Chemical and topological surface modification to enhance coating adhesion and compatibility

Patent metadata

Field	Value
Publication number	US-10934220-B2
Application number	US-201815998736-A
Country	US
Kind code	B2
Filing date	Aug 16, 2018
Priority date	Aug 16, 2018
Publication date	Mar 2, 2021
Grant date	Mar 2, 2021

Abstract

A process of coating a substrate containing silicon with an environmental barrier coating, comprising altering a surface of the substrate and applying an environmental barrier layer to the surface of the substrate.

First claim

What is claimed is:

1. A process of coating a substrate containing silicon with an environmental barrier coating, comprising:
mechanical removal of material comprising at least one of creating divots in said surface, creating lines in said surface, wherein the divots and the lines are arranged in patterns;
altering a surface of said substrate, by modifying a texture of said surface through a physical addition of material wherein said texture modification results in a surface topology wherein said surface topology is created by embedding particles into said surface by directional deposition;
exposing said surface to a plasma; and
applying an environmental barrier layer to said surface of said substrate.

2. The process of claim 1 , wherein said substrate comprises a ceramic matrix composite material.

3. The process of claim 1 , wherein said altering step comprises a physical process.

4. The process of claim 1 , further comprising: at least one of altering a chemical structure of said surface and altering a chemical function of said surface.

5. The process of claim 1 , wherein the surface has organic contaminants, further comprising: removing the organic contaminants.

6. The process of claim 1 , wherein said substrate comprises at least one of a turbine vane and a turbine blade.

7. The process of claim 1 , further comprising:
applying a protective layer on said environmental barrier layer.

8. The process of claim 1 , further comprising:
utilizing a contact mask for isolating a predetermined area for adhesion of said environmental barrier coating.

9. The process of claim 1 , further comprising:
utilizing a contact mask for isolating a predetermined area for promoting chemical vapor infiltration growth during coating.

10. The process of claim 1 , wherein said surface topology comprises characteristics that enhance bonding.

11. The process of claim 10 , wherein said characteristics that enhance bonding are selected from the group consisting of a chemical uniformity, OH or Cr—Si group activity and a surface tortuosity, roughness and angularity.

12. The process of claim 11 , wherein said surface tortuosity comprises at least one of a roughness and angularity.

13. The process of claim 1 , wherein said surface topology is pre-determined in particular patterns.

14. The process of claim 1 , wherein said environmental barrier layer comprises an oxidant getter phase, said oxidant getter phase being selected from the group consisting of silicon oxycarbide and elemental silicon.

15. The process of claim 1 , wherein said environmental barrier layer comprises at least one of (rare earth) RE-monosilicates, disilicates and (alkaline earth) AE alumino silicates, silicates of Hafnium and zirconium, and oxides of Hafnium or zirconium.

16. The process of claim 1 , wherein said environmental barrier layer comprises an oxide matrix and an oxidant getter phase interspersed throughout the oxide matrix, the oxide matrix contains a self-healing phase that contains at least one of doped silicates, compatible metals/metal alloys, non-oxide glasses, silica, and glass/glass ceramics comprising BAS, BMAS, LAS, SAS.

Assignees

• United Tech Corportion
• Raytheon Tech Corp

Inventors

• Mikalsen Erik A
• Beals James T
• Kashyap Tania Bhatia

Classifications

• C04B41/0027 Primary

  Ion-implantation, ion-irradiation or ion-injection · CPC title

• C04B41/85 Primary

  with inorganic materials · CPC title

• C23C28/042

  including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides · CPC title

• C04B41/0054

  Plasma-treatment, e.g. with gas-discharge plasma · CPC title

• B23K26/0006

  taking account of the properties of the material involved (B23K26/32, B23K26/40 take precedence) · CPC title