Substrate processing apparatus and method for assembling tube assembly

Patent metadata

Field	Value
Publication number	US-10840118-B2
Application number	US-201615772040-A
Country	US
Kind code	B2
Filing date	Sep 5, 2016
Priority date	Oct 27, 2015
Publication date	Nov 17, 2020
Grant date	Nov 17, 2020

Abstract

In accordance with an exemplary embodiment, a substrate processing apparatus includes: a tube assembly having an inner space in which substrates are processed and assembled by laminating a plurality of laminates, a substrate holder configured to support the plurality of substrates in a multistage manner in the inner space of the tube assembly, a gas supply unit installed on one side of the tube assembly to supply a process gas to each of the plurality of substrates in the inner space; and an exhaust unit connected to the tube assembly to exhaust the process gas supplied into the inner space, the substrate processing apparatus that induces a laminar flow to supply a uniform amount of process gas to a top surface of the substrate.

First claim

What is claimed is:

1. A substrate processing apparatus comprising:
a tube assembly having an inner space in which substrates are processed and assembled by laminating a plurality of laminates;
a substrate holder configured to support a plurality of substrates in a multistage manner in the inner space of the tube assembly;
a gas supply unit installed on one side of the tube assembly to supply a process gas to each of the plurality of substrates in the inner space; and
an exhaust unit connected to the tube assembly to exhaust the process gas supplied into the inner space;
wherein each of the laminates comprises:
a plate having a surface area;
a hollow part provided in a central portion of the plate so that the substrate holder is movable;
a protrusion part protruding from at least one of a first surface and a second surface, which face each other, on a portion of a circumference of the plate, and having a path through which the process gas is supplied; and
a plurality of injection holes defined in an inner wall of the protrusion part to inject the process gas from both sides of the substrate, and communicating with the path within the protrusion part,
wherein the process gas injected from the injection holes induces the flow of the process gas injected from the gas supply unit to the central portion of the substrate.

2. The substrate processing apparatus of claim 1 ,
wherein, when the plurality of laminates are laminated, the protrusion parts support the plates so that the plates are spaced apart from each other.

3. The substrate processing apparatus of claim 2 , wherein the gas supply unit is disposed on one side of the plate, and
the protrusion parts comprise:
a pair of first protrusion members spaced apart from each other on both sides of the plate in a direction crossing an injection direction of the process gas to inject a flow of the process gas from one side to the other side of the plate; and
a second protrusion member connected to the first protrusion members and disposed on the other side of the plate.

4. The substrate processing apparatus of claim 3 , wherein each of the laminates further comprises an exhaust hole defined in the plate to exhaust the process gas between the hollow part and the second protrusion member, and
the exhaust holes of the plurality of laminates are disposed in a line to provide a path through which the process gas is exhausted.

5. The substrate processing apparatus of claim 2 , wherein a plurality of isolation plates configured to divide a processing space in which each of the substrates is processed are disposed on the substrate holder, and
the isolation plates are disposed to correspond to the plate in a horizontal direction.

6. The substrate processing apparatus of claim 2 , wherein an insertion part is provided in the protrusion part, and
the tube assembly further comprises a fixing bar inserted into the insertion part to fix the laminates.

7. The substrate processing apparatus of claim 2 , wherein at least a portion of the protrusion parts of the plurality of laminates has a different thickness.

8. The substrate processing apparatus of claim 2 , wherein the tube assembly further comprises one or more height adjustment members installed between the protrusion parts of the plurality of laminates.

Assignees

• Eugene Technology Co Ltd

Inventors

• Yoo Cha Young
• Je Sung Tae
• Choi Kyu Jin
• Ku Ja Dae
• Kim Jun
• Jung Bong Ju
• Park Kyung Seok
• Kim Yong Ki
• Kim Jae Woo

Classifications

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/7621

  characterised by supporting two or more semiconductor substrates · CPC title

• H10P72/3302

  Mechanical parts of transfer devices · CPC title

• H10P72/127 Primary

  characterised by the substrate support · CPC title

• H10P72/18

  characterised by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports · CPC title