Metallic synapses for neuromorphic and evolvable hardware

US10840174B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10840174-B2
Application numberUS-201715485681-A
CountryUS
Kind codeB2
Filing dateApr 12, 2017
Priority dateApr 12, 2017
Publication dateNov 17, 2020
Grant dateNov 17, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Technical solutions are described for configuring a synaptic array. An example computer implemented method includes selecting a first electronic circuit and a second electronic circuit from the synaptic array for executing a task. The method further includes connecting the first electronic circuit to the second electronic circuit to facilitate passage of electric current by forming a metallic protrusion to connect a first connector of the first electronic circuit and a second connector of the second electronic circuit.

First claim

Opening claim text (preview).

What is claimed is: 1. A computer implemented method for configuring a synaptic array, the method comprising: selecting a first electronic circuit and a second electronic circuit from the synaptic array for executing a task; and connecting the first electronic circuit to the second electronic circuit to facilitate passage of electric current by applying a predetermined voltage to the first connector that forms a metallic protrusion to connect a first connector of the first electronic circuit and a second connector of the second electronic circuit, wherein the metallic protrusion is formed at a predetermined portion of the first connector, and wherein the predetermined portion is deposited with an implant material that reduces an extrusion voltage threshold of the predetermined portion to a value below the predetermined voltage that is applied. 2. The computer implemented method of claim 1 , wherein the first electronic circuit is a memory unit. 3. The computer implemented method of claim 1 , wherein the first electronic circuit is a processing unit. 4. The computer implemented method of claim 1 , wherein the particular portion of the first connector has a barrier of a first thickness that is lesser than a second thickness of the barrier on other portions of the first connector. 5. The computer implemented method of claim 1 , wherein the first connector and the second connector are parallel to each other. 6. The computer implemented method of claim 1 , wherein the first connector and the second connector are oriented at a predetermined angle to each other. 7. A neuromorphic system comprising: a synaptic array; and a neuromorphic controller coupled with the synaptic array for configuring the synaptic array by: selecting a first electronic circuit and a second electronic circuit from the synaptic array for executing a task; and connecting the first electronic circuit to the second electronic circuit to facilitate passage of electric current by applying a predetermined voltage to the first connector that forms a metallic protrusion to connect a first connector of the first electronic circuit and a second connector of the second electronic circuit, wherein the metallic protrusion is formed at a predetermined portion of the first connector, and wherein the predetermined portion is deposited with an implant material that reduces an extrusion voltage threshold of the predetermined portion to a value below the predetermined voltage that is applied. 8. The neuromorphic system of claim 7 , wherein the first electronic circuit is a memory unit. 9. The neuromorphic system of claim 7 , wherein the first connector and the second connector are within a predetermined distance from each other. 10. The neuromorphic system of claim 7 , wherein the first connector and the second connector are parallel to each other. 11. The neuromorphic system of claim 7 , wherein the first connector and the second connector are oriented at a predetermined angle to each other. 12. The neuromorphic system of claim 7 , wherein the first electronic circuit is a processing unit. 13. The neuromorphic system of claim 7 , wherein the predetermined portion of the first connector has a barrier of a first thickness that is lesser than a second thickness of remaining portions of the first connector. 14. A computer program product for configuring a synaptic array, the computer program product comprising a computer readable storage medium having program instructions embodied therewith, the program instructions being executable by a processing circuit to cause the processing circuit to: select a first electronic circuit and a second electronic circuit from the synaptic array for executing a task; and connect the first electronic circuit to the second electronic circuit to facilitate passage of electric current by applying a predetermined voltage to the first connector that forms a metallic protrusion to connect a first connector of the first electronic circuit and a second connector of the second electronic circuit, wherein the metallic protrusion is formed at a predetermined portion of the first connector, and wherein the predetermined portion is deposited with an implant material that reduces an extrusion voltage threshold of the predetermined portion to a value below the predetermined voltage that is applied. 15. The computer program product of claim 14 , wherein the first electronic circuit is a memory unit. 16. The computer program product of claim 14 , wherein the first electronic circuit is a processing unit. 17. The computer program product of claim 14 , wherein the first connector and the second connector are within a predetermined distance from each other. 18. The computer program product of claim 14 , wherein the first connector and the second connector are parallel to each other. 19. The computer program product of claim 14 , wherein the first connector and the second connector are oriented at a predetermined angle to each other. 20. The computer program product of claim 14 , wherein the predetermined portion of the first connector has a barrier of a first thickness that is lesser than a second thickness of remaining portions of the first connector.

Assignees

Inventors

Classifications

  • H10W70/635Primary

    Through-vias · CPC title

  • G06N3/084Primary

    Backpropagation, e.g. using gradient descent · CPC title

  • Analogue means · CPC title

  • modifying the architecture, e.g. adding, deleting or silencing nodes or connections · CPC title

  • Temporal neural networks, e.g. delay elements, oscillating neurons or pulsed inputs · CPC title

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Frequently asked questions

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What does patent US10840174B2 cover?
Technical solutions are described for configuring a synaptic array. An example computer implemented method includes selecting a first electronic circuit and a second electronic circuit from the synaptic array for executing a task. The method further includes connecting the first electronic circuit to the second electronic circuit to facilitate passage of electric current by forming a metallic p…
Who is the assignee on this patent?
Samsung Electronics Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10W70/635. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 17 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).