Chemically amplified positive resist composition and resist pattern forming process
US-12164231-B2 · Dec 10, 2024 · US
US10901316B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10901316-B2 |
| Application number | US-201916681142-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 12, 2019 |
| Priority date | Jun 15, 2017 |
| Publication date | Jan 26, 2021 |
| Grant date | Jan 26, 2021 |
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A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.
Opening claim text (preview).
The invention claimed is: 1. A monomer having formula (I): wherein in formula (I): W is —(C═O)O—, —O(C═O)—, —O(SO 2 )—, —(SO 2 )O—, —NH(SO 2 )—, —(SO 2 )NH—, —NH(CO)—, —(CO)NH—, —SO 2 —, —SO—, R a is H, F, —CN, a C 1-10 alkyl group, or a C 1-10 fluoroalkyl group; L is a linking group selected from an unsubstituted or substituted C 1-20 alkylene group, an unsubstituted or substituted C 3-20 cycloalkylene group, an unsubstituted or substituted C 6-20 arylene group, and an unsubstituted or substituted C 7-20 aralkylene group; represents a monocyclic or polycyclic unsubstituted or substituted C 6-30 arylene group or a monocyclic or polycyclic unsubstituted or substituted C 3-30 heteroarylene group, wherein “*” indicates a point of attachment to a neighboring group or atom; “I” represents iodine; X is selected from —F, —Cl, —Br, a hydroxyl group, a cyano group, a nitro group, an amino group, an amidino group, a hydrazine group, a hydrazone group, a carboxylic acid group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, an unsubstituted or substituted C 1-30 alkyl group, an unsubstituted or substituted C 2-30 alkenyl group, an unsubstituted or substituted C 2-30 alkynyl group, an unsubstituted or substituted C 1-30 alkoxy group, an unsubstituted or substituted C 3-30 cycloalkyl group, an unsubstituted or substituted C 1-30 heterocycloalkyl group, an unsubstituted or substituted C 3-30 cycloalkenyl group, an unsubstituted or substituted C 1-30 heterocycloalkenyl group, an unsubstituted or substituted C 6-30 aryl group, an unsubstituted or substituted C 6-30 aryloxy group, an unsubstituted or substituted C 6-30 arylthio group, an unsubstituted or substituted C 7-30 arylalkyl group, an unsubstituted or substituted C 1-30 heteroaryl group, an unsubstituted or substituted C 2-30 heteroaryloxy group, an unsubstituted or substituted C 2-30 heteroarylthio group, or an unsubstituted or substituted C 3-30 heteroarylalkyl group, wherein at least one X comprises —C(CF 3 ) 2 OH; m is an integer of 1 or greater, provided that when m is an integer of 2 or greater, two adjacent groups X optionally form a ring; and n is an integer of 1 or greater. 2. The monomer of claim 1 , wherein L is an unsubstituted C 1-20 alkylene group or a C 1-20 alkylene group substituted with —F, a hydroxyl group, or a C 1-10 alkyl group; and n is 1, 2, or 3. 3. A copolymer comprising a polymerized product of an acid-deprotectable monomer and a monomer having formula (I): wherein in formula (I): W is —(C═O)O—or —O(C═O)—, R a is H, F, —CN, a C 1-10 alkyl group, or a C 1-10 fluoroalkyl group; L is a linking group selected from an unsubstituted or substituted C 1-20 alkylene group, an unsubstituted or substituted C 3-20 cycloalkylene group, an unsubstituted or substituted C 6-20 arylene group, and an unsubstituted or substituted C 7-20 aralkylene group; represents a monocyclic or polycyclic unsubstituted or substituted C 6-30 arylene group or a monocyclic or polycyclic unsubstituted or substituted C 3-30 heteroarylene group, wherein “*” indicates a point of attachment to a neighboring group or atom; “I” represents iodine; X is selected from —F, —Cl, —Br, a hydroxyl group, a cyano group, a nitro group, an amino group, an amidino group, a hydrazine group, a hydrazone group, a carboxylic acid group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, an