Plasma processing apparatus

Patent metadata

Field	Value
Publication number	US-10796884-B2
Application number	US-201414181968-A
Country	US
Kind code	B2
Filing date	Feb 17, 2014
Priority date	Sep 6, 2013
Publication date	Oct 6, 2020
Grant date	Oct 6, 2020

Abstract

A plasma processing device includes a processing chamber for generating a plasma, a vacuum window that constitutes a part of a wall of the processing chamber, induction antennas including at least two systems for generating plasma in the processing chamber, radio frequency power sources for applying the current independently to the respective induction antennas, and a controller including phase circuits for controlling the phase of the current of the radio frequency power sources of the respective systems or the current value over time, and a control unit. The controller sequentially time modulates the phase difference between currents flowing to the systems or the current value within a sample processing period to move the plasma generation position so as to make the ion incident angle to the wafer uniform in the wafer plane.

First claim

What is claimed is:

1. A plasma processing apparatus comprising:
a processing chamber for plasma processing of a sample;
a dielectric window for air-tightly sealing the processing chamber;
two induction antennas provided outside the dielectric window for generating an induced magnetic field;
two radio frequency power sources for supplying radio frequency power to the induction antennas; and
a controller configured to periodically change a phase difference of a radio frequency current flowing to the induction antennas over time,
wherein a first of the two induction antennas comprises a first plurality of U-shaped elements which receives radio frequency power from a first radio frequency power source, a first of said first plurality of U-shaped elements comprising first and second element portions extending in a first direction and connected at respective first ends to a third element portion which extends in a second direction orthogonal to said first direction, and a second of said first plurality of U-shaped elements comprising first and second element portions extending in said second direction and connected at respective first ends to a third element portion which extends in the first direction,
wherein a second of the two induction antennas comprises a second plurality of U shaped elements which receives radio frequency power from a second radio frequency power source, a first of said second plurality of U-shaped elements comprising first and second element portions extending in the second direction and connected at respective first ends to a third element portion which extends in the first direction, and a second of said first plurality of U-shaped elements comprising first and second element portions extending in said first direction and connected at respective first ends to a third element portion which extends in the second direction,
wherein the first plurality of induction antennas is arranged to have a first fold of a predetermined length in the first direction, and a second fold of a predetermined length in the second direction, and the second plurality of induction antennas is arranged to have a first fold of a predetermined length in the second direction, and a second fold of a predetermined length in the first direction, the two induction antennas being arranged such that the first and second pluralities of induction antennas cross with each other at right angles, and are adjacent and parallel to each other,
wherein a second end of said second element of said first plurality of U-shaped elements, and a second end of said second element of said second plurality of U-shaped elements, are connected only via an intermediate wiring connection, and
wherein all elements of said first induction antenna are connected only in series, and all elements of said second induction antenna are connected only in series.

2. The plasma processing apparatus according to claim 1 , wherein the dielectric window is provided with an electrode at a side where the induction antennas are disposed for suppressing an eddy current induced by the radio frequency current flowing to the induction antennas.

3. The plasma processing apparatus according to claim 2 , wherein the electrode includes a plurality of conductor plates which are two-dimensionally arranged along the induction antennas.

4. The plasma processing apparatus according to claim 1 , wherein the first phase difference is 0° and the second phase difference is 180°.

5. The plasma processing apparatus according to claim 1 , wherein the controller is configured to change the phase difference of the radio frequency current flowing to the adjacent induction antennas to a value between 0 and 360 degrees.

6. A processing apparatus comprising:
a plasma processing chamber for plasma processing of a sample;
a dielectric window for air-tightly sealing the processing chamber;
a plurality of induction antennas provided outside the dielectric window for generating an induced magnetic field;
a plurality of radio frequency power sources for supplying radio frequency power to the induction antennas; and
a controller configured to periodically change a phase difference of a radio frequency current flowing to any two adjacent induction antennas of said plurality of induction antennas over time so that a magnetic field intensifies at a first absorption region when the respective radio frequency power sources for each said two adjacent induction antennas have a first phase difference, and intensifies at second absorption regions and is cancelled at the first absorption region when the respective radio frequency power sources for each said two adjacent induction antennas have a second phase difference,
wherein a first of the plurality of induction antennas comprises a first plurality of U-shaped elements which receives radio frequency power from a first of said plurality of radio frequency power sources, a first of said first plurality of U-shaped elements comprising first and second element portions extending in a first direction and connected at respective ends to a third element portion which extends in a second direction orthogonal to said first direction, and a second of said first plurality of U-shaped elements comprising first and second element portions extending in said second direction and connected at respective ends to a third element portion which extends in the first direction,
wherein a second of the plurality of induction antennas comprises a second plurality of U-shaped elements which receives radio frequency power from a second of said plurality of radio frequency power sources, a first of said second plurality of U-shaped elements comprising first and second element portions extending in the second direction and connected at respective ends to a third element portion which extends in the first direction, and a second of said first plurality of U-shaped elements comprising first and second element portions extending in said first direction and connected at respective ends to a third element portion which extends in the second direction, and
wherein in the case where the number of the induction antennas is n as an integer equal to or larger than 3, the induction antennas are arranged so as to cross with one another at an acute angle forming an n-polygonal shape,
wherein the controller shifts a timing to change the phase difference of the radio frequency current flowing to adjacent induction antennas over time by (360/n) degrees, and
wherein all elements of each of said plurality of induction antennas are connected only in series.

7. The plasma processing apparatus according to claim 6 , wherein a circuit composed of a capacitor and a coil is provided between a ground part and a terminal of each of the plurality of induction antennas.

8. The plasma processing apparatus according to claim 6 , wherein the first phase difference is 0° and the second phase difference is 180°.

9. The plasma processing apparatus according to claim 6 , wherein the controller is configured to change the phase difference of the radio frequency current flowing to the adjacent induction antennas to a value between 0 and 360 degrees.

10. A plasma processing apparatus comprising:
a processing chamber for plasma processing of a sample;
a dielectric window for air-tightly sealing the processing chamber;
two induction antennas provided outside the dielectric window for generating an induced magnetic field;
two radio frequency power sources for supplying radio frequency power to the induction antennas; and
a controller configured to apply a time modulated radio frequency current to the induction antennas, and to make phases of the time modulated radio frequency currents to be different from one a

Assignees

• Hitachi High Tech Corp

Inventors

• Tetsuka Tsutomu
• Satake Makoto
• Kawaguchi Tadayoshi

Classifications

• H01J37/3211 Primary

  Antennas, e.g. particular shapes of coils · CPC title

• H01J37/32137 Primary

  controlling of the discharge by modulation of energy · CPC title

• H01J37/32532

  Electrodes · CPC title

• H01J37/32119

  Windows · CPC title

• C23C16/507

  using external electrodes, e.g. in tunnel type reactors · CPC title