Fe-Pt-Based Sputtering Target Having Nonmagnetic Substance Dispersed Therein
US-2015107991-A1 · Apr 23, 2015 · US
US10755737B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10755737-B2 |
| Application number | US-201314414518-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 6, 2013 |
| Priority date | Sep 21, 2012 |
| Publication date | Aug 25, 2020 |
| Grant date | Aug 25, 2020 |
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Provided is an Fe—Pt based magnetic material sintered compact, comprising BN and SiO 2 as non-magnetic materials, wherein Si and O are present in a region where B or N is present at a cut surface of the sintered compact. An object of the present invention is to provide a high density sputtering target which enables production of a magnetic thin film for heat-assisted magnetic recording media, and also reduces the amount of particles generated during sputtering.
Opening claim text (preview).
The invention claimed is: 1. A Fe—Pt based magnetic material sintered compact, consisting of iron and platinum forming sintered Fe—Pt alloy and particles of hexagonal BN and SiO 2 dispersed in the sintered Fe—Pt alloy, wherein, in an element mapping image obtained by a Field Emission Electron Probe Micro Analyzer (FE-EPMA) of a cross-sectional surface of the sintered compact, elements of Si and O are detected in the same area as that where elements of B and N are detected, and wherein, in X-ray diffraction analysis of a cross-sectional surface of the sintered compact which is parallel to a pressurized face of the sintered compact, an X-ray diffraction peak from (002) plane of hexagonal BN is present, and an X-ray diffraction peak from (101) plane of cristobalite has an intensity ratio of 1.40 or less to a back-ground intensity of the (101) X-ray diffraction peak. 2. The Fe—Pt based magnetic material sintered compact according to claim 1 , wherein the X-ray diffraction peak from (002) plane of hexagonal BN has an intensity ratio of 1.50 or more to a back-ground intensity of the (002) X-ray diffraction peak. 3. The Fe—Pt based magnetic material sintered compact according to claim 2 , wherein the sintered compact has a content of Pt in an amount of 5 mol % or more and 60 mol % or less, a content of BN in an amount of 1 mol % or more and 50 mol % or less, a content of SiO 2 in an amount of 0.5 mol % or more and 20 mol % or less, and remainder of content of Fe. 4. The Fe—Pt based magnetic material sintered compact according to claim 3 , wherein the content of SiO 2 has a ratio of 1% or more relative to the content of hexagonal BN. 5. The Fe—Pt based magnetic material sintered compact according to claim 1 , wherein a content of SiO 2 in the sintered compact has a ratio of 1% or more relative to a content of hexagonal BN. 6. The Fe—Pt based magnetic material sintered compact according to claim 1 , wherein the sintered compact has a content of Pt in an amount of 5 mol % or more and 60 mol % or less, a content of BN in an amount of 1 mol % or more and 50 mol % or less, a content of SiO 2 in an amount of 0.5 mol % or more and 20 mol % or less, and remainder of content of Fe. 7. The Fe—Pt based magnetic material sintered compact according to claim 1 , wherein the sintered compact is made from raw material powders of Fe powder and Pt powder, or Fe—Pt powder, and BN powder and SiO 2 powder having a grain diameter of 0.5 to 10 μm.
Sputtering targets therefor · CPC title
having a L10 crystallographic structure, e.g. [Co,Fe][Pt,Pd] thin films · CPC title
Coating a support with a magnetic layer by sputtering · CPC title
with more than 5% preformed carbides, nitrides or borides · CPC title
Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title
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