Electron beam generation and measurement

Patent metadata

Field	Value
Publication number	US-10748737-B2
Application number	US-201816149260-A
Country	US
Kind code	B2
Filing date	Oct 2, 2018
Priority date	Oct 10, 2017
Publication date	Aug 18, 2020
Grant date	Aug 18, 2020

Abstract

A flat top laser beam is used to generate an electron beam with a photocathode that can include an alkali halide. The flat top profile can be generated using an optical array. The laser beam can be split into multiple laser beams or beamlets, each of which can have the flat top profile. A phosphor screen can be imaged to determine space charge effects or electron energy of the electron beam.

First claim

What is claimed is:

1. A system comprising:
a laser source that generates a laser beam;
a photocathode in a path of the laser beam, wherein the photocathode generates an electron beam upon illumination with the laser beam;
an optical array disposed in the path of the laser beam between the laser source and the photocathode, wherein the optical array is configured to provide a flat top profile to the laser beam;
a vacuum chamber in fluid communication with the photocathode;
a phosphor screen disposed in the vacuum chamber in a path of the electron beam a non-zero distance from a surface of the photocathode, wherein the phosphor screen includes phosphor powder;
a translation mechanism configured to move the phosphor screen in the vacuum chamber relative to a surface of the photocathode;
a camera configured to image the phosphor screen; and
a processor configured to determine electron energy and/or space charge effects of the electron beam using an image from the camera.

2. The system of claim 1 , wherein the laser source provides flood illumination.

3. The system of claim 1 , wherein the laser beam has a uniform distribution over a surface of the photocathode.

4. The system of claim 1 , wherein the camera is disposed outside the vacuum chamber.

5. The system of claim 1 , wherein the photocathode includes an alkali halide.

6. A wafer inspection system including the system of claim 1 .

7. A system comprising:
a laser source that generates a laser beam;
an optical array in a path of the laser beam that is configured to split the laser beam into a plurality of beamlets, wherein each of the beamlets is configured to have a flat top profile;
a photocathode in a path of the beamlets, wherein the photocathode generates electron beams upon illumination with the beamlets;
a vacuum chamber in fluid communication with the photocathode;
a phosphor screen disposed in the vacuum chamber in a path of at least one of the electron beams a non-zero distance from a surface of the photocathode, wherein the phosphor screen includes phosphor powder;
a translation mechanism configured to move the phosphor screen in the vacuum chamber relative to a surface of the photocathode;
a camera configured to image the phosphor screen; and
a processor configured to determine electron energy and/or space charge effects of the electron beam using an image from the camera.

8. The system of claim 7 , wherein the laser source provides flood illumination.

9. The system of claim 7 , wherein the beamlets have a uniform distribution over a surface of the photocathode.

10. The system of claim 7 , wherein the photocathode includes an alkali halide.

11. The system of claim 7 , wherein the camera is disposed outside the vacuum chamber.

12. A wafer inspection system including the system of claim 7 .

13. A method comprising:
directing a laser beam at a photocathode;
converting the laser beam to have a flat top profile using an optical array in a path of the laser beam;
generating an electron beam when the laser beam with the flat top profile illuminates the photocathode;
translating a phosphor screen relative to the photocathode;
directing the electron beam at the phosphor screen;
imaging the phosphor screen using a camera; and
determining, using a processor, electron energy and/or space charge effects of the electron beam using an image from the camera.

14. The method of claim 13 , further comprising generating the laser beam with a laser source.

15. The method of claim 13 , wherein the photocathode includes an alkali halide.

16. The method of claim 13 , further comprising splitting the laser beam into a plurality of laser beams using the optical array, wherein each of the laser beams has the flat top profile.

17. The method of claim 13 , further comprising:
translating the phosphor screen out of a path of the electron beam;
directing the electron beam at a semiconductor wafer; and
detecting electrons returned from a surface of the semiconductor wafer.

Assignees

• Kla Tencor Corp

Inventors

• Ioakeimidi Katerina
• Delgado Gildardo R
• Hill Frances
• Romero Michael E
• Garcia Rudy F

Classifications

• H10P72/0616

  Monitoring of warpages, curvatures, damages, defects or the like · CPC title

• H01J2237/065

  Source emittance characteristics · CPC title

• H01J1/34

  Photo-emissive cathodes (H01J1/35 takes precedence) · CPC title

• G02B27/0927

  Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat · CPC title

• H01J2201/3423

  Semiconductors, e.g. GaAs, NEA emitters · CPC title