Method for providing hermetic electrical feedthrough

US10952332B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10952332-B2
Application numberUS-201916450398-A
CountryUS
Kind codeB2
Filing dateJun 24, 2019
Priority dateMay 28, 2008
Publication dateMar 16, 2021
Grant dateMar 16, 2021

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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This invention provides methods for the processing of platinum metallized high temperature co-fired ceramic (HTCC) components with minimum deleterious reactions between platinum and the glass constituents of the ceramic-glass body. The process comprises co-firing a multilayer laminate green ceramic-glass body with via structures filled with a platinum powder-based material in a reducing atmosphere with a specified level of oxygen partial pressure. The oxygen partial pressure should be maintained above a minimum threshold value for a given temperature level.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of fabricating a hermetic electrical feedthrough, the method comprising: providing a ceramic sheet, and having an upper surface and a lower surface, wherein said sheet includes silicon dioxide; forming at least one via hole in said sheet extending from said upper surface to said lower surface; inserting a conductive thickfilm paste, including platinum, into said via hole; laminating said sheet with said conductive thick film paste in said via hole between an upper ceramic sheet, and a lower ceramic sheet, to form a laminated substrate wherein said via hole is encased in ceramic; selecting an oxygen controlled environment, between 10 −38 and 10 −3 atmospheres of oxygen partial pressure, by introduction of other gasses selected from the group consisting of C0 2 /CO, C0 2 /NH 3 , C0 2 /H 2 , H 2 0/H 2 , H 2 0/NH 3 , H 2 0/CO, Nitrogen, or Argon, to balance platinum oxidation and silicon dioxide decomposition of said laminated substrate; firing said laminated substrate in said oxygen controlled environment to a temperature to sinter said laminated substrate to form a single sintered structure and cause said conductive thick film paste in said via hole to form a metallized via, including platinum in contact with ceramic, and cause said laminated substrate to form a fired laminated substrate and a hermetic seal around said metallized via; and removing said upper sheet material and said lower sheet material by lapping or grinding, to expose an upper and a lower surface of said metallized via. 2. The method according to claim 1 , wherein said sheet is formed of material comprised of at least 90% aluminum oxide. 3. The method according to claim 1 , wherein said fired laminated substrate after said firing and material removal steps is less than or equal to 40 mils thick. 4. The method according to claim 1 , wherein said fired laminated substrate after said firing and material removal steps is less than 15 mils thick. 5. The method according to claim 1 , wherein forming at least one via hole in said sheet comprises punching said via hole using a punch tool, etching said via hole using a solvent etching, using laser ablation or drilling said via hole. 6. The method according to claim 1 , wherein inserting a conductive material into said via hole comprises: disposing said sheet with said via hole between a stencil layer and a vacuum base, wherein said stencil layer includes at least one through hole that is aligned above said via hole; rolling said conductive material across said stencil layer; and pulling said conductive material into said via hole through said hole in said stencil layer with a vacuum created by said vacuum base. 7. The method according to claim 1 , further comprising laminating said sheet with paste filled via holes between said upper sheet and said lower sheet to form said laminated substrate; placing said sheet with paste filled via holes together with said upper ceramic sheet and said lower ceramic sheet in a heatpress; and applying heat and pressure by said heatpress until said laminated substrate is formed. 8. The method according to claim 1 , wherein said ceramic material comprises aluminum oxide, zirconium oxide or a mixture thereof. 9. The method according to claim 1 , wherein said fired laminated substrate has a thickness of less than 20 mils after removing said upper ceramic sheet and said lower ceramic sheet material. 10. The method according to claim 1 , wherein said fired laminated substrate has a thickness of 15-20 mils after removing said upper ceramic sheet and said lower ceramic sheet material.

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What does patent US10952332B2 cover?
This invention provides methods for the processing of platinum metallized high temperature co-fired ceramic (HTCC) components with minimum deleterious reactions between platinum and the glass constituents of the ceramic-glass body. The process comprises co-firing a multilayer laminate green ceramic-glass body with via structures filled with a platinum powder-based material in a reducing atmosph…
Who is the assignee on this patent?
Second Sight Medical Products Inc
What technology area does this patent fall under?
Primary CPC classification B32B37/02. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Mar 16 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).