Reaction chamber and plasma processing apparatus

Patent metadata

Field	Value
Publication number	US-10854482-B2
Application number	US-201415119525-A
Country	US
Kind code	B2
Filing date	Dec 3, 2014
Priority date	Feb 24, 2014
Publication date	Dec 1, 2020
Grant date	Dec 1, 2020

Abstract

A reaction chamber is provided. The reaction chamber includes a chamber body, a dielectric window, and a power supplier. The dielectric window is provided on top of the chamber body along a first direction and hermetically connected with the chamber body. Each coil of a plurality of sets of coils is wound around an outer surface of the dielectric window at an interval along the first direction. The plurality of sets of coils are connected in parallel, with first ends electrically coupled to the power supplier for supplying power to each set of the plurality of sets of coils, and with second ends grounded. The second ends of the plurality of sets of coils are arranged in proximity between the first ends.

First claim

The invention claimed is:

1. A reaction chamber, comprising: a chamber body; a dielectric window; a power supplier; and
a first connection member, a second connection member, a third connection member, and a fourth connection member, wherein:
the dielectric window is provided on top of the chamber body along a vertical direction and hermetically connected with the chamber body,
each coil of a plurality of sets of coils is wound around an outer surface of the dielectric window at an interval along the vertical direction,
the plurality of sets of coils are connected in parallel,
the plurality of sets of coils include first ends that are electrically coupled to the power supplier for supplying power to each set of the plurality of sets of coils, the first ends being arranged along the vertical direction,
the plurality of sets of coils include second ends that are grounded, the second ends being arranged along the vertical direction,
the first ends of the plurality of sets of coils are connected to the first connection member arranged vertically, the second ends of the plurality of sets of coils are connected to the second connection member arranged vertically, a length of the second connection member is shorter than a length of the first connection member, and the second ends of the plurality of sets of coils are arranged between the first ends of the plurality of sets of coils along the vertical direction, and
the third connection member is connected with the first connection member at a first position of the first connection member, and the fourth connection member is connected with the second connection member at a second position of the second connection member, the first position and the second position being arranged within a spacing between two adjacent sets of the plurality of sets of coils, thereby improving distribution uniformity of plasma generated in the reaction chamber.

2. The reaction chamber according to claim 1 , wherein the power supplier comprises a power supply and a matcher, and the plurality of sets of coils are connected to the power supply via the matcher.

3. The reaction chamber according to claim 2 , wherein a number of the power supply is one, the plurality of sets of coils are electrically connected to the power supply, winding directions of the plurality of sets of coils are the same, and current flow in each set of coils has a same direction when the power supply supplies power to the plurality of sets of coils.

4. The reaction chamber according to claim 3 ,
wherein the first connection member is coupled to the power supply via the third connection member; and the second connection member is grounded via the fourth connection member.

5. The reaction chamber according to claim 4 , wherein the first position of the first connection member at which the first connection member is connected to the third connection member and the second position of the second connection member at which the second connection member is connected to the fourth connection member are set according to currents required by the plurality of sets of coils.

6. The reaction chamber according to claim 4 , wherein one end of the third connection member is connected to a middle position of the first connection member; and one end of the fourth connection member is connected to a middle position of the second connection member.

7. The reaction chamber according to claim 1 , wherein a number of turns in each set of coils is plural, and
wherein the spacing between the two adjacent sets of the plurality of set of coils is at least twice of a distance between two adjacent turns of the coils in each set of the plurality of sets of coils.

Assignees

• Beijing Naura Microelectronics Equipment Co Ltd

Inventors

• Li Xingcun
• Wei Gang
• Li Dongsan
• Guan Changle
• Qiu Mingda
• Zhao Longchao
• Song Mingming

Classifications

• H10P72/0421 Primary

  for drying etching · CPC title

• H01J37/32174

  Circuits specially adapted for controlling the RF discharge · CPC title

• H01J37/32119

  Windows · CPC title

• H01J37/3211 Primary

  Antennas, e.g. particular shapes of coils · CPC title

• H01J37/32449

  Gas control, e.g. control of the gas flow · CPC title