Photovoltaic devices including doped semiconductor films
US-10319873-B2 · Jun 11, 2019 · US
US10861994B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10861994-B2 |
| Application number | US-201916435838-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 10, 2019 |
| Priority date | Nov 2, 2007 |
| Publication date | Dec 8, 2020 |
| Grant date | Dec 8, 2020 |
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A photovoltaic cell can include a dopant in contact with a semiconductor layer.
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What is claimed is: 1. A photovoltaic cell comprising: a transparent conductive layer; a first semiconductor window layer over the transparent conductive layer; a dopant layer comprising a first dopant over the first semiconductor window layer; a second semiconductor window layer over and in direct contact with the dopant layer; wherein, the second semiconductor window layer includes the first dopant; the first and second semiconductor window layers comprise at least one of MgO or ZnO; and the dopant layer comprising the first dopant has a thickness between 4 and 15 Angstroms; and a semiconductor absorber layer over the second semiconductor window layer, wherein the semiconductor absorber layer comprises a mixture of CdTe and CdSe, doped p-type with a Group I element and a Group V element, wherein a concentration of the Group V element in the semiconductor absorber layer is between 0.5 ppma and 500 ppma. 2. The photovoltaic cell of claim 1 , wherein the Group I element comprises at least one of: lithium (Li), sodium (Na), potassium (K), rubidium (Rb), cesium (Cs), copper (Cu), silver (Ag), or gold (Au). 3. The photovoltaic cell of claim 1 , wherein the Group V element comprises at least one of phosphorous (P), arsenic (As), antimony (Sb), or bismuth (Bi). 4. The photovoltaic cell of claim 1 , wherein the Group V element comprises P. 5. The photovoltaic cell of claim 1 , wherein the Group V element comprises As. 6. The photovoltaic cell of claim 1 , further comprising a top layer over the semiconductor absorber layer, wherein the top layer comprises a metal nitride, and wherein the metal nitride, includes at least one of: aluminum, molybdenum, chromium, cobalt, nickel, titanium, or tungsten.
made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers · CPC title
Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes · CPC title
Passivating · CPC title
characterised by the dopants · CPC title
having at least three elements, e.g. HgCdTe · CPC title
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