Fe-Pt based magnetic material sintered compact

US10755737B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10755737-B2
Application numberUS-201314414518-A
CountryUS
Kind codeB2
Filing dateAug 6, 2013
Priority dateSep 21, 2012
Publication dateAug 25, 2020
Grant dateAug 25, 2020

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Provided is an Fe—Pt based magnetic material sintered compact, comprising BN and SiO 2 as non-magnetic materials, wherein Si and O are present in a region where B or N is present at a cut surface of the sintered compact. An object of the present invention is to provide a high density sputtering target which enables production of a magnetic thin film for heat-assisted magnetic recording media, and also reduces the amount of particles generated during sputtering.

First claim

Opening claim text (preview).

The invention claimed is: 1. A Fe—Pt based magnetic material sintered compact, consisting of iron and platinum forming sintered Fe—Pt alloy and particles of hexagonal BN and SiO 2 dispersed in the sintered Fe—Pt alloy, wherein, in an element mapping image obtained by a Field Emission Electron Probe Micro Analyzer (FE-EPMA) of a cross-sectional surface of the sintered compact, elements of Si and O are detected in the same area as that where elements of B and N are detected, and wherein, in X-ray diffraction analysis of a cross-sectional surface of the sintered compact which is parallel to a pressurized face of the sintered compact, an X-ray diffraction peak from (002) plane of hexagonal BN is present, and an X-ray diffraction peak from (101) plane of cristobalite has an intensity ratio of 1.40 or less to a back-ground intensity of the (101) X-ray diffraction peak. 2. The Fe—Pt based magnetic material sintered compact according to claim 1 , wherein the X-ray diffraction peak from (002) plane of hexagonal BN has an intensity ratio of 1.50 or more to a back-ground intensity of the (002) X-ray diffraction peak. 3. The Fe—Pt based magnetic material sintered compact according to claim 2 , wherein the sintered compact has a content of Pt in an amount of 5 mol % or more and 60 mol % or less, a content of BN in an amount of 1 mol % or more and 50 mol % or less, a content of SiO 2 in an amount of 0.5 mol % or more and 20 mol % or less, and remainder of content of Fe. 4. The Fe—Pt based magnetic material sintered compact according to claim 3 , wherein the content of SiO 2 has a ratio of 1% or more relative to the content of hexagonal BN. 5. The Fe—Pt based magnetic material sintered compact according to claim 1 , wherein a content of SiO 2 in the sintered compact has a ratio of 1% or more relative to a content of hexagonal BN. 6. The Fe—Pt based magnetic material sintered compact according to claim 1 , wherein the sintered compact has a content of Pt in an amount of 5 mol % or more and 60 mol % or less, a content of BN in an amount of 1 mol % or more and 50 mol % or less, a content of SiO 2 in an amount of 0.5 mol % or more and 20 mol % or less, and remainder of content of Fe. 7. The Fe—Pt based magnetic material sintered compact according to claim 1 , wherein the sintered compact is made from raw material powders of Fe powder and Pt powder, or Fe—Pt powder, and BN powder and SiO 2 powder having a grain diameter of 0.5 to 10 μm.

Assignees

Inventors

Classifications

  • Sputtering targets therefor · CPC title

  • having a L10 crystallographic structure, e.g. [Co,Fe][Pt,Pd] thin films · CPC title

  • Coating a support with a magnetic layer by sputtering · CPC title

  • with more than 5% preformed carbides, nitrides or borides · CPC title

  • Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title

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What does patent US10755737B2 cover?
Provided is an Fe—Pt based magnetic material sintered compact, comprising BN and SiO 2 as non-magnetic materials, wherein Si and O are present in a region where B or N is present at a cut surface of the sintered compact. An object of the present invention is to provide a high density sputtering target which enables production of a magnetic thin film for heat-assisted magnetic recording media, …
Who is the assignee on this patent?
Jx Nippon Mining & Metals Corp
What technology area does this patent fall under?
Primary CPC classification G11B5/653. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 25 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).