Cylindrical shaped arc chamber for indirectly heated cathode ion source

Patent metadata

Field	Value
Publication number	US-10818469-B2
Application number	US-201816219302-A
Country	US
Kind code	B2
Filing date	Dec 13, 2018
Priority date	Dec 13, 2018
Publication date	Oct 27, 2020
Grant date	Oct 27, 2020

Abstract

An indirectly heated cathode ion source having a cylindrical housing with two open ends is disclosed. The cathode and repeller are sized to fit within the two open ends. These components may be inserted into the open ends, creating a small radial spacing that provides electrical isolation between the cylindrical housing and the cathode and repeller. In another embodiment, the repeller may be disposed from the end of the cylindrical housing creating a small axial spacing. In another embodiment, insulators are used to hold the cathode and repeller in place. This design results in a reduced distance between the cathode column and the extraction aperture, which may be beneficial to the generation of ion beams of certain species.

First claim

What is claimed is:

1. An indirectly heated cathode (IHC) ion source, comprising:
a cylindrical housing having a first open end and a second open end opposite the first open end, wherein the cylindrical housing is metal;
a cathode disposed in the first open end of the cylindrical housing, such that a front surface of the cathode is disposed in the cylindrical housing; and
a repeller proximate the second open end, wherein the cylindrical housing, the cathode and the repeller define an arc chamber.

2. The IHC ion source of claim 1 , wherein an inner diameter of the cylindrical housing is greater than an outer diameter of the cathode at all locations along a central axis of the cylindrical housing.

3. The IHC ion source of claim 2 , wherein a radial spacing exists between the cathode and the cylindrical housing.

4. The IHC ion source of claim 3 , wherein feedgas in the arc chamber escapes through the radial spacing.

5. The IHC ion source of claim 2 , wherein a distance between the outer diameter of the cathode and the inner diameter of the cylindrical housing is less than 1 mm.

6. The IHC ion source of claim 1 , wherein an outer diameter of the repeller is less than an inner diameter of the cylindrical housing such that the repeller is disposed in the second open end.

7. The IHC ion source of claim 1 , wherein an outer diameter of the repeller is greater than an inner diameter of the cylindrical housing such that the repeller is disposed proximate the second open end, and the repeller is spaced apart from the second open end in an axial direction.

8. The IHC ion source of claim 7 , wherein the repeller is less than 1 mm from the second open end in the axial direction.

9. An indirectly heated cathode (IHC) ion source, comprising
a cylindrical housing having a first open end and a second open end opposite the first open end;
a cathode disposed in the first open end of the cylindrical housing;
a cathode holder disposed at the first open end, the cathode holder comprising an insulating material contacting the cylindrical housing and the cathode to hold the cathode in place; and
a repeller proximate the second open end.

10. The IHC ion source of claim 9 , wherein the cathode holder has an inner surface having a first inner diameter greater than an outer diameter of the cylindrical housing and a second inner diameter, less than the first inner diameter, wherein the cylindrical housing contacts the first inner diameter and the cathode contacts the second inner diameter.

11. The IHC ion source of claim 10 , wherein a front surface of the cathode extends into the cylindrical housing.

12. The IHC ion source of claim 9 , wherein the cathode holder has an outer surface having an outer diameter greater than an outer diameter of the cylindrical housing, an inner surface having an inner diameter, two sidewalls extending between the outer surface and the inner surface and a slot disposed in one of the two sidewalls, wherein the cylindrical housing is disposed in the slot and the cathode contacts the inner surface.

13. The IHC ion source of claim 9 , comprising a repeller holder proximate the second open end, the repeller holder comprising an insulating material contacting the cylindrical housing and the repeller to hold the repeller in place.

14. An indirectly heated cathode (IHC) ion source, comprising
a cylindrical housing having a first open end and a second open end opposite the first open end;
a cathode disposed in the first open end of the cylindrical housing;
a repeller proximate the second open end; and
a repeller holder proximate the second open end, the repeller holder comprising an insulating material contacting the cylindrical housing and the repeller to hold the repeller in place.

15. The IHC ion source of claim 14 , wherein an outer diameter of the repeller is equal to an outer diameter of the cylindrical housing, and an inner surface of the repeller holder contacts the cylindrical housing and the repeller.

16. The IHC ion source of claim 15 , wherein the inner surface comprises a protrusion to maintain an axial spacing between the repeller and the second open end of the cylindrical housing.

17. The IHC ion source of claim 14 , wherein the repeller holder has an outer surface having an outer diameter greater than an outer diameter of the cylindrical housing, an inner surface having an inner diameter, two sidewalls extending between the outer surface and the inner surface and a slot disposed in one of the two sidewalls, wherein the cylindrical housing is disposed in the slot and the repeller contacts the inner surface.

18. The IHC ion source of claim 17 , wherein the repeller has an outer diameter greater than the inner diameter of the repeller holder, and further comprising a notch disposed in the inner surface, and wherein the repeller is disposed in the notch.

Assignees

• Applied Materials Inc

Inventors

• Perel Alexander S
• Scheuer Jay T
• Wright Graham

Classifications

• H01J37/08 Primary

  Ion sources; Ion guns · CPC title

• H01J2237/0815

  Methods of ionisation · CPC title

• H01J37/06

  Electron sources; Electron guns · CPC title

• H01J2237/31701

  Ion implantation · CPC title