Surface texturing of deforming tools

US10864565B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10864565-B2
Application numberUS-201515531030-A
CountryUS
Kind codeB2
Filing dateOct 21, 2015
Priority dateNov 28, 2014
Publication dateDec 15, 2020
Grant dateDec 15, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of producing a deforming tool ( 2 ) having a structured embossing surface ( 4 ) which can be brought into contact with a surface of a substrate ( 1 ) for plastic deformation of the substrate, includes the steps of determining a target structure to be produced on the substrate ( 1 ); geometrically distorting the target structure, such that an embossing image structure is obtained; inverting the embossing image structure, such that the embossing structure for the embossed surface ( 4 ) is obtained; and producing the embossing surface ( 4 ) of the deforming tool ( 2 ) according to the embossing structure.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of producing a deforming tool ( 2 ) having a structured embossing surface ( 4 ) which is brought into contact with a surface of a substrate ( 1 ) for plastic deformation of the substrate, the method comprising: determining a target structure to be produced on the substrate ( 1 ); geometrically transforming the target structure along at least one main direction along which the substrate is deformed during the plastic deformation, such that an embossing image structure is obtained; inverting the obtained embossing image structure, such that an embossing structure for the structured embossing surface ( 4 ) is obtained; and producing the deforming tool ( 2 ) having the structured embossing surface ( 4 ) comprising the obtained embossing structure. 2. The method according to claim 1 ; characterized in that the target structure is defined by a transfer function the parameters of which comprise the embossing structure and one or more process parameters. 3. The method according to claim 2 ; characterized in that one or more of the process parameters describe the deformation behavior of the substrate ( 1 ) during the plastic deformation along one or more main directions. 4. The method according to claim 3 ; characterized in that the process parameters are comprised of at least one of the following parameters: a flow tension of the substrate ( 1 ), a geometric parameter of the embossing surface ( 4 ), an elongation of the substrate ( 1 ) in the deformation along a main direction, an embossing speed, a tension along the one or more main directions during the deformation, and a coefficient of friction between the embossing surface ( 4 ) and the substrate ( 1 ). 5. The method according to claim 1 ; characterized in that the deforming tool ( 2 ) comprises a working roll ( 30 ). 6. The method according to claim 5 ; characterized in that the target structure is described by a transfer function the parameters of which are comprised of the embossing structure and at least one of, the following parameters: a flow tension of the substrate ( 1 ), a diameter of the working roll ( 3 ), an elongation of the substrate ( 1 ) along the rolling direction, a rolling speed, the substrate tension at an entrance to the working roll ( 3 ), the substrate tension at an exit from the working roll ( 3 ), and the friction in the roll gap. 7. The method of claim 5 , wherein the deforming tool comprises a dressing roll. 8. The method according to one claim 1 ; characterized in that the substrate ( 1 ) is a sheet or plate, preferably a sheet or plate of metal. 9. The method according to claim 1 ; characterized in that the embossing structure has an anisotropic characteristic, wherewith the corresponding characteristic in the target structure is isotropic. 10. The method according to claim 1 ; characterized in that the embossing surface ( 4 ) is produced by at least one of the following techniques: shot blast texturing (SBT), electrical discharge texturing (EDT), laser texturing (LT), electron beam texturing (EBT), and Pretex texturing.

Assignees

Inventors

Classifications

  • Rolling metal of indefinite length in repetitive shapes specially designed for the manufacture of particular objects {, e.g. checkered sheets} · CPC title

  • B21B27/00Primary

    Rolls, {roll alloys or roll fabrication}(shape of working surfaces required by special processes B21B1/00); Lubricating, cooling or heating rolls while in use · CPC title

  • Fabricating and shaping roller work contacting surface element · CPC title

  • Embossing {, i.e. producing impressions formed by locally deep-drawing, e.g. using rolls provided with complementary profiles}({B31F1/128 takes precedence;} corrugating B31F1/20; embossing in combination with printing B41F19/02, B41M1/24; typewriters for embossing B41J3/38; stamping in combination with deforming B41K3/36) · CPC title

  • B21B27/005Primary

    Rolls with a roughened or textured surface; Methods for making same · CPC title

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Frequently asked questions

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What does patent US10864565B2 cover?
A method of producing a deforming tool ( 2 ) having a structured embossing surface ( 4 ) which can be brought into contact with a surface of a substrate ( 1 ) for plastic deformation of the substrate, includes the steps of determining a target structure to be produced on the substrate ( 1 ); geometrically distorting the target structure, such that an embossing image structure is obtained; inver…
Who is the assignee on this patent?
Sms Group Gmbh
What technology area does this patent fall under?
Primary CPC classification B21B27/00. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Dec 15 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).