Display substrate and manufacturing method thereof, display panel, and display device

Patent metadata

Field	Value
Publication number	US-10964838-B2
Application number	US-201916516290-A
Country	US
Kind code	B2
Filing date	Jul 19, 2019
Priority date	Aug 30, 2018
Publication date	Mar 30, 2021
Grant date	Mar 30, 2021

Abstract

The present disclosure discloses a display substrate, a manufacturing method thereof, a display panel, and a display device. The display substrate includes a base substrate, a black matrix disposed on the base substrate, and a switching unit and an optical detection unit that are disposed at a side of the black matrix away from the base substrate. The optical detection unit is electrically connected to the switching unit, and an orthographic projection of at least one of the switching unit and the optical detection unit on the base substrate is located in an orthographic projection of the black matrix on the base substrate. Since the orthographic projection of at least one of the switching unit and the optical detection unit on the base substrate is located in the orthographic projection of the black matrix on the base substrate, the aperture ratio of the display substrate may increase.

First claim

What is claimed is:

1. A display substrate, comprising:
a base substrate;
a black matrix on the base substrate;
a switching unit and an optical detection unit at a side of the black matrix away from the base substrate, wherein the optical detection unit is electrically connected to the switching unit, and an orthographic projection of at least one of the switching unit and the optical detection unit on the base substrate is within an orthographic projection of the black matrix on the base substrate; and
a color filter layer at a side of the switching unit away from the black matrix, wherein an orthographic projection of the color filter layer on the base substrate is staggered from an orthographic projection of the optical detection unit on the base substrate.

2. The display substrate according to claim 1 , wherein
an orthographic projection of the switching unit on the base substrate and an orthographic projection of the optical detection unit on the base substrate are both within an orthographic projection of the black matrix on the base substrate.

3. The display substrate according to claim 2 , wherein
the switching unit and the optical detection unit are distributed in a direction away from the base substrate, and the display substrate further comprises:
a passivation layer at a side of the switching unit away from the black matrix, wherein the passivation layer has a via-hole and at least part of the optical detection unit is in the via hole;
a color filter layer at a side of the passivation layer away from the switching unit, wherein an orthographic projection of the color filter layer on the base substrate is staggered from an orthographic projection of the optical detection unit on the base substrate;
a primary connection trace at a side of the optical detection unit away from the black matrix, and an auxiliary connection trace electrically connected to the primary connection trace, wherein the primary connection trace is electrically connected to the optical detection unit and configured to apply an operating voltage to the optical detection unit; and
an insulating layer between the black matrix and the switching unit, and a protective layer, a first auxiliary cathode, a supporting column and a second auxiliary cathode at a side of the color filter layer away from the base substrate, wherein the protective layer, the first auxiliary cathode, the supporting column and the second auxiliary cathode are distributed in a direction away from the base substrate, and the first auxiliary cathode is electrically connected to the second auxiliary cathode;
wherein the switching unit is a thin film transistor and comprises an active layer, a gate insulating layer, a gate electrode, an interlayer dielectric layer, and a source-drain electrode layer that are sequentially distributed in a direction away from the black matrix, wherein an orthographic projection of the active layer on the base substrate is within an orthographic projection of the color filter layer on the base substrate, and the source-drain electrode layer comprises a source electrode and a drain electrode; the optical detection unit is electrically connected to the drain electrode; the auxiliary connection trace, the source electrode, and the drain electrode are distributed in the same layer; the optical detection unit is a photodiode, and a photosensitive surface of the optical detection unit is a surface of the optical detection unit away from the black matrix.

4. The display substrate according to claim 1 , wherein
the switching unit comprises: an active layer, wherein an orthographic projection of the active layer on the base substrate is within the orthographic projection of the color filter layer on the base substrate.

5. The display substrate according to claim 1 , further comprising:
a primary connection trace at a side of the optical detection unit away from the black matrix, and an auxiliary connection trace electrically connected to the primary connection trace, wherein the primary connection trace is electrically connected to the optical detection unit and configured to apply an operating voltage to the optical detection unit.

6. The display substrate according to claim 5 , wherein the switching unit comprises:
a first electrode and a second electrode, wherein the optical detection unit is electrically connected to one of the first electrode and the second electrode, and the auxiliary connection trace, the first electrode, and the second electrode are disposed in the same layer.

7. The display substrate according to claim 6 , wherein
the switching unit is a thin film transistor, and comprises an active layer, a gate insulating layer, a gate electrode, an interlayer dielectric layer, and a source-drain electrode layer that are sequentially distributed in a direction away from the black matrix, wherein the source-drain electrode layer comprises a source electrode and a drain electrode, the first electrode is the source electrode, the second electrode is the drain electrode, and the optical detection unit is electrically connected to the second electrode.

8. The display substrate according to claim 1 , wherein
the optical detection unit is a photodiode, and a photosensitive surface of the optical detection unit is a surface of the optical detection unit away from the black matrix.

9. The display substrate according to claim 1 , wherein
the switching unit and the optical detection unit are distributed in a direction away from the black matrix, and the display substrate further comprises: a passivation layer at a side of the switching unit away from the black matrix, wherein the passivation layer has a via-hole and at least part of the optical detection unit is in the via hole.

10. The display substrate according to claim 1 , further comprising:
an insulating layer between the black matrix and the switching unit, and a protective layer, a first auxiliary cathode, a supporting column, and a second auxiliary cathode at a side of the color filter layer away from the base substrate, wherein the protective layer, the first auxiliary cathode, the supporting column, and the second auxiliary cathode are distributed in a direction away from the base substrate, and the first auxiliary cathode is electrically connected to the second auxiliary cathode.

11. A method for manufacturing a display substrate, comprising:
forming a black matrix on a base substrate;
forming a switching unit at a side of the black matrix away from the base substrate;
forming an optical detection unit at a side of the switching unit away from the black matrix, wherein the optical detection unit is electrically connected to the switching unit, and an orthographic projection of at least one of the switching unit and the optical detection unit on the base substrate is within an orthographic projection of the black matrix on the base substrate; and
forming a color filter layer at a side of the switching unit away from the black matrix, wherein an orthographic projection of the color filter layer on the base substrate is staggered from an orthographic projection of the optical detection unit on the base substrate.

12. The method according to claim 11 , further comprising:
forming a primary connection trace at a side of the optical detection unit away from the black matrix, wherein the primary connection trace is electrically connected to an auxiliary connection trace and the optical detection unit, respectively; and the switching unit comprises a first electrode and a second electrode, wherein the optical detection unit is electrically connected to one of the first electrode and the second electrode, and the auxiliary connection t

Assignees

• Boe Technology Group Co Ltd

Inventors

• Wang Guoying
• Song Zhen

Classifications

• H10W90/00

  Package configurations · CPC title

• H10F55/00

  Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto · CPC title

• H10F39/107

  having multiple elements covered by H10F30/00 in a repetitive configuration, e.g. radiation detectors comprising photodiode arrays · CPC title

• H10F39/103

  the at least one element covered by H10F30/00 having potential barriers, e.g. integrated devices comprising photodiodes or phototransistors · CPC title

• H10F55/10 Primary

  wherein the radiation-sensitive semiconductor devices control the electric light source, e.g. image converters, image amplifiers or image storage devices · CPC title