Method for manufacturing a waveguide for guiding an electro-magnetic wave

Patent metadata

Field	Value
Publication number	US-10838148-B2
Application number	US-201916703650-A
Country	US
Kind code	B2
Filing date	Dec 4, 2019
Priority date	Dec 4, 2018
Publication date	Nov 17, 2020
Grant date	Nov 17, 2020

Abstract

A method for manufacturing of a waveguide for guiding an electro-magnetic wave comprising: forming a first waveguide layer, a sacrificial layer and a protection layer on a first wafer, patterning to define a pattern of a first waveguide part and a supporting structure in the first waveguide layer; exposing the sacrificial layer on the first waveguide part while the protection layer still covers the sacrificial layer on the supporting structure; removing the sacrificial layer on the first waveguide part; removing the protection layer; bonding a second wafer to the sacrificial layer of the first wafer such that a second waveguide part is supported by the supporting structure and a gap corresponding to the thickness of the sacrificial layer is formed between the first and second waveguide parts.

First claim

What is claimed is:

1. A method for manufacturing of a waveguide for guiding an electro-magnetic wave, said method comprising:
forming a first waveguide layer, a sacrificial layer and a protection layer on a first wafer, the sacrificial layer being formed so as to provide a constant thickness of the sacrificial layer on the entire wafer;
patterning the first waveguide layer, the sacrificial layer and the protection layer so as to define a pattern of a first waveguide part in the first waveguide layer, the sacrificial layer and the protection layer to form a lateral spacing between the pattern of the first waveguide part and a supporting structure in the first waveguide layer;
selectively removing protection layer material from the first waveguide part using a mask and then selectively etching the protection layer on the entire wafer to expose the sacrificial layer on the pattern of the first waveguide part while the protection layer still covers the sacrificial layer on the supporting structure;
removing the sacrificial layer on the pattern of the first waveguide part;
removing the protection layer;
bonding a second wafer on the first wafer, the second wafer comprising a second waveguide part in a second waveguide layer, wherein the first and the second wafers are bonded by bonding the second wafer to the sacrificial layer of the first wafer such that the second waveguide part is supported by the supporting structure and a gap corresponding to the thickness of the sacrificial layer is formed between the first waveguide part and the second waveguide part and the first and second waveguide parts unitely form a single waveguide for guiding the electro-magnetic wave.

2. The method according to claim 1 , wherein the first waveguide part has a first width in a first direction perpendicular to a direction along which an electro-magnetic wave will be propagated in the waveguide and the second waveguide part has a second width in the first direction, wherein the second width is larger than the first width.

3. The method according to claim 1 , wherein the second waveguide layer forms a wide slab, which is configured to extend between supporting structures on opposite sides of the patterned first waveguide part when the first and second wafers are bonded.

4. The method according to claim 1 , wherein the sacrificial layer is formed to have a thickness corresponding to half a wavelength, preferably smaller than a hundredth of a wavelength, of the electro-magnetic wave to be guided by the waveguide.

5. The method according to claim 1 , further comprising after bonding the second wafer on the first wafer, selectively removing material of the second wafer to form a thin structure above the first waveguide part.

6. The method according to claim 1 , wherein the sacrificial layer is formed by thermal growth or by atomic layer deposition.

7. The method according to claim 1 , further comprising, before said selectively removing protection layer material and after said patterning, depositing protection layer material on the first wafer.

8. The method according to claim 1 , wherein said selectively removing of protection layer material comprises defining the mask by optical lithography, selectively etching the protection layer in the area defined by the mask using a dry etch, and removing the mask.

9. The method according to claim 1 , wherein said selectively etching the protection layer comprises etching using a wet etch selective to the protection layer material.

10. The method according to claim 1 , wherein said removing of the sacrificial layer comprises etching using a wet etch selective to sacrificial layer material.

11. The method according to claim 1 , wherein said removing of the protection layer comprises etching using a wet etch selective to the protection layer material.

12. The method according to claim 1 , wherein said patterning of the first waveguide layer, the sacrificial layer and the protection layer further defines a third waveguide part in the first waveguide layer, wherein the first and the second wafers are bonded by bonding the second wafer to the sacrificial layer of the first wafer such that the second waveguide part is supported by the supporting structure and a gap corresponding to the thickness of the sacrificial layer is formed between the third waveguide part and the second waveguide part and the second and third waveguide parts unitely form a single waveguide for guiding an electro-magnetic wave in a closed loop in a plane parallel to the first wafer.

13. The method according to claim 1 , wherein the first and second waveguide layers are formed by silicon or silicon nitride, and the sacrificial layer is formed by silicon dioxide.

14. The method according to claim 1 , wherein the second wafer comprises a top bonding layer, wherein the first and the second wafers are bonded by bonding of the bonding layer of the second wafer to the sacrificial layer of the first wafer.

Assignees

• Imec Vzw
• Univ Leuven Kath

Inventors

• Hasan Md Mahmud Ul
• Severi Simone
• Rochus Veronique
• Westerveld Wouter Jan

Classifications

• G02B6/132 Primary

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• G02B2006/12138

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• C23C16/56

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• G02B2006/12173

  Masking · CPC title