPC title
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