Optical arrangement, in particular lithography system, with a transport lock

US10761436B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10761436-B2
Application numberUS-201916511154-A
CountryUS
Kind codeB2
Filing dateJul 15, 2019
Priority dateJan 17, 2017
Publication dateSep 1, 2020
Grant dateSep 1, 2020

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

An optical arrangement, for example a lithography system, includes: a first component, in particular a carrying frame; a second component, in particular a mirror, which is movable in relation to the first component; and at least one stop with at least one stop face for limiting the movement of the second component in relation to the first component. The optical arrangement, preferably the stop, can have a fixing device for fixing the second component. The fixing device can have a fixing element that is movable in relation to the stop face of the stop. Further aspects of the device likewise relate to an optical arrangement with a fixing device or with a transport lock.

First claim

Opening claim text (preview).

What is claimed is: 1. An optical arrangement, comprising: a first component; a second component movable relative to the first component; a stop having a stop face configured to limit movement of the second component relative to the first component; and a fixing device configured to fix the second component, wherein: the fixing device comprises a fixing element movable relative to the stop face; the fixing element does not form part of the stop; the fixing element is movable between a fixing position and an operating position; in the fixing position, the fixing element abuts against the second component and the fixing element presses the second component against the stop face; in the operating position, the fixing element is spaced apart from the second component; and the optical arrangement is configured to be used in an EUV lithography system. 2. The optical arrangement of claim 1 , wherein the first component comprises a carrying frame, and the second component comprises a mirror. 3. The optical arrangement of claim 1 , further comprising an actuator configured to move the fixing element between the fixing position and the operating position. 4. The optical arrangement of claim 1 , wherein: the stop has a rod-shaped portion with a head region which includes the stop face; and the fixing element is guidedly displaceable in a longitudinal direction of the rod-shaped portion. 5. The optical arrangement of claim 4 , wherein the fixing element surrounds the rod-shaped portion in a ring-shaped manner. 6. The optical arrangement of claim 4 , wherein the second component has a recess in which the stop engages with the head region. 7. The optical arrangement of claim 6 , wherein the fixing element is configured to spread open the head region against the lateral surface of the recess. 8. The optical arrangement of claim 7 , wherein: the head region comprises two head portions movable relative to each other; and the fixing element engages in the fixing position between the two head portions. 9. A system, comprising: an optical arrangement according to claim 1 ; and an actuator comprising a drive configured to move the stop between the fixing position and the operating position, wherein: the actuator is configured to keep the stop in the fixing position when the drive is off; and the system is an EUV lithography system. 10. The system of claim 9 , wherein the stop has a contact face that abuts against the first component in the operating position, and the contact face is on a side of the stop that is opposite from the stop face. 11. The system of claim 9 , wherein the actuator comprises a gear mechanism configured transmit force from the drive to the stop. 12. The system of claim 11 , wherein the gear mechanism comprises a lever mechanism which comprises a toggle lever comprising two legs connected by a common joint. 13. The system of claim 12 , wherein, in the fixing position, the toggle lever is in a position selected from the group consisting of an extended position, a congruent position, and an overextended position. 14. The system of claim 9 , wherein the stop is guidable without twisting during movement between the fixing position and the operating position. 15. The system of claim 9 , further comprising a shielding encapsulating the drive from its the surroundings. 16. A system, comprising: a carrying frame; a mirror movable relative to the carrying frame; a vacuum housing having an interior space in which the mirror is disposed; a fixing device configured to fix the mirror relative to the carrying frame, wherein: the fixing device comprises a fixing element having an operating position and a fixing position; in its operating position, the fixing device is spaced apart from the mirror; in its fixing position, the fixing device abuts against the mirror; the fixing element is movable from the operating position into the fixing position by changing a pressure of the interior of the housing; the fixing element is movable from the fixing position to the operating position by changing the pressure of the interior of the housing; the fixing device has a gas volume sealed from the interior space of the housing; the system further comprises a further component; the further component is movable depending on a difference between the pressure of the interior of the housing and a pressure in the gas volume; the further component has its movement coupled to the fixing element, or the further component is the fixing element; and the system is an EUV lithography system. 17. The system of claim 16 , wherein the fixing device is configured to move the fixing element from the operating position to the fixing position when there is an increase in the pressure of the interior of the housing. 18. The system of claim 16 , wherein the further component comprises a flexible membrane defining a wall region of a further housing in which the gas volume is located. 19. The system of claim 17 , wherein the further component comprises a flexible membrane defining a wall region of a further housing in which the gas volume is located. 20. The optical arrangement of claim 1 , wherein, in the fixing position, the fixing element is spatially separated from the stop face.

Assignees

Inventors

Classifications

  • Mounting of individual elements, e.g. mounts, holders or supports (workpiece or mask holders G03F7/707) · CPC title

  • Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving · CPC title

  • Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems · CPC title

  • Vibration, e.g. vibration detection, compensation, suppression or isolation · CPC title

  • permitting adjustment · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10761436B2 cover?
An optical arrangement, for example a lithography system, includes: a first component, in particular a carrying frame; a second component, in particular a mirror, which is movable in relation to the first component; and at least one stop with at least one stop face for limiting the movement of the second component in relation to the first component. The optical arrangement, preferably the stop,…
Who is the assignee on this patent?
Zeiss Carl Smt Gmbh
What technology area does this patent fall under?
Primary CPC classification G03F7/70825. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Sep 01 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).