Plasma resistant coating of porous body by atomic layer deposition

Patent metadata

Field	Value
Publication number	US-10975469-B2
Application number	US-201715462718-A
Country	US
Kind code	B2
Filing date	Mar 17, 2017
Priority date	Mar 17, 2017
Publication date	Apr 13, 2021
Grant date	Apr 13, 2021

Abstract

Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of a porous chamber component and onto pore walls within the porous chamber component using an atomic layer deposition (ALD) process. The porous chamber component may include a porous body comprising a plurality of pores within the porous body, the plurality of pores each comprising pore walls. The porous body is permeable to a gas. The plasma resistant coating may have a thickness of about 5 nm to about 3 μm, and may protect the pore walls from erosion. The porous body with the plasma resistant coating remains permeable to the gas.

First claim

What is claimed is:

1. An article comprising:
a porous body comprising a plurality of pores within the porous body, the plurality of pores each comprising pore walls, wherein the porous body is permeable to a gas; and
a plasma resistant coating on a surface of the porous body and on the pore walls of the plurality of pores within the porous body, the plasma resistant coating having a thickness of about 5 nm to about 3 μm, wherein the plasma resistant coating protects the pore walls from erosion by a fluorine plasma, wherein the porous body with the plasma resistant coating remains permeable to the gas, wherein the plasma resistant coating has an approximately zero porosity and has a uniform thickness having a thickness variation of less than ±20%, and
wherein the plasma resistant coating consists essentially of:
a high purity metal oxide layer, wherein the high purity metal oxide layer is aluminum oxide; and
a rare earth metal-containing oxide layer consisting essentially of a material selected from a group consisting of Y 2 O 3 , Er 2 O 3 , Y 3 Al 5 O 12 (YAG), ZrO 2 , Gd 2 O 3 , a combination of any two of Y 2 O 3 , Er 2 O 3 and ZrO 2 , a solid solution of Y 2 O 3 —ZrO 2 , and a ceramic compound comprising Y 4 Al 2 O 9 and a solid-solution of Y 2 O 3 —ZrO 2 ,
wherein the article is a chamber component for a semiconductor processing chamber.

2. The article of claim 1 , wherein the article is a ceramic plug for an electrostatic chuck.

3. The article of claim 1 , wherein the porous body has a porosity of about 5% to about 60%.

4. The article of claim 1 , wherein the plasma resistant coating consists essentially of:
a stack of alternating layers of a first type of layer and a second type of layer, wherein:
the first type of layer is the at least one high purity metal oxide layer having a thickness of about 1 angstrom to about 20 angstroms; and
the second type of layer is the at least one rare earth metal-containing oxide having a thickness of about 5 angstroms to about 100 angstroms.

5. The article of claim 1 , wherein the porous body consists essentially of a two phase material consisting essentially of sintered particles of a first oxide and a second oxide that acts as a binder for the sintered particles of the first oxide, wherein the first oxide is selected from a group consisting of aluminum oxide and aluminum nitride and the second oxide is silicon dioxide.

6. The article of claim 1 , wherein the porous body is selected from a group consisting of a) a mixture of aluminum oxide and silicon dioxide, b) a mixture of aluminum oxide, magnesium oxide and silicon dioxide, c) silicon carbide, d) silicon nitride and e) a mixture of aluminum nitride and silicon dioxide.

7. A method comprising:
performing atomic layer deposition to deposit a plasma resistant coating on a porous chamber component comprising a plurality of pores, the plurality of pores each comprising pore walls, wherein the porous body is permeable to a gas, wherein the plasma resistant coating consists essentially of:
a high purity metal oxide layer, wherein the high purity metal oxide layer is aluminum oxide; and
a rare earth metal-containing oxide layer consisting essentially of a material selected from a group consisting of Y 2 O 3 , Er 2 O 3 , Y 3 Al 5 O 12 (YAG), ZrO 2 , Gd 2 O 3 , a combination of any two of Y 2 O 3 , Er 2 O 3 and ZrO 2 , a solid solution of Y 2 O 3 —ZrO 2 , and a ceramic compound comprising Y 4 Al 2 O 9 and a solid-solution of Y 2 O 3 —ZrO 2 , and wherein performing the atomic layer deposition comprises:

