Charged particle beam irradiation apparatus, charged particle beam image acquisition apparatus, and charged particle beam inspection apparatus

Patent metadata

Field	Value
Publication number	US-10790110-B2
Application number	US-201916356610-A
Country	US
Kind code	B2
Filing date	Mar 18, 2019
Priority date	Mar 29, 2018
Publication date	Sep 29, 2020
Grant date	Sep 29, 2020

Abstract

According to one aspect of the present invention, a charged particle beam irradiation apparatus includes an electromagnetic lens configured to refract the charged particle beam; a plurality of electrodes arranged in a magnetic field of the electromagnetic lens and arranged to surround an outer space of a passage region of the charged particle beam; a supply mechanism configured to supply a gas to the space surrounded by the plurality of electrodes; a potential control circuit configured to control potentials of the plurality of electrodes so that a plasma is generated in the space surrounded by the plurality of electrodes and movements of electrons or positive ions generated by the plasma are controlled; and a stage configured to dispose a substrate irradiated with a charged particle beam passing through the electromagnetic lens, wherein the substrate is irradiated with light radiated by the plasma.

First claim

What is claimed is:

1. A charged particle beam irradiation apparatus comprising:
an emission source configured to emit a charged particle beam;
an electromagnetic lens configured to refract the charged particle beam;
a plurality of electrodes arranged in a magnetic field of the electromagnetic lens and arranged to surround an outer space of a passage region of the charged particle beam;
a supply mechanism configured to supply a gas to the space surrounded by the plurality of electrodes;
a potential control circuit configured to control potentials of the plurality of electrodes so that a plasma is generated in the space surrounded by the plurality of electrodes and movements of electrons or positive ions generated by the plasma are controlled; and
a stage configured to dispose a substrate irradiated with a charged particle beam passing through the electromagnetic lens,
wherein the substrate is irradiated with light radiated by the plasma.

2. The apparatus according to claim 1 ,
wherein the plasma is generated by a magnetron discharge.

3. The apparatus according to claim 1 ,
wherein the plasma is generated by a Penning discharge.

4. The apparatus according to claim 1 , further comprising:
a high frequency wave generation mechanism configured to generate a high frequency wave heating the plasma inside the space.

5. The apparatus according to claim 1 , further comprising:
a mirror configured to focus light radiated by the plasma to the substrate.

6. The apparatus according to claim 1 ,
wherein an electron beam is used as the charged particle beam.

7. The apparatus according to claim 6 ,
wherein multiple electron beams are used as the electron beam,
the apparatus further comprising a shaping aperture array substrate configured to form the multiple electron beams.

8. The apparatus according to claim 7 ,
wherein an objective lens focusing the multiple electron beams to the substrate is used as the electromagnetic lens.

9. A charged particle beam image acquisition apparatus comprising:
an emission source configured to emit a charged particle beam;
a stage configured to dispose a substrate thereon;
an electromagnetic lens configured to refract the charged particle beam;
a plurality of electrodes arranged in a magnetic field of the electromagnetic lens and arranged to surround an outer space of a passage region of the charged particle beam;
a supply mechanism configured to supply a gas to the space surrounded by the plurality of electrodes;
a potential control circuit configured to control potentials of the plurality of electrodes so that a plasma is generated in the space surrounded by the plurality of electrodes and movements of electrons or positive ions generated by the plasma are controlled; and
a detector configured to detect a secondary electron beam emitted from the substrate due to an irradiation of the charged particle beam passing through the electromagnetic lens while the substrate is irradiated with light radiated by the plasma.

10. A charged particle beam inspection apparatus comprising:
an emission source configured to emit a charged particle beam;
a stage configured to dispose a substrate thereon;
an electromagnetic lens configured to refract the charged particle beam;
a plurality of electrodes arranged in a magnetic field of the electromagnetic lens and arranged to surround an outer space of a passage region of the charged particle beam;
a supply mechanism configured to supply a gas to the space surrounded by the plurality of electrodes;
a potential control circuit configured to control potentials of the plurality of electrodes so that a plasma is generated in the space surrounded by the plurality of electrodes and movements of electrons or positive ions generated by the plasma are controlled;
a detector configured to detect a secondary electron beam emitted from the substrate due to an irradiation of the charged particle beam passing through the electromagnetic lens while the substrate is irradiated with light radiated by the plasma; and
a comparison circuit configured to compare a secondary electron image obtained by a detected secondary electron beam with a reference image.

Assignees

• Nuflare Technology Inc

Inventors

• Ogasawara Munehiro

Classifications

• H05G2/007

  involving electric or magnetic fields in the process of plasma generation · CPC title

• H01J37/026 Primary

  Means for avoiding or neutralising unwanted electrical charges on tube components · CPC title

• H01J2237/2448

  Secondary particle detectors · CPC title

• H01J37/141

  Electromagnetic lenses · CPC title

• H01J2237/1405

  Constructional details · CPC title