Shower head of combinatorial spatial atomic layer deposition apparatus

Patent metadata

Field	Value
Publication number	US-10815569-B2
Application number	US-201615014568-A
Country	US
Kind code	B2
Filing date	Feb 3, 2016
Priority date	Aug 28, 2015
Publication date	Oct 27, 2020
Grant date	Oct 27, 2020

Abstract

A shower head of a combinatorial spatial atomic layer deposition (CS-ALD) apparatus may be provided. The shower head of the CS-ALD apparatus may include a plurality of shower blocks. Each of shower blocks may include a plurality of unit modules. Each of the shower blocks and each of the unit modules may be controlled independently from each other. Each of the plurality of unit modules may include a source gas injection nozzle, a purge gas injection nozzle, a reactant gas injection nozzle, and exhaust areas between the injection nozzles. The plurality of shower blocks may be separated from each other. Gas injection areas of the injection nozzles may be separated from the exhaust area.

First claim

What is claimed is:

1. A shower head comprising:
a plurality of shower blocks, the plurality of shower blocks each comprising a plurality of unit modules, each of the shower blocks and each of the unit modules configured to be independently controlled, the plurality of unit modules each including,
a plurality of injection nozzles including,
a first source gas injection nozzle configured to supply a first source gas,
a first purge gas injection nozzle configured to supply a first purge gas,
a reactant gas injection nozzle configured to supply a reactant gas, and

at least one exhaust area between the injection nozzles and configured to exhaust remaining portions of the first source gas, the first purge gas, and the reactant gas after use,
wherein the at least one exhaust area includes a first exhaust area between the first source gas injection nozzle and the first purge gas injection nozzle, and a second exhaust area between the reactant gas injection nozzle and the first purge gas injection nozzle,
each of the shower blocks comprises a plurality of source gas injection areas, and
the plurality of source gas injection areas are arranged in a line and are surrounded by the first exhaust area having a circumferential slot of a closed shape.

2. The shower head of claim 1 , wherein the plurality of shower blocks are separated from each other.

3. The shower head of claim 1 , wherein at least one gas injection area accommodating the injection nozzles is separated from the at least one exhaust area.

4. The shower head of claim 1 , further comprising:
a first source gas supply line connected to the first source gas injection nozzle;
a first purge gas supply line connected to the first purge gas injection nozzle; and
automatic valves respectively provided at the first source gas supply line and the first purge gas supply line and controlled by a computer program.

5. The shower head of claim 1 , wherein the plurality of unit modules are spaced apart from each other.

6. The shower head of claim 1 , wherein the first source gas injection nozzle is surrounded by the at least one exhaust area.

7. The shower head of claim 1 , wherein the reactant gas injection nozzle is surrounded by the at least one exhaust area.

8. The shower head of claim 1 , further comprising:
a second source gas injection nozzle and a second purge gas injection nozzle between the first purge gas injection nozzle and the reactant gas injection nozzle.

9. The shower head of claim 8 , further comprising:
automatic valves respectively connected to the second source gas injection nozzle and the second purge gas injection nozzle.

10. The shower head of claim 1 , wherein the plurality of shower blocks are arranged in a circular shape along a circumferential surface of a cylindrical drum.

11. The shower head of claim 1 , wherein a first exhaust passage connected to the at least one exhaust area adjacent to the first source gas injection nozzle is separately provided from a second exhaust passage connected to the at least one exhaust area adjacent to the reactant gas injection nozzle.

12. The shower head of claim 1 , wherein the first purge gas injection nozzle is between the first source gas injection nozzle and the reactant gas injection nozzle in a direction perpendicular to an extension direction of the first source gas injection nozzle and the reactant gas injection nozzle.

13. The shower head of claim 1 , wherein each of the shower blocks comprises a plurality of reactant gas injection areas, and the plurality of reactant gas injection areas are surrounded by the second exhaust area.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Wenxu Xianyu
• Kim Yongsung
• Shin Jaikwang
• Yang Wooyoung

Classifications

• C40B60/00

  Apparatus specially adapted for use in combinatorial chemistry or with libraries · CPC title

• C23C16/45548

  having arrangements for gas injection at different locations of the reactor for each ALD half-reaction · CPC title

• C23C16/45525

  Atomic layer deposition [ALD] · CPC title

• C23C16/45544

  characterized by the apparatus · CPC title

• C23C16/45565 Primary

  Shower nozzles · CPC title