Substrate processing apparatus including top reflector above annular lamp assembly

Patent metadata

Field	Value
Publication number	US-10978276-B2
Application number	US-202016749631-A
Country	US
Kind code	B2
Filing date	Jan 22, 2020
Priority date	Jan 9, 2017
Publication date	Apr 13, 2021
Grant date	Apr 13, 2021

Abstract

Embodiments of a method and apparatus for annealing a substrate are disclosed herein. In some embodiments, a substrate anneal chamber includes a chamber body having a chamber wall and an interior volume; a lamp assembly disposed in the interior volume and having a plurality of lamps configured to heat a substrate; a slit valve disposed through a wall of the chamber body and above the lamp assembly to allow the substrate to pass into and out of the interior volume; an annular lamp assembly having at least one lamp disposed in a processing volume in an upper portion of the substrate anneal chamber above the slit valve; and a top reflector disposed above the annular lamp assembly to define an upper portion of the processing volume and to reflect radiation downwards towards the lamp assembly, wherein a bottom surface of the top reflector is exposed to the interior volume.

First claim

The invention claimed is:

1. A substrate anneal chamber, comprising:
a chamber body having a chamber wall and an interior volume;
a lamp assembly disposed in the interior volume and having a plurality of lamps configured to heat a substrate, wherein the lamp assembly is coupled to a shaft which supports the lamp assembly;
a plurality of lift pins extending through the lamp assembly to support the substrate in a spaced apart relation to the plurality of lamps;
a slit valve disposed through a wall of the chamber body and above the lamp assembly to allow the substrate to pass into and out of the interior volume;
an annular lamp assembly having at least one lamp disposed in a processing volume in an upper portion of the substrate anneal chamber above the slit valve; and
a top reflector disposed above the annular lamp assembly to define an uppermost portion of the processing volume and to reflect radiation downwards towards the lamp assembly, wherein a bottom surface of the top reflector is exposed to the interior volume of the chamber body.

2. The substrate anneal chamber of claim 1 , wherein the at least one lamp includes one annular lamp.

3. The substrate anneal chamber of claim 1 , wherein the at least one lamp includes two semicircular lamps.

4. The substrate anneal chamber of claim 1 , wherein the annular lamp assembly includes an upper annular reflector disposed above the at least one lamp and a lower annular reflector disposed beneath the at least one lamp, and wherein the upper annular reflector and the lower annular reflector are configured to reflect radiation from the at least one lamp towards the substrate disposed atop the plurality of lift pins, and wherein the top reflector rests on the upper annular reflector.

5. The substrate anneal chamber of claim 4 , wherein the lower annular reflector includes an annular coolant channel.

6. The substrate anneal chamber of claim 4 , wherein the lower annular reflector includes a lamp facing surface that extends upwards and radially outwards.

7. The substrate anneal chamber of claim 1 , wherein the top reflector has a downward-facing concave structure.

8. The substrate anneal chamber of claim 1 , wherein the lamp assembly includes a reflective plate disposed beneath the plurality of lamps and configured to reflect radiation from the plurality of lamps towards the substrate.

9. The substrate anneal chamber of claim 1 , wherein the plurality of lamps includes halogen lamps and has a total power output between about 2.25 kW and about 9.5 kW.

10. The substrate anneal chamber of claim 9 , wherein the plurality of lamps includes an inner array of lamps and an independently controllable outer array of lamps.

11. A substrate anneal chamber, comprising:
a chamber body having a chamber wall and an interior volume;
a lamp assembly disposed in the interior volume and having a plurality of lamps configured to heat a substrate;
a slit valve disposed through a wall of the chamber body and above the lamp assembly to allow the substrate to pass into and out of the interior volume;
an annular lamp assembly having at least one lamp disposed in a processing volume in an upper portion of the substrate anneal chamber above the slit valve; and
a top reflector disposed above the annular lamp assembly and spanning across the interior volume to partially define the interior volume, wherein a bottom surface of the top reflector is exposed to the interior volume of the chamber body.

12. The substrate anneal chamber of claim 11 , wherein the at least one lamp includes one annular lamp or two semicircular lamps.

13. The substrate anneal chamber of claim 11 , wherein a plurality of lift pins extending through the lamp assembly to support the substrate in a spaced apart relation to the plurality of lamps.

14. The substrate anneal chamber of claim 11 , further comprising a cap disposed atop the top reflector, wherein a volume between the cap and the top reflector is disposed outside of the interior volume.

15. The substrate anneal chamber of claim 11 , wherein the annular lamp assembly includes at least one lamp disposed between an upper annular reflector and a lower annular reflector.

Assignees

• Applied Materials Inc

Inventors

• Swaminathan Bharath
• Wu Hanbing
• Mazzocco John

Classifications

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/0436

  mainly by radiation · CPC title

• C23C14/5806

  Thermal treatment · CPC title

• C23C14/56

  Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks · CPC title