Gas-recycling device, additive manufacturing apparatus, and additive manufacturing method

US10780495B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10780495-B2
Application numberUS-201515552857-A
CountryUS
Kind codeB2
Filing dateSep 10, 2015
Priority dateMar 18, 2015
Publication dateSep 22, 2020
Grant dateSep 22, 2020

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  1. Title

    What the patent document calls the invention.

  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A gas-recycling device according to an embodiment includes a particle remover, a liquid remover, and a supplier. The particle remover brings a mist of liquid into contact with a gas which includes particles and is discharged from an apparatus, to remove the particles from the gas. The liquid remover removes the liquid from the gas having passed through the particle remover. The supplier supplies the gas to the apparatus.

First claim

Opening claim text (preview).

The invention claimed is: 1. An additive manufacturing apparatus comprising: a manufacturing unit which adds a layer upon a layer of a powdery material and melts or sinters the material in an inert gas atmosphere to manufacture an object; a particle remover which brings a mist of liquid into contact with the inert gas which includes particles and is discharged from the manufacturing unit, to remove the particles from the inert gas; a liquid remover which removes the liquid from the inert gas having passed through the particle remover; and a supplier which supplies the inert gas to the manufacturing unit. 2. The additive manufacturing apparatus according to claim 1 , wherein the particle remover includes a receiver, an injector which injects the mist of the liquid toward the receiver, and a filter which captures the particles from the liquid including the particles and adhering to the receiver. 3. The additive manufacturing apparatus according to claim 2 , wherein the receiver is provided with an opening from which the liquid including the particles is discharged, and the filter is positioned so that the liquid discharged from the opening passes through the filter. 4. The additive manufacturing apparatus according to claim 3 , wherein the filter forms a first wound part, a second wound part, and a third part located between the first part and the second part, the third part through which the liquid discharged from the discharger passes, and the particle remover includes a sensor which detects a weight of the third part of the filter, and a conveyer which conveys the filter from the first part to the second part in accordance with the weight of the third part. 5. The additive manufacturing apparatus according to claim 2 , wherein the particle remover further includes a liquid supplier which supplies the liquid filtered through the filter to the injector. 6. The additive manufacturing apparatus according to claim 1 , wherein the liquid remover includes a heater which heats the liquid included in the inert gas. 7. The additive manufacturing apparatus according to claim 1 , wherein the supplier removes, from the inert gas having passed through the liquid remover, a gas having a different component from that of the inert gas. 8. The additive manufacturing apparatus according to claim 1 , wherein the liquid is the inert gas which is liquefied. 9. The additive manufacturing apparatus according to claim 8 , wherein the inert gas is nitrogen. 10. The additive manufacturing apparatus according to claim 1 , wherein the particle remover includes a duct which converges a flow of the inert gas, and an injector which is provided in the duct and injects the mist of the liquid to the inert gas from multiple directions. 11. The additive manufacturing apparatus according to claim 1 , wherein the particle remover is provided with a convergence passage through which a flow of the inert gas converges, and the particle remover includes an injector which injects the mist of the liquid to an area including a position at which the inert gas having passed through the convergence passage gathers. 12. The additive manufacturing apparatus according to claim 1 , wherein the particle remover is provided with a passage through which the inert gas flows, and the particle remover includes an injector which injects the mist of the liquid toward an upstream of a flow of the inert gas rather than a direction orthogonal to the flow of the inert gas in the passage. 13. The additive manufacturing apparatus according to claim 1 , wherein the particle remover is provided with a passage through which the inert gas flows, and the particle remover includes an injector which injects the mist of the liquid toward a downstream of a flow of the inert gas rather than a direction orthogonal to the flow of the inert gas in the passage.

Assignees

Inventors

Classifications

  • of gas · CPC title

  • Gas flow means · CPC title

  • Scanners · CPC title

  • characterised by the configuration of the radiation means · CPC title

  • of the atmosphere, e.g. composition or pressure in a building chamber · CPC title

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Frequently asked questions

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What does patent US10780495B2 cover?
A gas-recycling device according to an embodiment includes a particle remover, a liquid remover, and a supplier. The particle remover brings a mist of liquid into contact with a gas which includes particles and is discharged from an apparatus, to remove the particles from the gas. The liquid remover removes the liquid from the gas having passed through the particle remover. The supplier supplie…
Who is the assignee on this patent?
Toshiba Kk
What technology area does this patent fall under?
Primary CPC classification B01D47/06. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 22 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).