Large radius probe

Patent metadata

Field	Value
Publication number	US-10802045-B2
Application number	US-201815935937-A
Country	US
Kind code	B2
Filing date	Mar 26, 2018
Priority date	Mar 26, 2018
Publication date	Oct 13, 2020
Grant date	Oct 13, 2020

Abstract

A large radius probe for a surface analysis instrument such as an atomic force microscope (AFM). The probe is microfabricated to have a tip with a hemispherical distal end or apex. The radius of the apex is the range of about a micron making the probes particularly useful for nanoindentation analyses. The processes of the preferred embodiments allow such large radius probes to be batch fabricated to facilitate cost and robustness.

First claim

What is claimed is:

1. A method of batch-fabricating probes for a surface analysis instrument, the method including:
providing a substrate;
forming an array of cylindrical posts from the substrate;
depositing tip material on the posts so as to create a hemispherical cap on each post;
removing the tip material around the cap to form a tip, wherein a distal end of the hemispherical cap has a radius greater than ¼ μm; and
forming a cantilever for each cap.

2. The method of claim 1 , wherein the forming step includes patterning an array of cylindrical photoresist features on the substrate, etching the substrate using the array of cylindrical photoresist features as a mask and then removing the photoresist features so as to reveal the array of posts.

3. The method of claim 2 , wherein the posts are substantially cylindrical with or without a pointed apex, and further comprising narrowing a width of the posts.

4. The method of claim 3 , wherein the narrowing step includes isotropically etching the posts or consuming the post material by oxidation and etch.

5. The method of claim 2 , wherein parameters of the substrate etch are selected so as to form the posts with a flared base.

6. The method of claim 1 , wherein the tip material is any material that can be conformally deposited.

7. The method of claim 6 , wherein the tip material is silicon nitride.

8. The method of claim 6 , wherein the depositing step is LPCVD.

9. The method of claim 6 , wherein the cantilever is formed either from the tip material itself or from the silicon material underneath the cap.

10. The method of claim 1 , wherein the substrate is a silicon wafer.

11. The method of claim 1 , wherein the cap defines a tip of the probe, and a radius of the tip is at least ¼ micron.

12. The method of claim 1 , wherein the tip has a radius that is greater than 1 micron.

13. The method of claim 1 , wherein the hemispherical caps form the apex of high aspect ratio tips.

14. The method of claim 1 , wherein the tips are tilted to accommodate mounting the probe in the surface analysis instrument.

15. The method of claim 1 , wherein the removing step includes leaving a portion of the tip material so as to form a base between the cantilevers and the caps.

16. The method of claim 1 , wherein the surface analysis instrument is an AFM.

17. An AFM probe microfabricated by a process comprising the steps of:
providing a substrate;
forming an array of cylindrical posts from the substrate;
depositing tip material on the posts so as to create a hemispherical cap on each post;
removing the tip material around the cap to form a tip wherein the hemispherical cap has a radius greater than ¼ μm; and
forming a cantilever for each cap.

18. The probe of claim 17 , wherein the forming step includes patterning an array of cylindrical photoresist features on the substrate, etching the substrate using the array of cylindrical photoresist features as a mask and then removing the photoresist features so as to reveal the array of posts.

19. The probe of claim 17 , wherein the cap defines a tip of the probe, and a radius of the tip is at least ¼ micron.

20. A method of batch-fabricating probes for a surface analysis instrument, the method including:
providing a substrate;
forming an array of posts from the substrate;
depositing tip material on the posts so as to create a hemispherical cap on each post;
removing the tip material around the cap to form a tip wherein the hemispherical cap has a radius greater than ¼ μm;
forming a cantilever for each cap; and
wherein the forming step includes patterning an array of cylindrical photoresist features on the substrate having a height at least about ¼ μm, etching the substrate using the array of cylindrical photoresist features as a mask and then removing the photoresist features so as to reveal the array of posts.

Assignees

• Bruker Nano Inc

Inventors

• Wong Jeffrey

Classifications

• G01Q60/38 Primary

  Probes, their manufacture, or their related instrumentation, e.g. holders · CPC title

• G01Q60/366 Primary

  Nanoindenters, i.e. wherein the indenting force is measured · CPC title

• G01Q70/10

  Shape or taper · CPC title

• C23C16/56

  After-treatment · CPC title

• C23C16/0227

  by cleaning or etching · CPC title