Correlated electron material devices using dopant species diffused from nearby structures

US10854814B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10854814-B2
Application numberUS-201816195779-A
CountryUS
Kind codeB2
Filing dateNov 19, 2018
Priority dateJul 5, 2016
Publication dateDec 1, 2020
Grant dateDec 1, 2020

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Subject matter disclosed herein may relate to fabrication of correlated electron materials used, for example, to perform a switching function. In embodiments, a correlated electron material may be doped using dopant species derived from one or more precursors utilized to fabricate nearby structures such as, for example, a conductive substrate or a conductive overlay.

First claim

Opening claim text (preview).

What is claimed is: 1. A switching device, comprising: an electrode to comprise at least one layer of electrically conductive material to include a particular dopant species; and a correlated electron switch to comprise at least one layer of correlated electron material formed over the electrode, wherein the correlated electron material to comprise the particular dopant species, and wherein the correlated electron material to comprise an electron back-donating material. 2. The switching device of claim 1 , wherein the particular dopant species to operate to fill oxygen vacancies in the electron back-donating material. 3. The switching device of claim 1 , wherein a concentration of the electron back-donating material to comprise an atomic concentration of between 0.1% and 10.0%. 4. The switching device of claim 1 , wherein the correlated electron material to comprise nickel oxide. 5. The switching device of claim 4 , wherein the electrically conductive material to comprise titanium nitride, tantalum nitride or tungsten nitride, or any combination thereof. 6. The switching device of claim 1 , wherein the particular dopant species to comprise carbon, chlorine, nitrogen, fluorine, cyanide (CN), nitrosyl (NO), ammonia (NH3), oxynitride molecules (NxOy, wherein x and y comprise whole numbers and wherein x>0 and y>0) or molecules of the form CxHyNz (wherein x>0, y>0, z>0), or any combination thereof. 7. The switching device of claim 1 , wherein the correlated electron material further to comprise an additional dopant species, wherein the electrically conductive material to further comprise the additional dopant species. 8. A switching device, comprising: an electrically conductive substrate; a correlated electron material deposited over the electrically conductive substrate; and an electrically conductive overlay deposited over the correlated electron material, wherein the correlated electron material to comprise a particular dopant species, wherein the correlated electron material to comprise an electron back-donating material, and wherein the electrically conductive substrate or the electrically conductive overlay, or a combination thereof, to comprise the particular dopant species. 9. The switching device of claim 8 , wherein the particular dopant species to comprise nitrogen, chlorine or carbon, or any combination thereof. 10. The switching device of claim 8 , wherein the particular dopant species to operate to fill oxygen vacancies in the correlated electron material. 11. The switching device of claim 8 , wherein the electrically conductive substrate to comprise titanium nitride, tantalum nitride or tungsten nitride, or any combination thereof. 12. The switching device of claim 8 , wherein the correlated electron material to comprise nickel oxide. 13. The switching device of claim 8 , wherein the correlated electron material to comprise a concentration of the electron back-donating material having an atomic concentration of between 0.1% and 10.0%. 14. The switching device of claim 8 , wherein the electrically conductive overlay to comprise titanium nitride, tantalum nitride or tungsten nitride, or any combination thereof. 15. The switching device of claim 8 , wherein the particular dopant species to comprise carbon, chlorine, nitrogen, fluorine, cyanide (CN), nitrosyl (NO), ammonia (NH3), oxynitride molecules (NxOy, wherein x and y comprise whole numbers and wherein x>0 and y>0) or molecules of the form CxHyNz (wherein x>0, y>0, z>0), or any combination thereof. 16. The switching device of claim 8 , wherein the correlated electron material further to comprise an additional dopant species, wherein the electrically conductive substrate or the electrically conductive overlay, or a combination thereof, further to comprise the additional dopant species.

Assignees

Inventors

Classifications

  • H10N70/046Primary

    by diffusion, e.g. photo-dissolution · CPC title

  • H10N99/03Primary

    Devices using Mott metal-insulator transition, e.g. field-effect transistor-like devices · CPC title

  • Electrodes · CPC title

  • H10N70/20Primary

    Multistable switching devices, e.g. memristors · CPC title

  • Oxides or nitrides · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10854814B2 cover?
Subject matter disclosed herein may relate to fabrication of correlated electron materials used, for example, to perform a switching function. In embodiments, a correlated electron material may be doped using dopant species derived from one or more precursors utilized to fabricate nearby structures such as, for example, a conductive substrate or a conductive overlay.
Who is the assignee on this patent?
Advanced Risc Mach Ltd
What technology area does this patent fall under?
Primary CPC classification H10N70/046. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 01 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 9 related publications on this page (citations in our corpus or others sharing the same primary CPC).