Compound, resin, resist composition and method for producing resist pattern

Patent metadata

Field	Value
Publication number	US-10774029-B2
Application number	US-201816138275-A
Country	US
Kind code	B2
Filing date	Sep 21, 2018
Priority date	Aug 25, 2014
Publication date	Sep 15, 2020
Grant date	Sep 15, 2020

Abstract

A compound represented by the formula (I).

wherein R 1 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group that may have a halogen atom; R 2 represents a C 1 to C 12 fluorinated saturated hydrocarbon group; W 1 represents a C 5 to C 18 divalent alicyclic hydrocarbon group; A 1 and A 2 independently represents a single bond or *-A 3 -X 1 -(A 4 -X 2 ) a —; A 3 and A 4 independently represents a C 1 to C 6 alkanediyl group; X 1 and X 2 independently represents —O—, —CO—O— or —O—CO—; a represents 0 or 1; and * represents a bond to an oxygen atom.

First claim

The invention claimed is:

1. A compound represented by formula (I),

wherein R 1 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group that may have a halogen atom;
R 2 represents —(CH 2 ) n —R f or —CH(R fa )(R fb ), where n represents an integer of 1 to 6, and R f , R fa and R fb each independently represent a C 1 to C 6 perfuloroalkyl group;
represents a C 5 to C 18 divalent alicyclic hydrocarbon group;
A 1 and A 2 each independently represent a single bond or *-A 3 -X 1 -(A 4 -X 2 ) a —;
A 3 and A 4 each independently represent a C 1 to C 6 alkanediyl group;
X 1 and X 2 each independently represents —O—, —CO—O— or —O—CO—;
a represents 0 or 1; and
* represents a binding site to an oxygen atom.

2. The compound according to claim 1 , wherein
W 1 is an adamantanediyl group or a cyclohexanediyl group.

3. The compound according to claim 2 , wherein
the adamantanediyl group is any one of the groups represented by formulae (Ad-1) to (Ad-3);

wherein one of * is a binding site to A 1 and another * is a binding site to a carbonyl group.

4. The compound according to claim 1 , wherein A 1 is a single bond.

5. The compound according to claim 1 , wherein
R 2 is —(CH 2 ) n —R f ,
where n represents an integer of 1 to 6, and
R f represents a C 1 to C 6 perfluoroalkyl group.

6. The compound according to claim 1 , wherein
R 2 is —CH(R fa )(R fb );
where R Fa and R fb each independently represent a C 1 to C 6 perfluoroalkyl group, provided that R Fa and R fb have 11 or less of carbon atoms in total.

7. A compound represented by formula (I′):

wherein R 1 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group that may have a halogen atom;
R 2 represents —(CH 2 ) n —R f where n represents an integer of 2 to 6, and R f represents a C 1 to C 6 perfluoroalkyl group;
represents a cyclopentanediyl group, a cyclohexanediyl group, an adamantanediyl group, or a norbornanediyl group;
A 1 and A 2 each independently represent a single bond or *-A 3 -X 1 -(A 4 -X 2 ) a —;
A 3 and A 4 each independently represent a C 1 to C 6 alkanediyl group;
X 1 and X 2 each independently represents —O—, —CO—O— or —O—CO—;
a represents 0 or 1; and
* represents a binding site to an oxygen atom.

Assignees

• Sumitomo Chemical Co

Inventors

• Masuyama Tatsuro
• Yamamoto Satoshi
• Ichikawa Koji

Classifications

• G03F7/0046

  with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title

• C07C2603/74

  Adamantanes · CPC title

• C07C69/757

  having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, [IMAGE cpc-sch-C07C-0958.gif] groups,[IMAGE cpc-sch-C07C-0959.gif] groups, or[IMAGE cpc-sch-C07C-0960.gif] in the acid moiety · CPC title

• G03F7/325

  Non-aqueous compositions · CPC title

• G03F7/0397 Primary

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title