Recurring process for laser induced forward transfer and high throughput and recycling of donor material by the reuse of a plurality of target substrate plates or forward transfer of a pattern of discrete donor dots

US10857732B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10857732-B2
Application numberUS-201615548752-A
CountryUS
Kind codeB2
Filing dateFeb 4, 2016
Priority dateFeb 5, 2015
Publication dateDec 8, 2020
Grant dateDec 8, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The technology disclosed relates to high utilization of donor material in a writing process using Laser-Induced Forward Transfer. Specifically, the technology relates to reusing, or recycling, unused donor material by recoating target substrates with donor material after a writing process is performed with the target substrate. Further, the technology relates to target substrates including a pattern of discrete separated dots to be individually ejected from the target substrate using LIFT.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of transferring donor material by laser induced forward transfer from a target substrate to a workpiece, including: providing one surface of a target substrate with a pattern of discrete separated dots of donor material; orienting the surface with the pattern of discrete separated dots of donor material to face a workpiece; pulsing a laser beam through the target substrate, causing the discrete separated dots to be transferred from the target substrate to form a pattern on the workpiece in a Manhattan geometry pattern; causing the target substrate to move relative to the workpiece in a relative direction of motion; and orienting the pattern on the workpiece askew to the relative direction of motion, wherein the askew orientation angle more evenly distributes donor material requirements, imposed by the Manhattan geometry pattern, across the target substrate in a direction perpendicular to the relative direction of movement. 2. The method of claim 1 , further including calculating for the Manhattan geometry the askew orientation angle based at least in part on projection of the donor material requirements for at least a segment of the pattern on the workpiece onto a base line. 3. The method of claim 1 , wherein the pattern of discrete separated dots includes dots of different sizes. 4. The method of claim 2 , wherein the pattern of discrete separated dots includes dots of different shapes. 5. The method of claim 1 , wherein the pattern of discrete separated dots includes a dot including portions of donor material with thicknesses that vary by at least 20 percent. 6. The method of claim 1 , wherein the pulsing the laser beam through the target substrate includes focusing the laser beam on an area of the target substrate larger than the discrete separated dot to be ejected. 7. The method of claim 1 , wherein the pattern of discrete separated dots are formed within recesses in the surface of the target substrate. 8. The method of claim 1 , wherein the pattern of discrete separated dots includes a first dot having a first thickness and a second dot having a second thickness different than the first thickness. 9. The method of claim 1 , wherein the pattern of the discrete separated dots is a hexagonal pattern. 10. The method of claim 2 , wherein the pattern of discrete separated dots includes a dot including portions of donor material with thicknesses that vary by at least 20 percent. 11. The method of claim 2 , wherein the pulsing the laser beam through the target substrate includes focusing the laser beam on an area of the target substrate larger than the discrete separated dot to be ejected. 12. The method of claim 2 , wherein the pattern of discrete separated dots are formed within recesses in the surface of the target substrate. 13. The method of claim 2 , wherein the pattern of discrete separated dots includes a first dot having a first thickness and a second dot having a second thickness different than the first thickness. 14. The method of claim 3 , wherein the pulsing the laser beam through the target substrate includes focusing the laser beam on an area of the target substrate larger than the discrete separated dot to be ejected. 15. The method of claim 3 , wherein the pattern of discrete separated dots are formed within recesses in the surface of the target substrate. 16. The method of claim 3 , wherein the pattern of discrete separated dots includes a first dot having a first thickness and a second dot having a second thickness different than the first thickness. 17. The method of claim 4 , wherein the pattern of discrete separated dots are formed within recesses in the surface of the target substrate. 18. The method of claim 4 , wherein the pattern of discrete separated dots includes a first dot having a first thickness and a second dot having a second thickness different than the first thickness. 19. The method of claim 5 , wherein the pattern of discrete separated dots includes a first dot having a first thickness and a second dot having a second thickness different than the first thickness.

Assignees

Inventors

Classifications

  • B29C64/268Primary

    using laser beams; using electron beams [EB] · CPC title

  • using individual droplets, e.g. from jetting heads · CPC title

  • Processes of additive manufacturing · CPC title

  • Using laser light · CPC title

  • using a prefabricated paste pattern, ink pattern or powder pattern · CPC title

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Frequently asked questions

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What does patent US10857732B2 cover?
The technology disclosed relates to high utilization of donor material in a writing process using Laser-Induced Forward Transfer. Specifically, the technology relates to reusing, or recycling, unused donor material by recoating target substrates with donor material after a writing process is performed with the target substrate. Further, the technology relates to target substrates including a pa…
Who is the assignee on this patent?
Mycronic AB
What technology area does this patent fall under?
Primary CPC classification B29C64/268. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Dec 08 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).