Apparatus for thermally-stabilizing carbon material precursor and method for thermally-stabilizing carbon material precursor using the same

US10883200B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10883200-B2
Application numberUS-201916381293-A
CountryUS
Kind codeB2
Filing dateApr 11, 2019
Priority dateMay 25, 2018
Publication dateJan 5, 2021
Grant dateJan 5, 2021

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Abstract

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An apparatus for thermally-stabilizing a carbon material precursor having a heating apparatus which thermally-stabilizes a carbon material precursor, a thermometer for measuring a temperature in the heating apparatus, a water vapor concentration meter for measuring a concentration of water vapor in the heating apparatus, and a batch type thermal-stabilization apparatus for feedback-controlling the temperature in the heating apparatus by using the concentration of water vapor as an index such that generation of water vapor in a thermal-stabilization reaction of the carbon material precursor is completed and generation of water vapor in a partial oxidation reaction of the carbon material precursor is suppressed in a temperature range between a temperature range where the generation of water vapor is accelerated in the thermal-stabilization reaction and a temperature range where the generation of water vapor is accelerated in the partial oxidation reaction.

First claim

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What is claimed is: 1. An apparatus for thermally-stabilizing a carbon material precursor comprising: a heating apparatus which thermally-stabilizes a carbon material precursor; a temperature measuring means for measuring a temperature in the heating apparatus; a water vapor concentration measuring means for measuring a concentration of water vapor in the heating apparatus; and a temperature control means for feedback-controlling the temperature in the heating apparatus by using the concentration of water vapor as an index such that generation of water vapor in a thermal-stabilization reaction of the carbon material precursor is completed and generation of water vapor in a partial oxidation reaction of the carbon material precursor is suppressed in a temperature range between a temperature range where the generation of water vapor is accelerated in the thermal-stabilization reaction and a temperature range where the generation of water vapor is accelerated in the partial oxidation reaction. 2. The apparatus for thermally-stabilizing a carbon material precursor according to claim 1 , wherein in the temperature control means, the temperature range between the temperature range where the generation of water vapor is accelerated in the thermal-stabilization reaction of the carbon material precursor and the temperature range where the generation of water vapor is accelerated in the partial oxidation reaction of the carbon material precursor is set to T 1 or more and T 2 or less, where a maximum value of the concentration of water vapor generated in the thermal-stabilization reaction of the carbon material precursor is denoted by C max1 and a temperature corresponding to the maximum value is denoted by T max1 , a maximum value of the concentration of water vapor generated in the partial oxidation reaction of the carbon material precursor is denoted by C max2 and a temperature corresponding to the maximum value is denoted by T max2 , a minimum value of the concentration of water vapor generated in a temperature range between T max1 and T max2 is denoted by C min and a temperature corresponding to the minimum value is denoted by T min , a temperature where the concentration of water vapor takes a mean value of C max1 and C min (C max1 +C min )/2, in a temperature range between T max1 and T min is denoted by T 1 , and a temperature where the concentration of water vapor takes a mean value of C min and C max2 (C min +C max2 /2, in a temperature range between T min and T max2 is denoted by T 2 . 3. The apparatus for thermally-stabilizing a carbon material precursor according to claim 2 , wherein the temperature control means is a means for feedback controlling the temperature in the heating apparatus such that the concentration of water vapor in the heating apparatus is equal to or less than an average value of the concentration of water vapor in the temperature range between T 1 or more and T 2 or less. 4. A method for thermally-stabilizing a carbon material precursor which uses the thermal-stabilization apparatus according to claim 1 , comprising the steps of: measuring a temperature in the heating apparatus; measuring a concentration of water vapor in the heating apparatus; and feedback-controlling the temperature in the heating apparatus by using the concentration of water vapor as an index such that generation of water vapor in a thermal-stabilization reaction of the carbon material precursor is completed and generation of water vapor in a partial oxidation reaction of the carbon material precursor is suppressed in a temperature range between a temperature range where the generation of water vapor is accelerated in the thermal-stabilization reaction and a temperature range where the generation of water vapor is accelerated in the partial oxidation reaction. 5. The method for thermally-stabilizing a carbon material precursor according to claim 4 , wherein in the step of controlling the temperature, the temperature range between the temperature range where the generation of water vapor is accelerated in the thermal-stabilization reaction of the carbon material precursor and the temperature range where the generation of water vapor is accelerated in the partial oxidation reaction of the carbon material precursor is set to T 1 or more and T 2 or less, where a maximum value of the concentration of water vapor generated in the thermal-stabilization reaction of the carbon material precursor is denoted by C max1 and a temperature corresponding to the maximum value is denoted by T max1 , a maximum value of the concentration of water vapor generated in the partial oxidation reaction of the carbon material precursor is denoted by C max2 and a temperature corresponding to the maximum value is denoted by T max2 , a minimum value of the concentration of water vapor generated in a temperature range between T max1 and T max2 is denoted by C min and a temperature corresponding to the minimum value is denoted by T min , a temperature where the concentration of water vapor takes a mean value of C max1 and C min , (C max1 +C min )/2, in a temperature range between T max1 and T min is denoted by T 1 , and a temperature where the concentration of water vapor takes a mean value of C min and C max2 (C min +C max2 /2, in a temperature range between T min and T max2 is denoted by T 2 . 6. The method for thermally-stabilizing a carbon material precursor according to claim 5 , wherein in the step of controlling the temperature, the temperature in the heating apparatus is feedback-controlled such that the concentration of water vapor in the heating apparatus is equal to or less than the average value of the concentration of water vapor in the temperature range between T 1 or more and T 2 or less.

Assignees

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Classifications

  • Devices for monitoring temperature · CPC title

  • from stabilised polyacrylonitriles · CPC title

  • D01F9/32Primary

    Apparatus therefor · CPC title

  • Monitoring the composition of the atmosphere or of one of their components · CPC title

  • Furnaces of a kind not covered by any of groups F27B1/00 - F27B15/00 (structural combinations of furnaces F27B19/02) · CPC title

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What does patent US10883200B2 cover?
An apparatus for thermally-stabilizing a carbon material precursor having a heating apparatus which thermally-stabilizes a carbon material precursor, a thermometer for measuring a temperature in the heating apparatus, a water vapor concentration meter for measuring a concentration of water vapor in the heating apparatus, and a batch type thermal-stabilization apparatus for feedback-controlling …
Who is the assignee on this patent?
Toyota Chuo Kenkyusho Kk
What technology area does this patent fall under?
Primary CPC classification D01F9/32. Mapped technology areas include Textiles & Paper.
When was this patent published?
Publication date Tue Jan 05 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).