Method and system for determining molecular structure

Patent metadata

Field	Value
Publication number	US-10935506-B2
Application number	US-201916450321-A
Country	US
Kind code	B2
Filing date	Jun 24, 2019
Priority date	Jun 24, 2019
Publication date	Mar 2, 2021
Grant date	Mar 2, 2021

Abstract

Molecular structure may be determined based on structure factors solved from the diffraction pattern and the electron microscopy image of the sample. In particular, the amplitudes of the structure factors may be determined based on intensities of diffraction peaks in the multiple diffraction patterns. The phases of the structure factors may be determined based on electron microscopy images and the intensities of the diffraction peaks.

First claim

What is claimed is:

1. A method for determining a molecular structure of a sample, comprising:
acquiring multiple diffraction patterns of the sample while tilting the sample relative to an incident beam;
determining an amplitude of a structure factor based on intensities of a diffraction peak in the multiple diffraction patterns;
acquiring a first electron microscopy (EM) image of the sample;
after acquiring the first EM image, acquiring a second EM image with a current density higher than a current density for acquiring the first EM image;
determining a phase of the structure factor based on the first EM image, the second EM image and the intensities of the diffraction peak in the multiple diffraction patterns; and
determining the molecular structure of the sample based on the amplitude of the structure factor and the phase of the structure factor.

2. The method of claim 1 , further comprising determining a contrast transfer function (CTF) based on the second EM image, and determining the phase of the structure factor based on the second EM image includes determining the phase of the structure factor based on the CTF.

3. The method of claim 1 , wherein acquiring the first EM image includes acquiring the first EM image at a tilt angle, and determining the phase of the structure factor based on the first EM image, the second EM image, and the intensities of the diffraction peak in the multiple diffraction patterns includes determining the phase of the structure factor at the tilt angle based on the first EM image and an intensity of the diffraction peak at the tilt angle.

4. The method of claim 3 , wherein the phase of the structure factor at the tilt angle is further determined based on an intensity of a Friedel mate of the diffraction peak.

5. The method of claim 4 , wherein the intensity of the diffraction peak and the intensity of the Friedel mate of the diffraction peak are different.

6. The method of claim 1 , wherein determining the amplitude of the structure factor based on intensities of the diffraction peak includes calculating the amplitude of the structure factor at a particular tilt angle by taking a square root of an intensity of the diffraction peak at the tilt angle.

7. The method of claim 1 , wherein determining the amplitude of the structure factor based on intensities of the diffraction peak includes fitting the intensities of the diffraction peak with a curve, and calculating the amplitude of the structure factor at a particular tilt angle by taking a square root of an intensity of the curve at the tilt angle.

8. The method of claim 1 , further includes identifying the diffraction peak by thresholding the multiple diffraction patterns.

9. The method of claim 1 , wherein intensities of the diffraction peak in the multiple diffraction patterns are nonzero.

10. The method of claim 1 , wherein the sample is a lamella.

11. A non-transitory computer-readable medium comprising instructions that, when executed, cause a processor to:
acquire multiple diffraction patterns of a sample while titling the sample relative to an incident beam;
determine amplitudes of structure factors based on intensities of each diffraction peak in the multiple diffraction patterns;
acquire multiple electron microscopy (EM) images of the sample at multiple tilt angles;
determine intensities of Friedel pairs of the structure factors based on the intensities of the diffraction peaks;
determine phases of the structure factors based on the multiple EM images and the intensities of Friedel pairs of the structure factors; and
determine a molecular structure of the sample based on the amplitudes of the structure factors and the phases of the structure factors.

12. The non-transitory computer-readable medium of claim 11 , wherein determine the phases of the structure factors based on the multiple EM images and the intensities of the diffraction peaks includes determine phases of the structure factors based on the multiple EM images and the intensities of Friedel pairs of the diffraction peaks.

13. The non-transitory computer-readable medium of claim 11 , further comprising instructions that, when executed, cause the processor to acquire the multiple diffraction patterns at a first location of the sample, and acquire the multiple EM images a second location of the sample.

14. A system for determining a molecular structure of a sample, comprising:
an electron source for generating an electron beam;
a sample holder for tilting the sample relative to the electron beam;
a first detector for acquiring a diffraction pattern of the sample;
a second detector for acquiring an electron microscopy (EM) image of the sample;
a controller with computer readable instructions stored in a non-transitory medium, configured to:
direct the electron beam towards a first location of the sample and acquire multiple electron diffraction patterns of the sample via the first detector while the sample is tilted relative to the electron beam via the sample holder;
determine an amplitude of a structure factor based on intensities of a diffraction peak in the multiple diffraction patterns;
direct the electron beam to a second location of the sample and acquire a low dose EM image of the sample via the second detector;
determine a phase of the structure factor based on the low dose EM image and the intensities of the diffraction peak; and
determine the molecular structure of the sample based on the amplitude of the structure factor and the phase of the structure factor.

15. The system of claim 14 , wherein the controller is further configured to:
position the sample at a first tilt angle before directing the electron beam to the second location of the sample and acquiring the low dose EM image;
acquire a high dose EM image at the second location of the sample after acquiring the low dose EM image; and
wherein determine the phase of the structure factor based on the low dose EM image and the intensities of the diffraction peak includes determine the phase of the structure factor at the first tilt angle based on the low dose EM image, the intensities of the diffraction peak, and the high dose EM image.

16. The system of claim 14 , wherein the controller is further configured to tilt the sample along two orthogonal axes, and acquiring the multiple diffraction patterns includes acquiring a first group of diffraction patterns while tilting the sample along one of the two orthogonal axes, and acquiring a second group of diffraction patterns while tilting the sample along the other of the two orthogonal axes.

17. The system of claim 15 , wherein the controller is further configured to:
position of the sample at a second tilt angle after acquiring the high dose EM image;
direct the electron beam to a third location of the sample positioned at the second tilt angle, and sequentially acquire a second low dose EM image and a second high dose EM image of the sample;
determine the phase of the structure factor at the second tilt angle based on the second low dose EM image, the second high dose EM image, and the intensities of the diffraction peak; and
wherein determine the molecular structure based on the amplitude of the structure factor and the phase of the structure factor includes determine the molecular structure based on the amplitude of the structure factor, the phase of the structure factor at the first tilt angle, and the phase of the structure factor at the second tilt angle.

18. The system of claim 14 , wherein the controller is configured to acquire the multiple diffraction pat

Assignees

• Fei Co

Inventors

• Buijsse Bart
• Kotecha Abhay

Classifications

• G01N23/2055 Primary

  Analysing diffraction patterns · CPC title

• G01N23/04

  and forming images of the material · CPC title

• G01N23/2251 Primary

  using incident electron beams, e.g. scanning electron microscopy [SEM] · CPC title

• G01N2223/03

  by transmission · CPC title

• G01N2223/102

  beta or electrons · CPC title