Nanoimprint template with light blocking material and method of fabrication

Patent metadata

Field	Value
Publication number	US-10935883-B2
Application number	US-201715720308-A
Country	US
Kind code	B2
Filing date	Sep 29, 2017
Priority date	Sep 29, 2017
Publication date	Mar 2, 2021
Grant date	Mar 2, 2021

Abstract

A nanoimprint lithography template, method of fabrication, and method of manufacturing an article using the same. The template includes a body having first and second opposed sides, the second side having a mesa extending therefrom, with the mesa having sidewalls and a surface. A recessed shelf extends around a perimeter of the mesa surface, with a light-blocking material positioned on at least the recessed shelf and at a thickness such that the light-blocking material does not extend beyond a plane defined by the mesa surface.

First claim

What is claimed is:

1. A nanoimprint template comprising:
a body having first and second opposed sides, the second side having a mesa extending therefrom, the mesa having sidewalls and a surface, the surface having a pattern feature comprising a protrusion that extends from the surface;
a shelf recessed from the surface having the pattern feature and positioned between the sidewalls and the surface having the pattern feature, the shelf extending around a perimeter of the surface having the pattern feature; and
a light-blocking material positioned on the shelf at a thickness such that a top surface of the light-blocking material does not extend beyond the surface having the pattern feature.

2. The nanoimprint template of claim 1 wherein the light blocking material is chromium, molybdenum silicide, tungsten or tantalum.

3. The nanoimprint template of claim 1 wherein the shelf has a depth of 20 nm to 1 mm.

4. The nanoimprint template of claim 1 wherein the shelf extends from the mesa by a distance of 20 nm to 20 mm.

5. The nanoim print template of claim 1 further comprising light-blocking material positioned on at least a portion of the mesa sidewalls.

6. The nanoimprint template of claim 1 further comprising light-blocking material positioned on at least a portion of the second side of the template body.

7. The nanoimprint template of claim 1 wherein the shelf recessed from the surface defines a first shelf and further comprising a second shelf surrounding the first shelf and positioned between a plane defined by the mesa surface and a plane defined by the second side of the template.

8. The nanoimprint template of claim 7 wherein the light-blocking material is positioned on the second recessed shelf at a thickness that does not extend beyond the mesa surface.

9. The nanoimprint template of claim 1 further comprising a protective coating layer positioned on the light blocking material.

10. The nanoimprint template of claim 1 , further comprising:
a second light-blocking material provided on at least a part of the sidewalls of the mesa.

11. The nanoimprint template of claim 7 , wherein the second shelf is at a lower depth below the plane defined by the mesa surface relative to the first shelf.

Assignees

• Canon Kk

Inventors

• Tavakkoli Kermani Ghariehali Amir
• Fletcher Edward Brian

Classifications

• H10P76/20

  of masks comprising organic materials · CPC title

• G03F7/091

  characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• G03F1/80

  Etching · CPC title

• B29C39/04

  using movable moulds (B29C41/02 takes precedence){not applied} · CPC title