Alignment measurement system

US10942461B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10942461-B2
Application numberUS-201816639566-A
CountryUS
Kind codeB2
Filing dateJul 2, 2018
Priority dateAug 16, 2017
Publication dateMar 9, 2021
Grant dateMar 9, 2021

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

An apparatus for determining a characteristic of a feature of an object comprises: a measurement radiation source; a measurement radiation delivery system; a measurement system; a pump radiation source; and a pump radiation delivery system. The measurement radiation source is operable to produce measurement radiation and the measurement radiation delivery system is operable to irradiate at least a part of a top surface of the object with the measurement radiation. The measurement system is operable to receive at least a portion of the measurement radiation scattered from the top surface and is further operable to determine a characteristic of the feature of the object from at least a portion of the measurement radiation scattered from the top surface. The pump radiation source is operable to produce pump radiation and the pump radiation delivery system is operable to irradiate at least a part of the top surface of the object with the pump radiation so as to produce a mechanical response (for example an acoustic wave) in the object.

First claim

Opening claim text (preview).

The invention claimed is: 1. An apparatus comprising: a measurement radiation source operable to produce measurement radiation for irradiating a top surface of an object; a measurement radiation delivery system operable to guide the measurement radiation to the object to irradiate at least a part of the top surface of the object with the measurement radiation; a measurement system operable to receive at least a portion of the measurement radiation scattered from the top surface of the object and to determine a characteristic of a feature of the object from at least a portion of the measurement radiation scattered from the top surface a pump radiation source operable to produce pump radiation; and a pump radiation delivery system operable to irradiate the top surface of the object with the pump radiation so as to produce a mechanical response in the object. 2. The apparatus of claim 1 , wherein the measurement radiation delivery system and the pump radiation delivery system are configured such that an angle of incidence of the pump radiation at an object plane is different from an angle of incidence of the measurement radiation at the object plane. 3. The apparatus of claim 1 , wherein the pump radiation delivery system is configured such that the pump radiation is incident on an object plane at a non-zero angle of incidence. 4. The apparatus of claim 1 , wherein the pump radiation delivery system comprises an optical fiber. 5. The apparatus of claim 1 , further comprising: a controller, the controller being operable to control the measurement radiation source and the pump radiation source, and wherein the controller is operable to operate in either a first operational mode when the pump radiation source is not producing pump radiation or a second operational mode when the pump radiation source is producing pump radiation at least part of the time. 6. The apparatus of claim 5 , wherein: the measurement radiation source is operable to produce first measurement radiation or second measurement radiation; and the controller is operable to control the measurement radiation source to produce the first measurement radiation when operating in the first operational mode and to control the measurement radiation source to produce the second measurement radiation when operating in the second operational mode. 7. The apparatus of claim 1 , wherein an angular distribution of measurement radiation from which the measurement radiation system determines the characteristic of the feature of the object, is controllable. 8. The apparatus of claim 7 , wherein the controller is operable to control the angular distribution of measurement radiation from which the measurement radiation system determines the characteristic of the feature of the object such that the characteristic of the feature of the object is determined from a first angular distribution when the controller is operating in the first operational mode and from a second angular distribution when the controller is operating in the second operational mode. 9. The apparatus of claim 1 , wherein a sensitivity of a sensor of the measurement system to noise is controllable. 10. The apparatus of claim 1 , wherein the measurement radiation delivery system comprises an interferometer having a first optical path and a second optical path, the interferometer comprising a polarization independent beam splitter arranged to: receive the measurement radiation from the measurement radiation source; generate from the measurement radiation: a first portion that is directed along the first optical path then irradiates, and scatters from, a surface of the object, and is then directed along the second optical path and a second portion that is directed along the second optical path then irradiates, and scatters from, a surface of the object, and is then directed along the first optical path; and recombine the first and second portions of the measurement radiation to form output radiation; wherein the characteristic of the feature of the object is determined in dependence on the output radiation. 11. A lithography apparatus comprising: an illumination system configured to illuminate a pattern of a patterning device; a projection system configured to project an image of the pattern onto an object and an apparatus comprising: a measurement radiation source operable to produce measurement radiation for irradiating a top surface of the substrate; a measurement radiation delivery system operable to guide the measurement radiation to the object to irradiate at least a part of the top surface of the object with the measurement radiation; a measurement system operable to receive at least a portion of the measurement radiation scattered from the top surface of the object and to determine a characteristic of a feature of the object from at least a portion of the measurement radiation scattered from the top surface; a pump radiation source operable to produce pump radiation; and a pump radiation delivery system operable to irradiate the top surface of the object with the pump radiation so as to produce a mechanical response in the object. 12. A method comprising: producing measurement radiation using a measurement radiation source for irradiating a top surface of an object guiding the measurement radiation to the object using a measurement radiation delivery system to irradiate at least a portion of the top surface with the measurement radiation; producing pump radiation using a pump radiation source; guiding the pump radiation to irradiate the top surface of the object using a pump radiation delivery system so as to produce a mechanical response in the object before the top surface of the object is irradiated with the measurement radiation; receiving at least a portion of the measurement radiation scattered from the top surface at a measurement system; and determining a characteristic of a feature of the object from at least a portion of the measurement radiation scattered from the top surface. 13. The method of claim 12 , wherein when the top surface of the object is irradiated by the pump radiation, an angle of incidence of the pump radiation at the top surface of the object is different from an angle of incidence of the measurement radiation at the top surface of the object. 14. The method of claim 12 , wherein when the top surface of the object is irradiated by the pump radiation, the pump radiation is incident on the top surface of the object at a non-zero angle of incidence. 15. The method of claim 12 , wherein: a temporal duration of pulses of the measurement radiation and the pump radiation is substantially the same. 16. The method of claim 12 , further comprising controlling an angular distribution of the measurement radiation. 17. An apparatus comprising: a measurement radiation source operable to produce measurement radiation for irradiating a top surface of an object; a polarization independent interferometer having a first optical path and a second optical path, the interferometer comprising a polarization independent beam splitter arranged to: receive the measurement radiation from the measurement radiation source; generate from the measurement radiation a first portion that is guided along the first optical path then irradiates, and scatters from, a surface of the object, and is then guided along the second optical path and a second portion that is guided along the second optical path then irradiates, and scatters from, a surface of the object, and is then guided along the first optical path; and recombine the first

Assignees

Inventors

Classifications

  • Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels · CPC title

  • Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength · CPC title

  • G03F9/7049Primary

    Technique, e.g. interferometric · CPC title

  • Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves · CPC title

  • G03F9/7069Primary

    Alignment mark illumination, e.g. darkfield, dual focus · CPC title

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What does patent US10942461B2 cover?
An apparatus for determining a characteristic of a feature of an object comprises: a measurement radiation source; a measurement radiation delivery system; a measurement system; a pump radiation source; and a pump radiation delivery system. The measurement radiation source is operable to produce measurement radiation and the measurement radiation delivery system is operable to irradiate at leas…
Who is the assignee on this patent?
Asml Netherlands Bv
What technology area does this patent fall under?
Primary CPC classification G03F9/7049. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 09 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).