Fe—Pt based magnetic material sintered compact

US10937455B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10937455-B2
Application numberUS-202016933071-A
CountryUS
Kind codeB2
Filing dateJul 20, 2020
Priority dateSep 21, 2012
Publication dateMar 2, 2021
Grant dateMar 2, 2021

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Abstract

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Provided is an Fe—Pt based magnetic material sintered compact, comprising BN and SiO2 as non-magnetic materials, wherein Si and O are present in a region where B or N is present at a cut surface of the sintered compact. A high density sputtering target is provided which enables production of a magnetic thin film for heat-assisted magnetic recording media, and also reduces the amount of particles generated during sputtering.

First claim

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I claim: 1. A Fe—Pt based magnetic material sintered compact, consisting of iron, platinum and 0.5 mol % or more and 10.0 mol % or less of one or more elements selected from the group consisting of B, Ru, Ag, Au and Cu forming a sintered alloy and particles of hexagonal BN and SiO 2 dispersed in the sintered alloy, wherein, in an element mapping image obtained by a Field Emission Electron Probe Micro Analyzer (FE-EPMA) of a cross-sectional surface of the sintered compact, elements of Si and O are detected in a same area as that where elements of B and N are detected, and wherein, in X-ray diffraction analysis of a cross-sectional surface of the sintered compact which is parallel to a pressurized face of the sintered compact, an X-ray diffraction peak from (002) plane of hexagonal BN is present, and an X-ray diffraction peak from (101) plane of cristobalite has an intensity ratio of 1.40 or less relative to a back-ground intensity of the (101) X-ray diffraction peak. 2. The Fe—Pt based magnetic material sintered compact according to claim 1 , wherein the X-ray diffraction peak from (002) plane of hexagonal BN has an intensity ratio of 1.50 or more relative to a back-ground intensity of the (002) X-ray diffraction peak. 3. The Fe—Pt based magnetic material sintered compact according to claim 2 , wherein the content of SiO 2 has a ratio of 1% or more relative to the content of hexagonal BN. 4. The Fe—Pt based magnetic material sintered compact according to claim 3 , wherein the sintered compact has a content of Pt in an amount of 5 mol % or more and 60 mol % or less, a content of BN in an amount of 1 mol % or more and 50 mol % or less, and a content of SiO 2 in an amount of 0.5 mol % or more and 20 mol % or less. 5. The Fe—Pt based magnetic material sintered compact according to claim 1 , wherein a content of SiO 2 in the sintered compact has a ratio of 1% or more relative to a content of hexagonal BN. 6. The Fe—Pt based magnetic material sintered compact according to claim 1 , wherein the sintered compact has a content of Pt in an amount of 5 mol % or more and 60 mol % or less, a content of BN in an amount of 1 mol % or more and 50 mol % or less, a content of SiO 2 in an amount of 0.5 mol % or more and 20 mol % or less. 7. A Fe—Pt based magnetic material sintered compact, consisting of iron and platinum forming a sintered Fe—Pt alloy, particles of hexagonal BN and SiO 2 dispersed in the sintered Fe—Pt alloy, and at least one inorganic material selected from the group consisting of oxides other than SiO 2 , nitrides other than BN, carbides and carbon nitrides as an additive, wherein, in an element mapping image obtained by a Field Emission Electron Probe Micro Analyzer (FE-EPMA) of a cross-sectional surface of the sintered compact, elements of Si and O are detected in a same area as that where elements of B and N are detected, and wherein, in X-ray diffraction analysis of a cross-sectional surface of the sintered compact which is parallel to a pressurized face of the sintered compact, an X-ray diffraction peak from (002) plane of hexagonal BN is present, and an X-ray diffraction peak from (101) plane of cristobalite has an intensity ratio of 1.40 or less relative to a back-ground intensity of the (101) X-ray diffraction peak. 8. The Fe—Pt based magnetic material sintered compact according to claim 7 , wherein the X-ray diffraction peak from (002) plane of hexagonal BN has an intensity ratio of 1.50 or more relative to a back-ground intensity of the (002) X-ray diffraction peak. 9. The Fe—Pt based magnetic material sintered compact according to claim 8 , wherein the content of SiO 2 has a ratio of 1% or more relative to the content of hexagonal BN. 10. The Fe—Pt based magnetic material sintered compact according to claim 9 , wherein the sintered compact has a content of Pt in an amount of 5 mol % or more and 60 mol % or less, a content of BN in an amount of 1 mol % or more and 50 mol % or less, and a content of SiO 2 in an amount of 0.5 mol % or more and 20 mol % or less. 11. The Fe—Pt based magnetic material sintered compact according to claim 7 , wherein a content of SiO 2 in the sintered compact has a ratio of 1% or more relative to a content of hexagonal BN. 12. The Fe—Pt based magnetic material sintered compact according to claim 7 , wherein the sintered compact has a content of Pt in an amount of 5 mol % or more and 60 mol % or less, a content of BN in an amount of 1 mol % or more and 50 mol % or less, a content of SiO 2 in an amount of 0.5 mol % or more and 20 mol % or less. 13. A Fe—Pt based magnetic material sintered compact, consisting of iron, platinum and 0.5 mol % or more and 10.0 mol % or less of one or more elements selected from the group consisting of B, Ru, Ag, Au and Cu forming a sintered alloy and particles of hexagonal BN and SiO 2 dispersed in the sintered alloy and at least one inorganic material selected from the group consisting of oxides other than SiO 2 , nitrides other than BN, carbides and carbon nitrides as an additive, wherein, in an element mapping image obtained by a Field Emission Electron Probe Micro Analyzer (FE-EPMA) of a cross-sectional surface of the sintered compact, elements of Si and O are detected in a same area as that where elements of B and N are detected, and wherein, in X-ray diffraction analysis of a cross-sectional surface of the sintered compact which is parallel to a pressurized face of the sintered compact, an X-ray diffraction peak from (002) plane of hexagonal BN is present, and an X-ray diffraction peak from (101) plane of cristobalite has an intensity ratio of 1.40 or less relative to a back-ground intensity of the (101) X-ray diffraction peak. 14. The Fe—Pt based magnetic material sintered compact according to claim 13 , wherein the X-ray diffraction peak from (002) plane of hexagonal BN has an intensity ratio of 1.50 or more relative to a back-ground intensity of the (002) X-ray diffraction peak. 15. The Fe—Pt based magnetic material sintered compact according to claim 14 , wherein the content of SiO 2 has a ratio of 1% or more relative to the content of hexagonal BN. 16. The Fe—Pt based magnetic material sintered compact according to claim 15 , wherein the sintered compact has a content of Pt in an amount of 5 mol % or more and 60 mol % or less, a content of BN in an amount of 1 mol % or more and 50 mol % or less, and a content of SiO 2 in an amount of 0.5 mol % or more and 20 mol % or less. 17. The Fe—Pt based magnetic material sintered compact according to claim 13 , wherein a content of SiO 2 in the sintered compact has a ratio of 1% or more relative to a content of hexagonal BN. 18. The Fe—Pt based magnetic material sintered compact according to claim 13 , wherein the sintered compact has a content of Pt in an amount of 5 mol % or more and 60 mol % or less, a content of BN in an amount of 1 mol % or more and 50 mol % or less, a content of SiO 2 in an amount of 0.5 mol % or more and 20 mol % or less.

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Classifications

  • containing copper · CPC title

  • Sputtering targets therefor · CPC title

  • Aspects linked to processes or compositions used in powder metallurgy · CPC title

  • by powder metallurgy · CPC title

  • mixtures of metallic and non-metallic particles; metallic particles having oxide skin · CPC title

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What does patent US10937455B2 cover?
Provided is an Fe—Pt based magnetic material sintered compact, comprising BN and SiO2 as non-magnetic materials, wherein Si and O are present in a region where B or N is present at a cut surface of the sintered compact. A high density sputtering target is provided which enables production of a magnetic thin film for heat-assisted magnetic recording media, and also reduces the amount of particle…
Who is the assignee on this patent?
Jx Nippon Mining & Metals Corp
What technology area does this patent fall under?
Primary CPC classification G11B5/653. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 02 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).