Holding device, method of determining attraction abnormality in holding device, lithography apparatus, and method of manufacturing article
US-2024393682-A1 · Nov 28, 2024 · US
US10768202B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10768202-B2 |
| Application number | US-201615747183-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 29, 2016 |
| Priority date | Sep 8, 2015 |
| Publication date | Sep 8, 2020 |
| Grant date | Sep 8, 2020 |
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The presently disclosed subject matter provides systems and methods for generating nanostructures from tribological films. A probe tip can be immersed in a liquid mixture comprising a plurality of ink particles suspended in a medium. A substrate on which the tribological film is to be generated can also be immersed in the liquid mixture. A processor controlling movement of the probe tip can be configured to cause the probe tip to slide along the substrate in a shape of a desired pattern of the nanostructure with a contact force to cause one or more ink particles of the plurality of ink particles compressed underneath the probe tip to be transformed into a tribological film onto the substrate in the shape of the desired pattern of the nanostructure.
Opening claim text (preview).
What is claimed is: 1. A method of generating a nanostructure on a substrate, comprising: a. immersing the substrate and a probe tip in a liquid mixture comprising ink particles suspended in a medium; b. sliding the probe tip along the substrate in a shape of a desired pattern of the nanostructure with a contact force; c. compressing one or more of the ink particles underneath the probe tip onto the substrate with a pressure sufficient to transform the one or more of the ink particles into a tribological film onto the substrate, thereby generating the nanostructure. 2. The method of claim 1 , wherein the ink particles comprise nanoparticles and/or molecules. 3. The method of claim 1 , wherein the probe tip comprises a tip of an atomic force microscopy probe. 4. The method of claim 1 , wherein the substrate comprises a preexisting nanostructure, and wherein the tribological film deposited on the preexisting nanostructure generates a multi-material nanostructured device. 5. The method of claim 1 , further comprising: measuring an amount of friction between the probe tip and the nanostructure simultaneously while manufacturing the nanostructure; and determining a topography of a portion of the tribological film associated with the nanostructure from the amount of friction measured between the probe tip and the portion of the tribological film after the portion is deposited onto the substrate. 6. The method of claim 1 , further comprising capturing an image of the nanostructure while generating the nanostructure by: directing a laser beam onto an atomic force microscopy cantilever connected to the probe tip, wherein the position of the atomic force microscopy cantilever changes according to a dimension of the tribological film being manufactured directly under the probe tip capturing, on a photodetector, the laser beam reflected off the atomic force microscopy cantilever; generating an image of the nanostructure by determining a position of the photodetector on which the laser beam reflected off the atomic force microscopy cantilever is incident upon; and maintaining the position of the photodetector to be constant through use of a feedback loop that controls a vertical separation distance between the tribological film and a cantilever hold of the probe tip. 7. The method of claim 1 , wherein a thickness of the tribological film is controlled by the contact force with which the probe tip compresses the one or more ink particles onto the substrate and by varying an amount of time the probe tip is in contact with the substrate. 8. The method of claim 1 , wherein a width of a portion of the nanostructure is controlled by varying a scan angle with which the probe tip is being slid along the substrate. 9. The method of claim 1 , wherein the generated nanostructure comprises a single line having a width within 10 nm to 100 nm. 10. The method of claim 1 , wherein the ink nanoparticles are selected from the group consisting of zirconia nanoparticles, molybdenum dialkyldithiocarbamate (MoDTC) molecules, and zinc dialkyldithiophosphates (ZDDP) molecules. 11. A system for generating a nanostructure on a substrate immersed in a liquid mixture including ink particles suspended in a medium, comprising: a probe tip; a fluid cell adapted to hold the liquid mixture in fluidic contact with a first side of the substrate; and a processor, coupled to the probe tip and configured to cause the probe tip to slide along the substrate with a contact force to cause one or more of the ink particles to be compressed underneath the probe tip with a pressure sufficient to cause the one or more ink particles to be transformed into a tribological film onto the substrate, thereby generating the nanostructure. 12. The system of claim 11 , wherein the ink particles comprise nanoparticles and/or molecules. 13. The system of claim 11 , wherein the probe tip comprises a tip of an atomic force microscopy probe. 14. The system of claim 11 , wherein the substrate comprises a preexisting nanostructure and wherein the tribological film deposited on the preexisting nanostructure generates a multi-material nanostructured device. 15. The system of claim 11 , wherein the processor is further configured to: measure an amount of friction between the probe tip and the nanostructure while generating the nanostructure; and determine a topography of each portion of the tribological film associated with the nanostructure from the amount of friction measured between the probe tip and each portion of the tribological film after that corresponding portion is deposited onto the substrate. 16. The system of claim 11 , further comprising: an atomic force microscopy cantilever connected to the probe tip, wherein a vertical position of the atomic force microscopy cantilever changes according to a dimension of the tribological film being manufactured directly under the probe tip; a laser beam source configured to emit a laser beam onto the atomic force microscopy cantilever; a photodetector configured to capture laser beams reflected from the atomic force microscopy cantilever; and wherein the processor is further configured to: instruct the laser beam source to direct a laser beam onto an atomic force microscopy cantilever; process the laser beam reflected off the atomic force microscopy cantilever as the nanostructure is being manufactured to generate an image of the nanostructure by determining a position of the photodetector on which the laser beam reflected off the atomic force microscopy cantilever is incident upon; and maintain the position of the photodetector to be constant through use of a feedback loop that controls a vertical separation distance between the tribological film and a cantilever hold of the probe tip. 17. The system of claim 11 , wherein the ink nanoparticles are selected from the group consisting of zirconia nanoparticles, molybdenum dialkyldithiocarbamate (MoDTC) molecules, and zinc dialkyldithiophosphates (ZDDP) molecules.
Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title
Liquid environment · CPC title
Applications, other than SPM, of scanning-probe techniques (manufacture or treatment of nanostructures B82B3/00; recording or reproducing information using near-field interaction G11B9/12, G11B11/24, G11B13/08) · CPC title
Friction force microscopy · CPC title
Particular materials · CPC title
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