depositing the plasma resistant coating onto a surface of the porous chamber component; and
depositing the plasma resistant coating onto the pore walls of the plurality of pores within the porous chamber component;
the plasma resistant coating having a thickness of about 5 nm to about 3 μm, wherein the plasma resistant coating protects the pore walls from erosion by a fluorine plasma, wherein the porous chamber component with the plasma resistant coating remains permeable to the gas after performing the atomic layer deposition, wherein the plasma resistant coating has an approximately zero porosity, and
wherein the porous chamber component is a component for a semiconductor processing chamber.

8. The method of claim 7 , wherein the aluminum oxide has a purity of about 89.99% to about 99.99%.

9. The method of claim 7 , wherein the plasma resistant coating consists essentially of the aluminum oxide and the rare earth metal containing oxide, and wherein depositing the plasma resistant coating comprises:
performing a deposition cycle comprising:
injecting an aluminum-containing precursor into a deposition chamber containing the chamber component to cause the aluminum-containing precursor to adsorb onto the pore walls to form a first half reaction; and
injecting an oxygen-containing reactant into the deposition chamber to form a second half reaction; and

repeating the deposition cycle one or more times until a target thickness is achieved.

10. The method of claim 7 , wherein the rare earth metal containing oxide layer consists essentially of a stack of alternating layers of a) a zirconium-, erbium- or aluminum-containing oxide and b) a yttrium-containing oxide, and wherein depositing the rare earth metal containing oxide layer comprises alternating deposition of the yttrium-containing oxide and the zirconium-, erbium- or aluminum-containing oxide to form a single phase or multi-phase yttrium-containing oxide by:
performing a deposition cycle comprising:
injecting a yttrium-containing precursor into a deposition chamber containing the chamber component to cause the yttrium-containing precursor to adsorb onto the pore walls to form a first half reaction;
injecting an oxygen-containing reactant into the deposition chamber to form a second half reaction and a first layer;
injecting an additional zirconium-, erbium- or aluminum-containing precursor into the deposition chamber to cause the additional zirconium-, erbium- or aluminum-containing precursor to adsorb onto a surface of the first layer to form a third half reaction; and
injecting the oxygen-containing reactant or an alternative oxygen-containing reactant into the deposition chamber to form a fourth half reaction and a second layer; and

repeating the deposition cycle one or more times until a target thickness is reached.

11. The method of claim 7 , wherein depositing the rare earth metal containing oxide layer comprises codepositing a yttrium-containing oxide and one or more additional zirconium-, erbium- or aluminum-containing oxide to form a single phase or multi-phase yttrium-containing oxide by:
performing a deposition cycle comprising:
co-injecting a mixture of a first precursor for the yttrium-containing oxide and a second precursor for the additional zirconium-, erbium- or aluminum-containing oxide into a deposition chamber containing the chamber component to cause the first precursor and the second precursor to adsorb onto the pore walls to form a first half reaction; and
injecting an oxygen-containing reactant into the deposition chamber to form a second half reaction; and
repeating the deposition cycle one or more times until a target thickness is reached.

12. The method of claim 7 , wherein the porous chamber component consists essentially of a two phase material comprising sintered particles of a first oxide and a second oxide that acts as a binder for the sintered particles of the first oxide, wherein the first oxide is selected from a group consisting of aluminum oxide and aluminum nitride and the second oxide is silicon dioxide.

13. The method of claim 7 , wherein t

Assignees

• Applied Materials Inc

Inventors

• Firouzdor Vahid
• Banda Sumanth
• Dhindsa Rajinder
• Byun Daniel
• Lovell Dana Marie

Classifications

• H10P72/722

  Details of electrostatic chucks · CPC title

• C23C16/045 Primary

  Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates · CPC title

• H01J37/32477

  characterised by the means for protecting vessels or internal parts, e.g. coatings · CPC title

• C23C16/45531

  specially adapted for making ternary or higher compositions · CPC title

• C23C16/34

  Nitrides {(C23C16/303 takes precedence)} · CPC title