Hybrid flow metrology for improved chamber matching

Patent metadata

Field	Value
Publication number	US-10760944-B2
Application number	US-201816056980-A
Country	US
Kind code	B2
Filing date	Aug 7, 2018
Priority date	Aug 7, 2018
Publication date	Sep 1, 2020
Grant date	Sep 1, 2020

Abstract

A gas flow metrology system for a substrate processing system includes N primary valves selectively flowing gas from N gas sources, respectively, where N is an integer. N mass flow controllers are connected to the N primary valves, respectively, to flow N gases from the N gas sources, respectively. N secondary valves selectively flow gas from the N mass flow controllers, respectively. A gas flow path connects the N secondary valves to a flow metrology system located remote from the N secondary valves, wherein the gas flow path includes a plurality of gas lines. A controller is configured to perform a hybrid flow metrology by selectively using a first flow metrology and a second flow metrology that is different from the first flow metrology to determine an actual flow rate for a selected gas at a desired flow rate from one of the N mass flow controllers.

First claim

What is claimed is:

1. A gas flow metrology system for a substrate processing system, comprising:
N primary valves selectively flowing gas from N gas sources, respectively, where N is an integer;
N mass flow controllers connected to the N primary valves, respectively, to flow N gases from the N gas sources, respectively;
N secondary valves selectively flowing gas from the N mass flow controllers, respectively;
a gas flow path connecting the N secondary valves to a flow metrology system located remote from the N secondary valves, wherein the gas flow path includes a plurality of gas lines; and
a controller configured to perform a hybrid flow metrology by selectively using a first flow metrology and a second flow metrology that is different from the first flow metrology to determine an actual flow rate for a selected gas at a desired flow rate from one of the N mass flow controllers.

2. The gas flow metrology system of claim 1 , wherein the controller is further configured to perform the first flow metrology by:
evacuating the gas flow path;
measuring an initial pressure in the gas flow path;
determining an initial mass in the gas flow path;
flowing the selected gas at the desired flow rate from the one of the N mass flow controllers during a predetermined period;
measuring a final pressure in the gas flow path;
determining a final mass in the gas flow path; and
determining an actual flow rate based on the initial mass, the final mass, and the predetermined period.

3. The gas flow metrology system of claim 2 , wherein the controller is further configured to determine an effective volume of the gas flow path for the selected gas and the desired flow rate.

4. The gas flow metrology system of claim 3 , wherein the controller is further configured to determine the actual flow rate further based on the effective volume.

5. The gas flow metrology system of claim 1 , wherein the gas flow path further comprises a manifold and a valve.

6. The gas flow metrology system of claim 1 , wherein the controller is configured to use the first flow metrology when determining the actual flow rate when the desired flow rate is less than or equal to a predetermined flow rate.

7. The gas flow metrology system of claim 6 , wherein the predetermined flow rate is in a range from 5 sccm to 15 sccm.

8. The gas flow metrology system of claim 6 , wherein the controller is configured to use the second flow metrology when determining the actual flow rate when the desired flow rate is greater than the predetermined flow rate.

9. The gas flow metrology system of claim 8 , wherein the predetermined flow rate is in a range from 5 sccm to 15 sccm.

10. The gas flow metrology system of claim 8 , wherein the second flow metrology includes an orifice-based metrology.

11. The gas flow metrology system of claim 8 , further comprising:
an orifice;
a valve connected to an outlet of the orifice; and
a pressure sensor to sense pressure at an inlet of the orifice,
wherein the controller is configured to use the second flow metrology to determine the actual flow rate based on information associated with the valve, the pressure sensor and the orifice.

12. The gas flow metrology system of claim 2 , wherein the controller is configured to wait for a first predetermined settling period after evacuating the gas flow path before measuring the initial pressure in the gas flow path.

13. The gas flow metrology system of claim 12 , wherein the controller is configured to wait for a second predetermined settling period after flowing the selected gas at the desired flow rate from the one of the N mass flow controllers during the predetermined period before measuring the final pressure in the gas flow path.

14. The gas flow metrology system of claim 12 , wherein the controller determines a difference between the actual flow rate determined by the first flow metrology and the actual flow rate determined by the second flow metrology.

15. The gas flow metrology system of claim 14 , wherein the controller compares the difference to a predetermined range and selectively generates a notification when the difference is outside of the predetermined range.

16. The gas flow metrology system of claim 1 , wherein the controller is further configured to determine an effective volume of the gas flow path for the selected gas and the desired flow rate using the second flow metrology.

17. A hybrid flow metrology system comprising:
a connection configured to provide fluid communication with a gas flow path, wherein the gas flow path is in fluid communication with a gas box including N mass flow controllers to control flow of gas from N gas sources, respectively, where N is an integer; and
a controller configured to perform:
a first flow metrology to calibrate at least one of the N mass flow controllers based on a differential mass of gas in the gas flow path between the gas box and the hybrid flow metrology system during a predetermined period when a desired flow rate for gas supplied by the at least one of the N mass flow controllers is less than or equal to a predetermined flow rate; and
a second flow metrology to calibrate the at least one of the N mass flow controllers when the desired flow rate for the gas supplied by the at least one of the N mass flow controllers is greater than the predetermined flow rate.

18. The hybrid flow metrology system of claim 17 , wherein the first flow metrology and the second flow metrology are used to determine an effective volume of the gas flow path for the gas at the desired flow rate.

19. The hybrid flow metrology system of claim 18 , wherein the first flow metrology further determines the differential mass based on the effective volume of the gas flow path for the gas at the desired flow rate.

20. The hybrid flow metrology system of claim 17 , wherein the second flow metrology is an orifice-based method.

21. The hybrid flow metrology system of claim 17 , wherein the controller is further configured to determine an effective volume of the gas flow path for a selected gas and a selected flow rate.

22. The hybrid flow metrology system of claim 21 , wherein the controller is further configured to determine an actual flow rate further based on the effective volume.

23. The hybrid flow metrology system of claim 17 , wherein the gas flow path further comprises a manifold and a valve.

24. The hybrid flow metrology system of claim 17 , wherein the predetermined flow rate is in a range from 5 sccm to 15 sccm.

25. The hybrid flow metrology system of claim 17 , further comprising:
an orifice;
a valve connected to an outlet of the orifice; and
a pressure sensor to sense pressure at an inlet of the orifice,
wherein the controller is further configured to use information associated with the valve, the pressure sensor and the orifice to determine an actual flow rate when the desired flow rate is greater than the predetermined flow rate.

26. The hybrid flow metrology system of claim 17 , wherein the controller is configured to perform the first flow metrology by:
evacuating the gas flow path;
measuring an initial pressure in the gas flow path;
determining an initial mass in the gas flow path;
flowing a selected gas at the desired flow rate from the at least one of the N mass flow controllers during the predetermined period;
measuring a final pressure in the gas flow path;
determining a final mass in the gas flow

Assignees

• Lam Res Corp

Inventors

• Spyropoulos Evangelos T
• Agarwal Piyush
• Leung James
• Hashemi Ghermezi Seyed Hossein
• Shareef Iqbal

Classifications

• C23C16/52

  Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} · CPC title

• C23C16/45561 Primary

  Gas plumbing upstream of the reaction chamber · CPC title

• G01F25/17

  using calibrated reservoirs · CPC title

• G01F25/15 Primary

  specially adapted for gas meters (G01F25/11 - G01F25/14, G01F25/17 take precedence) · CPC title

• F16K37/005

  for measuring fluid parameters (F16K37/0033 takes precedence) · CPC title