Substrate treatment method and substrate treatment equipment
US-2016233082-A1 · Aug 11, 2016 · US
Dilute chemical solution producing apparatus and dilute chemical solution producing method
US10759678B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10759678-B2 |
| Application number | US-201716313245-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 14, 2017 |
| Priority date | Sep 20, 2016 |
| Publication date | Sep 1, 2020 |
| Grant date | Sep 1, 2020 |
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- Title
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Abstract
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A dilute chemical solution producing apparatus includes, in a supply line of ultrapure water, a platinum group metal carrying resin column, a membrane-type deaeration apparatus, and a gas dissolving membrane apparatus, and a washing chemical solution injection apparatus is provided between the platinum group metal carrying resin column and the membrane-type deaeration apparatus. An inert gas source is connected to a gas phase side of the membrane-type deaeration apparatus, and an inert gas source is also connected to a gas phase side of the gas dissolving membrane apparatus. A discharge line communicates with the gas dissolving membrane apparatus. With such a dilute chemical solution producing apparatus, a dilute chemical solution with both dissolved oxygen and dissolved hydrogen peroxide being removed can be safely produced and supplied in a washing step for semiconductor washing.
First claim
Opening claim text (preview).
The invention claimed is: 1. A dilute chemical solution producing apparatus for diluting a chemical solution with ultrapure water, sequentially comprising, in an ultrapure water supply line, a platinum group metal carrying resin column and a membrane-type deaeration apparatus, a chemical solution injection apparatus being provided between the platinum group metal carrying resin column and the membrane-type deaeration apparatus. 2. The dilute chemical solution producing apparatus according to claim 1 , wherein an inert gas dissolving membrane apparatus is provided downstream of the membrane-type deaeration apparatus. 3. The dilute chemical solution producing apparatus according to claim 1 , wherein the membrane-type deaeration apparatus is of an inert gas suction type. 4. A dilute chemical solution producing method for diluting a chemical solution with ultrapure water, wherein the ultrapure water for dilution is passed through a platinum group metal carrying resin column, then a chemical solution component is added to prepare a dilute chemical solution, and then the obtained dilute chemical solution is deaerated. 5. The dilute chemical solution producing method according to claim 4 , wherein an inert gas is dissolved in the deaerated dilute chemical solution. 6. The dilute chemical solution producing method according to claim 4 , wherein the deaeration is performed while an inert gas is sucked into a gas phase side.
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Classifications
by wet cleaning only (H10P70/52 takes precedence) · CPC title
Grinding, lapping or polishing of wafers, substrates or parts of devices · CPC title
Static mixers (colloid-mills B02C; mixing valves F16K11/00) · CPC title
Dissolving (separating by dissolving B01D; dissolving to effect cooling F25D5/00) · CPC title
the liquid having chemical or dissolving effect · CPC title
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- What does patent US10759678B2 cover?
- A dilute chemical solution producing apparatus includes, in a supply line of ultrapure water, a platinum group metal carrying resin column, a membrane-type deaeration apparatus, and a gas dissolving membrane apparatus, and a washing chemical solution injection apparatus is provided between the platinum group metal carrying resin column and the membrane-type deaeration apparatus. An inert gas so…
- Who is the assignee on this patent?
- Kurita Water Ind Ltd
- What technology area does this patent fall under?
- Primary CPC classification C02F1/20. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Sep 01 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).