Complex fluoride phosphor and method for producing same
US-10294418-B2 · May 21, 2019 · US
US10920136B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10920136-B2 |
| Application number | US-201615768562-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 18, 2016 |
| Priority date | Nov 26, 2015 |
| Publication date | Feb 16, 2021 |
| Grant date | Feb 16, 2021 |
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A process for synthesizing a manganese doped phosphor of formula I: Ax [MFy]:Mn4+ is presented. The process includes contacting a first solution with a second solution and a third solution in the presence of a plurality of inert particles. The first solution and the second solution include a composition of formula II: Ax[MnFy]. The third solution includes a source of M, where A is Li, Na, K, Rb, Cs, or combinations thereof; M is Si, Ge, Sn, Ti, Zr, Al, Ga, In, Sc, Hf, Y, La, Nb, Ta, Bi, Gd, or combinations thereof; x is an absolute value of a charge of the [MFy] ion; and y is 5, 6 or 7.
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The invention claimed is: 1. A process for synthesizing a manganese doped phosphor of formula I, A x [MF y ]:Mn +4 I the process comprising: contacting a first solution with a second solution and a third solution in the presence of a plurality of inert particles, wherein the first solution and the second solution comprise a composition of formula II: Ax[MnF y ] and the third solution comprises a source of M, wherein, A is Li, Na, K, Rb, Cs, or combinations thereof; M is Si, Ge, Sn, Ti, Zr, Al, Ga, In, Sc, Hf, Y, La, Nb, Ta, Bi, Gd, or combinations thereof; x is an absolute value of a charge of the [MF y ] ion; and y is 5, 6 or 7. 2. The process according to claim 1 , wherein the plurality of inert particles comprises polytetrafluoroethylene. 3. The process according to claim 1 , wherein an average particle size of the plurality of inert particles is in a range from about 1 millimeter to about 10 millimeters. 4. The process according to claim 1 , wherein a volume percentage of the plurality of inert particles in the first solution is in a range from about 5 percent to about 50 percent. 5. The process according to claim 1 , wherein A is Na, K, Rb, Cs, or combinations thereof; M is Si, Ge, Ti, or combinations thereof; and Y is 6. 6. The process according to claim 1 , wherein at least one of the first solution, the second solution, and the third solution comprises hydrofluoric acid. 7. The process according to claim 1 , wherein the source of M comprises hexafluorosilicic acid. 8. The process according to claim 1 , wherein the first solution further comprises a source of A. 9. The process according to claim 8 , wherein the source of A comprises potassium hydrogenfluoride (KHF 2 ), potassium fluoride (KF), or a combination thereof. 10. The process according to claim 1 , wherein the composition of formula II is K 2 MnF 6 . 11. The process according to claim 1 , wherein the manganese doped phosphor of formula I is K 2 SiF 6 :Mn 4+ . 12. The process according to claim 1 , wherein during the step of contacting the first solution with the second solution and the third solution, the first solution is subjected to an agitated motion. 13. The process according to claim 1 , further comprising ageing a combined solution of the first solution, the second solution, and the third solution after the contacting step. 14. The process according to claim 1 , wherein the process comprises forming a plurality of particles of the manganese doped phosphor of formula I, and the plurality of particles has a particle size distribution having a D50 value in a range from about 15 microns to about 25 microns. 15. A process for synthesizing a manganese doped phosphor of formula K 2 [SiF 6 ]:Mn 4+ , the process comprising: contacting a first solution with a second solution and a third solution in the presence of a plurality of inert particles, wherein the first solution comprises a first portion of a composition of formula K 2 [MnF 6 ] and a source of K, the second solution comprises a second portion of the composition of formula K 2 [MnF 6 ], and the third solution comprises hexafluorosilicic acid, and wherein at least one of the first solution, the second solution, and the third solution further comprises aqueous hydrofluoric acid. 16. The process according to claim 15 , wherein the plurality of inert particles comprises polytetrafluoroethylene. 17. The process according to claim 15 , wherein the process comprises forming a plurality of particles of K 2 [SiF 6 ]:Mn 4+ , and the plurality of particles has a particle size distribution having a D50 value in a range from about 15 microns to about 25 microns. 18. The process according to claim 15 , wherein the source of K comprises potassium hydrogenfluoride (KHF 2 ), potassium fluoride (KF), or a combination thereof.
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