Exposure apparatus and method of manufacturing article

US10845708B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10845708-B2
Application numberUS-201916515467-A
CountryUS
Kind codeB2
Filing dateJul 18, 2019
Priority dateJul 23, 2018
Publication dateNov 24, 2020
Grant dateNov 24, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides an exposure apparatus for exposing a substrate, including: an optical system including a barrel and an optical element arranged in the barrel; and an adjustment unit including a heat radiator and configured to adjust imaging characteristics of the optical system by applying heat to the optical element from the heat radiator, wherein the heat radiator is a member including a first end portion and a second end portion on a side opposite to the first end portion and having a variation in physical properties falling within a predetermined range, a central portion between the first end portion and the second end portion of the heat radiator is arranged inside the barrel, and the first end portion and the second end portion of the heat radiator are arranged outside the barrel.

First claim

Opening claim text (preview).

What is claimed is: 1. An exposure apparatus for exposing a substrate, comprising: an optical system including a barrel and an optical element arranged in the barrel; and an adjustment unit including a heating element configured to generate heat, the adjustment unit being configured to adjust imaging characteristics of the optical system by conducting heat generated in the heating element to the optical element, wherein the heating element is a single member, formed of a heat conducting material, and including a first end portion and a second end portion on a side opposite to the first end portion and generating heat upon energization between the first end portion and the second end portion, a central portion between the first end portion and the second end portion of the heating element is arranged inside the barrel, and the first end portion and the second end portion of the heating element are arranged outside the barrel. 2. The apparatus according to claim 1 , wherein the heating element is a member having a variation in at least one of a density, a resistivity, and a heat conductivity as physical properties between the first end portion and the second end portion falling within a predetermined range. 3. The apparatus according to claim 1 , wherein the heating element has a variation in physical properties between the first end portion and the second end portion falling within a range of 3%. 4. The apparatus according to claim 1 , wherein the heating element is made of the same material between the first end portion and the second end portion. 5. The apparatus according to claim 1 , wherein letting Hmax be a maximum thickness and Hmin be a minimum thickness, the heating element is configured to satisfy Hmax/Hmin≤2 between the first end portion and the second end portion. 6. The apparatus according to claim 1 , wherein the heating element has a tensile strength between the first end portion and the second end portion being not less than 100 MPa. 7. The apparatus according to claim 1 , wherein the heating element has a melting point of not less than 200° C. 8. The apparatus according to claim 1 , wherein the heating element is sandwiched between a first member and a second member supported by the barrel. 9. The apparatus according to claim 8 , wherein the first member is arranged on an optical element side with respect to the second member, and a heat conductivity of the first member is higher than that of the second member. 10. The apparatus according to claim 1 , wherein the adjustment unit further includes a control unit configured to control energization to the heating element and a connector configured to electrically connect the first end portion and the second end portion to the control unit, and the connector is arranged outside the barrel. 11. The apparatus according to claim 1 , wherein the central portion is arranged to have a shape along an edge portion of the optical element so as to apply heat to the edge portion. 12. The apparatus according to claim 11 , wherein the central portion is arranged to have an arcuated shape along the edge portion of the optical element. 13. The apparatus according to claim 1 , wherein between the first end portion and the second end portion, the heating element does not include a joint portion to be formed when two members are joined. 14. The apparatus according to claim 1 , wherein between the first end portion and the second end portion, the heating element does not include a solder joint and an adhesive joint. 15. The apparatus according to claim 1 , wherein a plurality of the heating element are provided for the one optical element. 16. The apparatus according to claim 1 , wherein the central portion of the hating element is arranged inside the barrel so as to be spaced apart from the optical element. 17. The apparatus according to claim 1 , wherein the heating element is a member having a variation in physical properties between the first end portion and the second end portion falling within a predetermined range. 18. The apparatus according to claim 1 , wherein the heating element is a single conductor that constitutes a power supply path between the first end portion and the second end portion not to include a joint portion to be formed when two members are joined, and generates heat by supplying power between the first end portion and the second end portion. 19. A method of manufacturing an article, the method comprising: exposing a substrate using an exposure apparatus; developing the exposed substrate; and processing the developed substrate to manufacture the article, wherein the exposure apparatus exposes the substrate and includes: an optical system including a barrel and an optical element arranged in the barrel; and an adjustment unit including a heating element configured to generate heat, the adjustment unit being configured to adjust imaging characteristics of the optical system by conducting heat generated in the heating element to the optical element, wherein the heating element is a single member, formed of a heat conducting material, and including a first end portion and a second end portion on a side opposite to the first end portion and generating heat upon energization between the first end portion and the second end portion, a central portion between the first end portion and the second end portion of the heating element is arranged inside the barrel, and the first end portion and the second end portion of the heating element are arranged outside the barrel. 20. An exposure apparatus for exposing a substrate, comprising: an optical system including a barrel and an optical element arranged in the barrel; and an adjustment unit including a heat radiator configured to radiate heat, the adjustment unit being configured to adjust imaging characteristics of the optical system by applying heat to the optical element from the heat radiator, wherein the heat radiator is a member including a first end portion and a second end portion on a side opposite to the first end portion and having a variation in physical properties between the first end portion and the second end portion falling within a predetermined range, a central portion between the first end portion and the second end portion of the heat radiator is arranged inside the barrel so as to be spaced apart from the optical element, and the first end portion and the second end portion of the heat radiator are arranged outside the barrel, wherein letting Hmax be a maximum thickness and Hmin be a minimum thickness, the heat radiator is configured to satisfy Hmax/Hmin 2 between the first end portion and the second end portion. 21. An exposure apparatus for exposing a substrate, comprising: an optical system including a barrel and an optical element arranged in the barrel; and an adjustment unit including a heat radiator configured to radiate heat, the adjustment unit being configured to adjust imaging characteristics of the optical system by applying heat to the optical element from the heat radiator, wherein the heat radiator is a member including a first end portion and a second end portion on a side opposite to the first end portion and having a variation in physical properties between the first end portion and the second end portion falling within a predetermined range, a central portion between the first end portion and the second end portion of the heat radiator is arranged inside the barrel so as to be spaced apart from the optical element, and

Assignees

Inventors

Classifications

  • Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system · CPC title

  • G03F7/7015Primary

    Details of optical elements · CPC title

  • G03F7/20Primary

    Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

  • Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum · CPC title

  • Temperature · CPC title

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What does patent US10845708B2 cover?
The present invention provides an exposure apparatus for exposing a substrate, including: an optical system including a barrel and an optical element arranged in the barrel; and an adjustment unit including a heat radiator and configured to adjust imaging characteristics of the optical system by applying heat to the optical element from the heat radiator, wherein the heat radiator is a member i…
Who is the assignee on this patent?
Canon Kk
What technology area does this patent fall under?
Primary CPC classification G03F7/7015. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Nov 24 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).