Foreign material removing device, foreign material removing system, and foreign material removing method

US10935822B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10935822-B2
Application numberUS-201616309086-A
CountryUS
Kind codeB2
Filing dateJun 17, 2016
Priority dateJun 17, 2016
Publication dateMar 2, 2021
Grant dateMar 2, 2021

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

This foreign material removing device for removing a foreign material adhered to a substrate is provided with: a jetting unit that jets a gas toward a substrate portion having a width smaller than the full width of the substrate; a foreign material suction unit that sucks, with the foreign material, the gas jetted toward the substrate from the jetting unit; and a covering body that covers the portion to which the gas is to be jetted by means of the jetting unit.

First claim

Opening claim text (preview).

The invention claimed is: 1. A foreign matter removing system comprising: a detector configured to detect a position of foreign matter adhering to or embedded in a surface of a substrate; a foreign matter removing device configured to inject gas toward a region of the substrate and suck the gas to perform removal of the foreign matter adhering to the surface of the substrate, the region having a width shorter than an entire width of the substrate; and a controller configured to control operation of the foreign matter removing device based on a result of the detection by the detector, wherein the controller includes: a position information acquiring section configured to acquire position information indicating the position of the foreign matter from the detector; a specifying section configured to specify the region of the substrate toward which the gas is to be injected based on the position information acquired by the position information acquiring section; and an injection control section configured to cause the gas to be injected toward the region specified by the specifying section, wherein the detector re-detects a position of foreign matter adhering to or embedded in the surface of the substrate after the gas has been injected toward the region specified by the specifying section. 2. The foreign matter removing system according to claim 1 , wherein the controller includes a storage section configured to store therein position information indicating the position of the foreign matter that is acquired in an upstream process preceding the foreign matter removal, and the specifying section specifies the region of the substrate toward which the gas is to be injected by removing the position information stored in the storage section from the position information acquired by the position information acquiring section. 3. The foreign matter removing system according claim 1 , wherein upon the specifying section specifying another region toward which the gas is to be injected, the controller causes the gas to be injected toward the other region specified by the specifying section. 4. The foreign matter removing system according to claim 1 , further comprising a web cleaner configured to perform removal of the foreign matter adhering to the substrate over a larger area of the substrate than the foreign matter removing device does, wherein the substrate is each of liquid-crystal panel substrates for enclosing a liquid crystal therebetween, the web cleaner performs the removal of the foreign matter adhering to the substrate before the substrate is bonded to another substrate and after an alignment film has been formed on each of the two substrates, and the detector detects a position of foreign matter adhering to or embedded in the surface of the substrate after the removal has been performed by the web cleaner.

Assignees

Inventors

Classifications

  • B08B5/02Primary

    Cleaning by the force of jets, e.g. blowing-out cavities {(airguns or nozzles per se B05B1/005)} · CPC title

  • Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor · CPC title

  • G02F1/1303Primary

    Apparatus specially adapted to the manufacture of LCDs · CPC title

  • Cleaning by suction, with or without auxiliary action · CPC title

  • Cleaning by electrostatic means · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10935822B2 cover?
This foreign material removing device for removing a foreign material adhered to a substrate is provided with: a jetting unit that jets a gas toward a substrate portion having a width smaller than the full width of the substrate; a foreign material suction unit that sucks, with the foreign material, the gas jetted toward the substrate from the jetting unit; and a covering body that covers the p…
Who is the assignee on this patent?
Sakai Display Products Corp
What technology area does this patent fall under?
Primary CPC classification B08B5/02. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Mar 02 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).