Adaptive pitch steering in a longwall shearing system

US10920588B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10920588-B2
Application numberUS-201815995998-A
CountryUS
Kind codeB2
Filing dateJun 1, 2018
Priority dateJun 2, 2017
Publication dateFeb 16, 2021
Grant dateFeb 16, 2021

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  1. Title

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Abstract

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Methods and systems of controlling a pitch angle of a shearer. A controller receives a sensor signal indicative of the pitch angle of the shearer, and receives a target pitch profile defining a plurality of target pitch angles for different sections of a mineral face. The controller determines a pitch difference between the pitch angle and a target pitch angle of the shearer, determines a pitch correction height corresponding to a new height for a floor cutter of the shearer based on the pitch difference, and changes a height of the floor cutter based on the pitch correction height.

First claim

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What is claimed is: 1. A method of controlling a pitch angle of a shearer, the method comprising: storing in a memory, as historical corrective actions, for one or more previous shearer passes, a previous pitch correction height, a previous pitch difference, and a previous achieved change in pitch angle resulting from changing a height of a floor cutter of the shearer based on the previous pitch correction height; receiving a sensor signal indicative of the pitch angle of the shearer; receiving a target pitch profile defining a plurality of target pitch angles for different sections of a mineral face; determining, with an electronic processor, a pitch difference between the pitch angle and a target pitch angle of the plurality of target pitch angles of the target pitch profile; determining a pitch compensation value based on the historical corrective actions; determining, with the electronic processor, a pitch correction height corresponding to a new height for the floor cutter based on the pitch difference and pitch compensation value; and changing, with the electronic processor, a height of the floor cutter based on the pitch correction height. 2. The method of claim 1 , wherein determining the pitch correction height includes calculating the pitch correction height by translating the pitch difference to a change in vertical position of the floor cutter and adding the pitch compensation value to determine a target vertical position of the floor cutter. 3. The method of claim 1 , further comprising: determining the target pitch angle from the target pitch profile based on a current lateral position of the floor cutter. 4. The method of claim 1 , further comprising: determining the height of the floor cutter based on the sensor signal. 5. The method of claim 1 , further comprising: receiving smoothing configuration parameters; and generating the target pitch profile based on an initial target pitch profile and the smoothing configuration parameters such that the plurality of target pitch angles for different sections of a mineral face are smoothed. 6. The method of claim 1 , further comprising: receiving a nominal pitch profile for the shearer, accessing a correction offset input by an external source for a section of the mineral face, and generating the target pitch profile based on the nominal pitch profile and the correction offset. 7. The method of claim 6 , further comprising: determining a correction pass count for the correction offset; and in response to determining a number of shearer passes since the correction offset has reached a correction pass count, setting the target pitch angle for the section of the mineral face to the nominal pitch profile. 8. A system of controlling a pitch angle of a shearer, the system comprising: a shearer sensor configured to sense a position characteristic of the shearer; a floor cutter driven by a cutter motor; and a controller coupled to the shearer sensor and the cutter motor, and including an electronic processor and a memory, the electronic processor configured to store in the memory, as historical corrective actions, for one or more previous shearer passes, a previous pitch correction height, a previous pitch difference, and a previous achieved change in pitch angle resulting from changing a height of the floor cutter of the shearer based on the previous pitch correction height, receive a sensor signal from the shearer sensor indicative of the pitch angle of the shearer, receive a target pitch profile defining a plurality of target pitch angles for different sections of a mineral face, determine a pitch difference between the pitch angle and a target pitch angle of the plurality of target pitch angles of the target pitch profile, determine a pitch compensation value based on the historical corrective actions, determine a pitch correction height corresponding to a new height for a floor cutter of the shearer based on the pitch difference and the pitch compensation, and change the height of the floor cutter based on the pitch correction height. 9. The system of claim 8 , wherein determining the pitch correction height includes calculating the pitch correction height by translating the pitch difference to a change in vertical position of the floor cutter and adding the pitch compensation value to determine a target vertical position of the floor cutter. 10. The system of claim 8 , wherein the electronic processor is further configured to: determine the target pitch angle from the target pitch profile based on a current lateral position of the floor cutter. 11. The system of claim 8 , wherein the electronic processor is further configured to: determine the height of the floor cutter based on the sensor signal. 12. The system of claim 8 , wherein the electronic processor is further configured to: receive smoothing configuration parameters; and generate the target pitch profile based on an initial target pitch profile and the smoothing configuration parameters such that the plurality of target pitch angles for different sections of a mineral face are smoothed. 13. The system of claim 8 , wherein the electronic processor is further configured to: receive a nominal pitch profile for the shearer, access a correction offset input by an external source for a section of the mineral face, and generate the target pitch profile based on the nominal pitch profile and the correction offset. 14. The system of claim 13 , wherein the electronic processor is further configured to: determine a correction pass count for the correction offset; and in response to determining a number of shearer passes since the correction offset has reached a correction pass count, set the target pitch angle for the section of the mineral face to the nominal pitch profile.

Assignees

Inventors

Classifications

  • along a conveyor for the cut material · CPC title

  • Measuring, signaling or indicating specially adapted for machines for slitting or completely freeing the mineral (measuring or indicating on tunneling machines E21D9/003) · CPC title

  • E21C35/282Primary

    Autonomous machines; Autonomous operations · CPC title

  • solely by slitting (rods, drums, for same E21C25/10; saws, discs, wheels E21C25/18; chains, chain guides, for same E21C25/28) · CPC title

  • E21C25/10Primary

    Rods; Drums · CPC title

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What does patent US10920588B2 cover?
Methods and systems of controlling a pitch angle of a shearer. A controller receives a sensor signal indicative of the pitch angle of the shearer, and receives a target pitch profile defining a plurality of target pitch angles for different sections of a mineral face. The controller determines a pitch difference between the pitch angle and a target pitch angle of the shearer, determines a pitch…
Who is the assignee on this patent?
Joy Global Underground Mining Llc
What technology area does this patent fall under?
Primary CPC classification E21C35/282. Mapped technology areas include Fixed Constructions.
When was this patent published?
Publication date Tue Feb 16 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).