Mask for thin film deposition, method of manufacturing the same, and method of manufacturing a display apparatus using the same

Patent metadata

Field	Value
Publication number	US-10790447-B2
Application number	US-201815865141-A
Country	US
Kind code	B2
Filing date	Jan 8, 2018
Priority date	Jul 20, 2017
Publication date	Sep 29, 2020
Grant date	Sep 29, 2020

Abstract

A mask for thin film deposition of a display apparatus having both end portions coupleable to a frame in a state of tension in a lengthwise direction thereof, the mask including: a first portion having a first thickness and a plurality of pattern holes through which a deposition material may pass; a second portion comprising a welding portion having a second thickness configured to be coupled to a frame; and a third portion connecting the first portion and the third portion, wherein the first thickness is less than the second thickness, and the third portion includes an inclined surface connecting the first portion and the second portion.

First claim

What is claimed is:

1. A method of manufacturing a display apparatus from a mask for thin film deposition having both end portions coupled to a frame in a state of tension in a lengthwise direction thereof, the method comprising the steps of:
inserting a display substrate and a mask for thin film deposition into a chamber, the mask having a pattern portion in which a plurality of holes are formed, a welding portion coupled to the frame, and a connection portion having an inclined surface disposed between the pattern portion and the welding portion, the inclined surface being connected to an edge portion of the pattern portion without being connected to peripheries of the holes, the inclined surface being defined by an acute inclination angle, wherein the pattern portion has a thickness less than the thickness of the welding portion; and
forming a film using a deposition material on the display substrate by conducting the deposition material sprayed from a deposition source through the holes in the mask for thin film deposition,
wherein the pattern portion, the welding portion, and the connection portion comprise a first plating layer formed through a first electroforming step, and
the welding portion and the connection portion include a second plating layer formed through a second electroforming step distinct from the first electroforming step.

2. The method of claim 1 , wherein the acute inclination angle is greater than or equal to about 0.025° and less than or equal to about 10°.

3. The method of claim 2 , wherein the acute inclination angle is greater than or equal to about 0.045° and less than or equal to about 10°.

4. The method of claim 1 , wherein the second plating layer is formed on the first plating layer.

5. The method of claim 1 , wherein the inclined surface is formed on the second plating layer of the connection portion.

6. The method of claim 1 , wherein the plurality of holes are formed by etching part of the pattern portion by irradiating a laser beam onto the pattern portion.

7. The method of claim 1 , wherein the plurality of holes are formed by etching part of the pattern portion through wet etching.

Assignees

• Samsung Display Co Ltd

Inventors

• Moon Youngmin
• Im Sungsoon
• Kim Jeongkuk
• Moon Minho
• Hwang Kyuhwan

Classifications

• H10K59/8731

  multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers · CPC title

• H10K59/12

  Active-matrix OLED [AMOLED] displays · CPC title

• H10K71/166

  using selective deposition, e.g. using a mask · CPC title

• C25D1/08 Primary

  Perforated or foraminous objects, e.g. sieves (C25D1/10 takes precedence) · CPC title

• C23C14/12

  Organic material · CPC title