unsubstituted or substituted C 1-30 alkyl group, an unsubstituted or substituted C 2-30 alkenyl group, an unsubstituted or substituted C 2-30 alkynyl group, an unsubstituted or substituted C 1-30 alkoxy group, an unsubstituted or substituted C 3-30 cycloalkyl group, an unsubstituted or substituted C 3-30 heterocycloalkyl group, an unsubstituted or substituted C 4-30 cycloalkenyl group, an unsubstituted or substituted C 4-30 heterocycloalkenyl group, an unsubstituted or substituted C 6-30 aryl group, an unsubstituted or substituted C 6-30 aryloxy group, an unsubstituted or substituted C 6-30 arylthio group, an unsubstituted or substituted C 7-30 arylalkyl group, an unsubstituted or substituted C 4-30 heteroaryl group, an unsubstituted or substituted C 4-30 heteroaryloxy group, an unsubstituted or substituted C 4-30 heteroarylthio group, or an unsubstituted or substituted C 5-30 heteroarylalkyl group, wherein X optionally comprises an ester group or —C(CF 3 ) 2 OH; m is an integer of 0 or greater, provided that when m is an integer of 2 or greater, two adjacent groups X optionally form a ring; and n is an integer of 1 or greater. 4. The copolymer of claim 3 , further comprising a polymerized product of a base-soluble monomer, a lactone-containing monomer, a photoacid generator, or a combination thereof. 5. The copolymer of claim 4 , wherein the acid-deprotectable monomer is represented by formula (II), the base-soluble monomer is represented by formula (III), the lactone-containing monomer is represented by formula (IV), and the photoacid generator is represented by formula (V): wherein each R a is independently H, F, C 1-10 alkyl, or C 1-10 fluoroalkyl; each R b is independently H, an unsubstituted or substituted C 1-20 alkyl group, an unsubstituted or substituted C 3-20 cycloalkyl group, an unsubstituted or substituted C 6-20 aryl group, or an unsubstituted or substituted C 7-20 aralkyl group, and each R b is separate or at least one R b is bonded to an adjacent R b to form a cyclic structure; Q 1 is an ester-containing or non-ester containing group selected from an unsubstituted or substituted C 1-20 alkyl group, an unsubstituted or substituted C 3-20 cycloalkyl group, an unsubstituted or substituted C 6-20 aryl group, and an unsubstituted or substituted C 7-20 aralkyl group; W is a base-reactive group comprising at least one selected from —C(═O)—OH; —C(CF 3 ) 2 OH; —NH—SO 2 —Y 1 where Y 1 is F or a C 1-4 perfluoroalkyl group; an aromatic —OH; and an adduct of any of the foregoing with a vinyl ether; a is an integer of 1 to 3; L is a monocyclic, polycyclic, or fused polycyclic C 4-20 lactone-containing group; Q 2 is a single bond or an ester-containing or non-ester containing, fluorinated or non-fluorinated group selected from a C 1-20 alkylene group, a C 3-20 cycloalkylene group, a C 6-20 arylene group, and a C 7-20 aralkylene group; A is an ester-containing or non ester-containing, fluorinated or non-fluorinated group selected from a C 1-20 alkylene group, a C 3-20 cycloalkylene group, a C 6-20 arylene group, and a C 7-20 aralkylene group; Z is an anionic moiety comprising sulfonate, an anion of a sulfonamide, or an anion of a sulfonimide; and G + has formula (VI): wherein X is S or I, each R C is unsubstituted or substituted, halogenated or non-halogenated and is independently a C 1-30 alkyl group; a polycyclic or monocyclic C 3-30 cycloalkyl group; a polycyclic or monocyclic C 4
Photolithographic processes · CPC title
Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title
and containing one or more carboxylic moiety in the chain, e.g. acetoacetoxyethyl(meth)acrylate · CPC title
with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title
with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image · CPC title
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