Electrostatic element having grooved exterior surface

Patent metadata

Field	Value
Publication number	US-10867772-B2
Application number	US-201816485519-A
Country	US
Kind code	B2
Filing date	Mar 19, 2018
Priority date	Mar 21, 2017
Publication date	Dec 15, 2020
Grant date	Dec 15, 2020

Abstract

Provided herein are approaches for increasing surface area of a conductive beam optic by providing grooves or surface features thereon. In one approach, the conductive beam optic may be part of an electrostatic filter having a plurality of conductive beam optics disposed along an ion beam-line, wherein at least one conductive beam optic includes a plurality of grooves formed in an exterior surface. In some approaches, a power supply may be provided in communication with the plurality of conductive beam optics, wherein the power supply is configured to supply a voltage and a current to the plurality of conductive beam optics. The plurality of grooves may be provided in a spiral pattern along a length of the conductive beam optic, and/or oriented parallel to a lengthwise axis of the conductive beam optic.

First claim

The invention claimed is:

1. An ion implantation system, comprising:
an electrostatic filter (EF) within a chamber of the ion implantation system, the EF including a conductive beam optic having a plurality of grooves formed in an exterior surface, wherein the plurality of grooves is arranged in a helical pattern along a length of the conductive beam optic; and
a power supply in communication with the EF, the power supply configured to supply a voltage and a current to the conductive beam optic.

2. The ion implantation system of claim 1 , the power supply configured to supply the voltage and the current to the conductive beam optic during a processing mode.

3. The ion implantation system of claim 1 , wherein each of the plurality of grooves extends into the conductive beam optic to a uniform depth.

4. The ion implantation system of claim 1 , wherein each of the plurality of grooves is approximately v-shaped.

5. The ion implantation system of claim 1 , wherein the plurality of grooves are uniformly spaced apart from one another.

6. The ion implantation system of claim 1 , further comprising a plurality of conductive beam optics.

7. A method comprising:
providing an electrostatic filter (EF) within a chamber of an ion implantation system, wherein the EF includes a plurality of conductive beam optics, and wherein at least one of the plurality of conductive beam optics has a plurality of grooves formed in an exterior surface, and wherein the plurality of grooves is arranged in a spiral pattern along a length of the at least one of the plurality of conductive beam optics; and
coupling a power supply to the EF, the power supply configured to supply a voltage and a current to the plurality of conductive beam optics.

8. The method of claim 7 , further comprising supplying the voltage and the current to the EF during a processing mode.

9. The method of claim 7 , wherein each of the plurality of grooves extends into the at least one of the plurality of conductive beam optics to a uniform depth.

10. The method of claim 7 , wherein each of the plurality of grooves is formed into a V-shape.

11. The method of claim 7 , further comprising spacing the plurality of grooves uniformly apart from one another.

12. The method of claim 7 , further comprising disposing the plurality of conductive beam optics around an ion beamline.

13. A conductive beam optic of an electrostatic filter, the conductive beam optic comprising:
a first axial end opposite a second axial end;
a central section extending between the first axial end and the second axial end; and
a plurality of grooves formed in an exterior surface of the central section, wherein the plurality of grooves is arranged in a helical pattern along a length of the central section.

Assignees

• Varian Semiconductor Equipment Ass Inc

Inventors

• Hermanson Eric
• Layne Philip
• Pixley James Alan

Classifications

• H01J37/3171 Primary

  for ion implantation · CPC title

• H01J37/12

  electrostatic · CPC title

• H01J37/05

  Electron or ion-optical arrangements for separating electrons or ions according to their energy {or mass}(particle separator tubes H01J49/00) · CPC title

• H01J2237/022

  Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube · CPC title

• H01J37/3002

  Details · CPC title