Anhydrous substrate cleaning composition, substrate treating method, and substrate treating apparatus

Patent metadata

Field	Value
Publication number	US-10773281-B2
Application number	US-201715721188-A
Country	US
Kind code	B2
Filing date	Sep 29, 2017
Priority date	Sep 30, 2016
Publication date	Sep 15, 2020
Grant date	Sep 15, 2020

Abstract

Disclosed are an anhydrous substrate cleaning composition, a substrate treating method, and a substrate treating apparatus. The substrate cleaning composite includes an etching compound that provides a component for treating a substrate, and a solvent that dissolves the etching compound, wherein the substrate cleaning composite is an anhydrous composite that does not include water.

First claim

What is claimed is:

1. A substrate cleaning composite comprising:
an etching compound that provides a component for treating a substrate;
a binder that prevents particles separated from the substrate from being attached to the substrate again, wherein the binder is isopropoxy ethanol; and
a solvent that dissolves the etching compound,
wherein the substrate cleaning composite is an anhydrous composite that does not include water.

2. The substrate cleaning composite of claim 1 , wherein the etching compound includes fluorine.

3. The substrate cleaning composite of claim 1 , wherein the etching compound is ammonium fluoride.

4. The substrate cleaning composite of claim 1 , wherein the etching compound is hydrogen fluoride.

5. The substrate cleaning composite of claim 1 , wherein the solvent is acetic anhydride.

6. The substrate cleaning composite of claim 1 , wherein the solvent is acetic acid.

7. The substrate cleaning composite of claim 1 , wherein the solvent is propylene carbonate.

8. The substrate cleaning composite of claim 1 , further comprising:
a phase change assistant material that improves a solubility of a supercritical fluid.

9. The substrate cleaning composite of claim 8 , wherein the phase change assistant material is alcohol.

10. The substrate cleaning composite of claim 8 , wherein the phase change assistant material is isopropyl alcohol.

11. The substrate cleaning composite of claim 8 , wherein the phase change assistant material is methanol.

12. The substrate cleaning composite of claim 8 , wherein the phase change assistant material is ethanol.

13. A substrate cleaning composite comprising:
an etching compound that provides a component for treating a substrate;
a binder that prevents particles separated from the substrate from being attached to the substrate again, wherein the binder is isopropoxy ethanol;
a solvent that dissolves the etching compound; and
a phase change assistant material that improves a solubility for a supercritical fluid.

14. The substrate cleaning composite of claim 13 , wherein the etching compound is ammonium fluoride, and
wherein the solvent is acetic anhydride.

15. The substrate cleaning composite of claim 14 , wherein the phase change assistant material is isopropyl alcohol.

Assignees

• Semes Co Ltd

Inventors

• Kang Ki-Moon
• Koriakin Anton
• Jung In Il
• Choi Hae-Won

Classifications

• H10P72/0462

  characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

• H10P72/0434 Primary

  mainly by convection · CPC title

• H10P72/0424

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P50/287

  by chemical means · CPC title