Optoelectronic component and method for producing same
US-12176444-B2 · Dec 24, 2024 · US
US10741402B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10741402-B2 |
| Application number | US-201715692495-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 31, 2017 |
| Priority date | Sep 21, 2016 |
| Publication date | Aug 11, 2020 |
| Grant date | Aug 11, 2020 |
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An electronic device, an electronic module comprising the electronic device and methods for fabricating the same are disclosed. In one example, the electronic device includes a semiconductor substrate and a metal stack disposed on the semiconductor substrate, wherein the metal stack comprises a first layer, wherein the first layer comprises NiSi.
Opening claim text (preview).
The invention claimed is: 1. An electronic device, comprising: a semiconductor substrate; and a metal stack that completely covers a backside of the semiconductor substrate, the metal stack comprising: a first layer; wherein the first layer comprises NiSi; and wherein the metal stack comprises N impurities in the first layer, in the form of one or more of NiN and SiN. 2. The electronic device according to claim 1 , wherein the first layer has a thickness in the range of 50 nm to 2000 nm. 3. The electronic device according to claim 1 , wherein the first layer comprises an amount of Si in the range of 2 wt % to 50 wt %. 4. An electronic module, comprising: a carrier; a semiconductor chip disposed on the carrier; a metal stack that completely covers a backside of the semiconductor chip, the metal stack disposed between the carrier and the semiconductor chip, the metal stack comprising: a first layer comprising NiSi, and a solder layer disposed on the first layer; an encapsulation body encapsulating the semiconductor chip and the metal stack disposed between the carrier and the semiconductor chip; and wherein the metal stack comprises N impurities. 5. The electronic module according to claim 4 , wherein the solder layer comprises a Pb-based or a Pb-free solder. 6. The electronic module according to claim 5 , wherein the solder layer comprises Sn or SnAg. 7. The electronic module according to claim 4 , wherein the carrier comprises a power electronic substrate, a leadframe, a DCB, a DAB, an AMB, an IMS or a PCB. 8. The electronic module according to claim 4 , wherein N impurities are located along an interface between the first layer and the solder layer. 9. A method for fabricating an electronic module, comprising: providing a carrier and a semiconductor substrate; disposing a first layer on a backside of the semiconductor substrate, wherein the first layer completely covers the backside of the semiconductor substrate; disposing a solder layer between the first layer and the carrier; and soldering the semiconductor substrate onto the carrier, wherein the first layer comprises NiSi, and wherein disposing the first layer on the semiconductor substrate comprises sputtering in the presence of a process gas. 10. The method according to claim 9 , wherein sputtering comprises a magnetron sputtering process. 11. The method according to claim 9 , wherein the process gas comprises N, and wherein the amount of N in the process gas is about 80%. 12. The method according to claim 9 , wherein the process gas further comprises Ar, Xe, Kr or Ne. 13. The method according to claim 9 comprising forming intermetallic phases between the first layer and the solder layer.
Encapsulations, e.g. protective coatings · CPC title
comprising metals or metalloids, e.g. PbSn, Ag or Cu · CPC title
Bond pads specially adapted therefor · CPC title
in gaseous form, e.g. by CVD or PVD · CPC title
Soldering or alloying · CPC title
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