Patterned film article comprising cleavable crosslinker and methods

US10768528B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10768528-B2
Application numberUS-201615745737-A
CountryUS
Kind codeB2
Filing dateSep 15, 2016
Priority dateSep 28, 2015
Publication dateSep 8, 2020
Grant dateSep 8, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A pattern article comprising a copolymer having polymerized units derived from a cleavable crosslinking monomer, to which a pattern is imparted by the release of incipient acid from a thermal acid generator or photoacid generator. The selective release of the acid provides a pattern of high crosslink density and low crosslink density as result of the incipient acid cleaving a portion of the crosslinks.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of making a patterned film article comprising the steps of: a) providing a substrate having a coating of a photoacid generator in a preselected pattern, contacting the patterned photoacid generator with a layer of acrylic copolymer, the acrylic copolymer having crosslinks with at least one group having the formula —O—C(R 2 )(R 3 )—O—, wherein R 2 and R 3 are independently hydrogen, alkyl, or aryl b) irradiating the coated substrate to photolyze the photoacid generator releasing incipient acid, whereby the incipient acid catalyzes the cleavage of the crosslinks of the copolymer; and wherein the copolymer comprises polymerized units derived from one or more non-cyclic alkyl (meth)acrylate monomer(s) having 4 to 20 carbon atoms. 2. The method of claim 1 where in the copolymer comprises interpolymerized monomer units of the formula: R 1 is hydrogen or methyl; R 2 and R 3 are independently hydrogen, alkyl, or aryl; and L 1 is a divalent linking group. 3. The method of claim 1 where in the copolymer comprises interpolymerized monomer units of the formula: R 1 is hydrogen or methyl; R 3 is independently hydrogen, alkyl, or aryl; and L 1 is a divalent linking group. 4. A method making a patterned article comprising the steps of a) providing a substrate having a coating of an acid in a preselected pattern, contacting the patterned acid with a layer of acrylic adhesive copolymer, the acrylic adhesive copolymer having crosslinks with at least one group having the formula —O—C(R 2 )(R 3 )—O—, wherein R 2 and R 3 are independently hydrogen, alkyl, or aryl whereby the acid catalyzes the cleavage of the crosslinks of the adhesive copolymer. 5. The method of claim 4 wherein the patterned article has regions of high crosslink density and low crosslink density.

Assignees

Inventors

Classifications

  • C8-(meth)acrylate, e.g. isooctyl (meth)acrylate or 2-ethylhexyl (meth)acrylate · CPC title

  • C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate · CPC title

  • C08F2/28Primary

    cationic · CPC title

  • G03F7/2004Primary

    characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light · CPC title

  • Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Adhesives based on derivatives of such polymers · CPC title

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What does patent US10768528B2 cover?
A pattern article comprising a copolymer having polymerized units derived from a cleavable crosslinking monomer, to which a pattern is imparted by the release of incipient acid from a thermal acid generator or photoacid generator. The selective release of the acid provides a pattern of high crosslink density and low crosslink density as result of the incipient acid cleaving a portion of the cro…
Who is the assignee on this patent?
3M Innovative Properties Co
What technology area does this patent fall under?
Primary CPC classification C08F2/28. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 08 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).