Substrate having an intermediate coating and a carbon coating

Patent metadata

Field	Value
Publication number	US-10927452-B2
Application number	US-201615573144-A
Country	US
Kind code	B2
Filing date	Apr 13, 2016
Priority date	May 11, 2015
Publication date	Feb 23, 2021
Grant date	Feb 23, 2021

Abstract

Components suitable for chemically aggressive environments are disclosed, as well as methods for producing the components. One component may include a substrate having at least one surface having a layer system, which may include an amorphous carbon layer. The layer system may include at least one metallic intermediate layer which is arranged between the substrate and the amorphous carbon layer. The metallic intermediate layer may include titanium, a titanium alloy, nickel, or a nickel alloy. A two-layer bonding layer may be arranged between the at least one intermediate layer and the substrate and a first bonding layer composed of NiP. A second bonding layer composed of a nickel-chromium alloy or a nickel-vanadium alloy may also be present. The amorphous carbon layer may form an outer layer of the layer system facing away from the substrate and may comprise at least one amorphous hydrogen-containing carbon layer.

First claim

The invention claimed is:

1. A component comprising a substrate having at least one surface which is provided with a layer system, where the layer system comprises at least one amorphous carbon layer,
wherein the layer system further comprises at least one metallic intermediate layer which is arranged between the substrate and the at least one amorphous carbon layer, where the at least one metallic intermediate layer includes titanium, a titanium alloy, nickel, or a nickel alloy, and furthermore a separate two-layer bonding layer, which is arranged between the at least one metallic intermediate layer and the substrate, is present and includes a first amorphous single phase bonding layer composed of NiP adjoining the substrate and, on top of the first amorphous single phase bonding layer, a second bonding layer composed of a nickel-chromium alloy or a nickel-vanadium alloy, and wherein the at least one amorphous carbon layer forms an outer layer of the layer system facing away from the substrate and comprises at least one amorphous hydrogen-containing carbon layer.

2. The component as claimed in claim 1 , wherein the at least one amorphous hydrogen-containing carbon layer comprises a doping element which is formed by a metal or a nonmetal.

3. The component as claimed in claim 1 , wherein the amorphous hydrogen-containing carbon layer has a hydrogen content in the range from 10 to 25 at.-%.

4. The component as claimed in claim 1 , wherein a total layer thickness of the layer system is in the range from 2 μm to 100 μm.

5. The component as claimed in claim 1 , wherein the substrate is made from steel.

6. The component as claimed in claim 1 , wherein the at least one metallic intermediate layer is made from a titanium-nickel alloy.

7. A device comprising:
the component as claimed in claim 1 ; and
a friction partner, wherein the component acts at least in a region of the layer system in combination with the friction partner in a chemically aggressive environment.

8. A process for producing the component as claimed in claim 1 , comprising:
depositing the two-layer bonding layer on the substrate;
depositing the at least one metallic intermediate layer on the two-layer bonding layer; and
depositing the at least one amorphous carbon layer comprising the at least one amorphous hydrogen-containing carbon layer on the at least one metallic intermediate layer.

9. The process as claimed in claim 8 , wherein the two-layer bonding layer, the at least one metallic intermediate layer, or the at least one amorphous carbon layer comprising the at least one amorphous hydrogen-containing carbon layer are deposited by means of PVD or PACVD.

10. The process as claimed in claim 8 , wherein the at least one metallic intermediate layer and the two-layer bonding layer are deposited by electrochemical deposition or by thermal spraying and the at least one amorphous carbon layer comprising the at least one amorphous hydrogen-containing carbon layer is deposited by PVD or PACVD.

11. A component comprising:
a substrate comprising a surface; and
a layer system adhered to the surface, the layer system comprising:
a two-layer bonding layer comprising:
a first amorphous single phase bonding layer including a nickel-phosphorous alloy adjoining the substrate; and
a second bonding layer including a nickel-chromium alloy or a nickel-vanadium alloy;

a metallic intermediate layer including titanium, a titanium alloy, nickel, or a nickel alloy; and
an amorphous carbon layer forming an outer layer facing away from the substrate and including an amorphous hydrogen-containing carbon layer.

12. The component of claim 11 , wherein the amorphous hydrogen-containing carbon layer comprises a doping element which is formed by a metal or a nonmetal.

13. The component of claim 11 , wherein the amorphous hydrogen-containing carbon layer has a hydrogen content of 15 to 20 at.-%.

14. The component of claim 11 , wherein a total layer thickness of the layer system is between 2 μm and 100 μm.

15. The component of claim 11 , wherein the substrate is made from steel.

16. The component of claim 11 , wherein the metallic intermediate layer includes a titanium-nickel alloy.

17. A process for producing the component of claim 11 , comprising:
depositing the two-layer bonding layer onto the substrate;
depositing the metallic intermediate layer onto the two-layer bonding layer; and
depositing the amorphous carbon layer onto the metallic intermediate layer.

18. The process of claim 17 , wherein the two-layer bonding layer, the metallic intermediate layer, or the amorphous carbon layer is deposited by physical vapor deposition (PVD) or plasma assisted chemical vapor deposition (PACVD).

19. The process of claim 17 , wherein:
the metallic intermediate layer or the two-layer bonding layer is deposited by electrochemical deposition or thermal spraying; and
the amorphous carbon layer is deposited by means of physical vapor deposition (PVD) or plasma assisted chemical vapor deposition (PACVD).

Assignees

• Schaeffler Technologies Ag

Inventors

• Musayev Yashar
• Schulz Edgar
• Procelewska Joanna

Classifications

• C22C19/007

  with a light metal (alkali metal Li, Na, K, Rb, Cs; earth alkali metal Be, Mg, Ca, Sr, Ba, Al Ga, Ge, Ti) or B, Si, Zr, Hf, Sc, Y, lanthanides, actinides, as the next major constituent · CPC title

• Y10T428/12625

  Free carbon containing component · CPC title

• C22C19/03

  based on nickel · CPC title

• C23C16/26

  Deposition of carbon only · CPC title

• C25D3/562

  containing more than 50% by weight of iron or nickel or cobalt · CPC title